公开(公告)号：US20240186105A1

公开(公告)日：2024-06-06

申请号：US18526286

申请日：2023-12-01

申请人： Katholieke Universiteit Leuven

发明人： Etienne Brodu

IPC分类号： H01J37/22 ,  H01J37/295

CPC分类号： H01J37/222 ,  H01J37/295 ,  H01J2237/153

摘要： A set of methods of processing a set of Kikuchi diffraction patterns acquired for a series of incident positions of an electron beam on a sample material are described. One such method involves the steps of identifying a first pattern in the set containing a matrix signal and suspected of additionally containing a secondary phase signal; identifying a second pattern close to the first pattern which contains a matrix signal without containing a secondary phase signal; modifying the contrast and intensity of either the first pattern or the second pattern, the modification depending on a relative property of the first and second patterns, resulting in a modified first or second pattern; and obtaining a secondary phase signal pattern by either i) if the first pattern was modified, subtracting the original second pattern from the modified first pattern; or ii) if the second pattern was modified, subtracting the modified second pattern from the original first pattern.

公开(公告)号：US20230298853A1

公开(公告)日：2023-09-21

申请号：US18321442

申请日：2023-05-22

申请人： FEI Company

发明人： Bart BUIJSSE ,  Bart Jozef JANSSEN

IPC分类号： H01J37/26 ,  H01J37/295

CPC分类号： H01J37/265 ,  H01J37/295 ,  H01J2237/04

摘要： Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.

公开(公告)号：US20230126658A1

公开(公告)日：2023-04-27

申请号：US17913450

申请日：2020-04-07

申请人： Hitachi High-Tech Corporation

发明人： Teruaki HASEGAWA

IPC分类号： H01J37/20 ,  H01J37/295

摘要： This charged particle gun has a bolt to which a charged particle source is attached, a nut that is screwed together with the bolt and thereby holds the charged particle source, and a nut seat surface in contact with the nut. The nut includes an inclination adjustment section whereby it is possible to adjust the angle of inclination of the charged particle source with respect to the nut seat surface, and a lock section that inhibits the nut and the bolt from becoming loose when screwed together. The inner surface of the nut has a screw thread section and a non-screw thread section with a larger inner diameter than the screw thread section. The inclination adjustment section has: a first slit formed so as to pass through an area from one part of the outer surface of the nut to one part of the non-screw thread section; an inclination adjustment screw; a first part positioned between the first slit and a second surface; a second part positioned between the first slit and a first surface; and a first screw hole that is screwed together with the inclination adjustment screw and formed so as to pass through an area from the first surface to the first slit in the second part.

公开(公告)号：US11251016B2

公开(公告)日：2022-02-15

申请号：US16828330

申请日：2020-03-24

申请人： JEOL Ltd.

发明人： Yuji Kohno

IPC分类号： H01J37/141 ,  H01J37/26 ,  H01J37/295

摘要： A method of controlling a transmission electron microscope includes: causing a first magnetic field lens to generate a first magnetic field and causing a second magnetic field lens to generate a second magnetic field; causing the magnetic field applying unit to generate a magnetic field of a direction along an optical axis on a specimen mounting surface; and changing excitations of the first excitation coil and the second excitation coil to correct a deviation of a focal length of an objective lens due to the magnetic field generated by the magnetic field applying unit.

公开(公告)号：US11114275B2

公开(公告)日：2021-09-07

申请号：US16460749

申请日：2019-07-02

申请人： FEI Company

发明人： Pavel Stejskal ,  Christopher J. Stephens

IPC分类号： H01J37/00 ,  H01J37/295 ,  G01N23/20058 ,  G01N23/203 ,  H01J37/244 ,  H01J37/26

摘要： Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.

公开(公告)号：US11024480B2

公开(公告)日：2021-06-01

申请号：US16299948

申请日：2019-03-12

申请人： FEI Company

发明人： Zhenxin Zhong

IPC分类号： H01J37/26 ,  H01J37/295 ,  H01J37/20

摘要： Various methods and systems are provided for aligning zone axis of a sample with an incident beam. As one example, the alignment may be based on a zone axis tilt. The zone axis tilt may be determined based on locations of a direct beam and a zero order Laue zone in the diffraction pattern. The direct beam location may be determined based on diffraction patterns acquired with different incident angles.

公开(公告)号：US11011344B2

公开(公告)日：2021-05-18

申请号：US16787662

申请日：2020-02-11

申请人： HITACHI, LTD. ,  RIKEN

发明人： Toshiaki Tanigaki ,  Tetsuya Akashi ,  Ken Harada

IPC分类号： H01J37/141 ,  H01J37/26 ,  H01J37/09 ,  H01J37/147 ,  H01J37/295

摘要： An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

公开(公告)号：US10948426B2

公开(公告)日：2021-03-16

申请号：US16094839

申请日：2017-04-06

申请人： RIKEN

发明人： Ken Harada ,  Keiko Shimada ,  Kodai Niitsu

IPC分类号： G01N23/04 ,  H01J37/295 ,  G02B5/18 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

摘要： The density difference of particle beam irradiation with two optical statuses is produced utilizing a diffraction effect, within the same field of vision, such that a diffraction grating manufactured with a material which passes through a particle beam is provided on the upper side of a specimen and on the lower side of the irradiation optical system. Further, a region wider than the opening region of the diffraction grating is irradiated with the particle beam to produce the density difference of the particle beam emitted to the specimen, by superposing the particle beam, Bragg-diffracted with the opening region, and the particle beam, transmitted through the outer peripheral part of the opening region without being diffracted, with each other, and emitting the beam to the specimen.

公开(公告)号：US10663414B2

公开(公告)日：2020-05-26

申请号：US15118042

申请日：2014-03-10

申请人： Oxford Instruments Nanotechnology Tools Limited

发明人： Frank Willi Bauer

IPC分类号： G01N23/20058 ,  H01J37/20 ,  H01J37/252 ,  H01J37/295 ,  G01N23/20025 ,  G01N23/203 ,  H01J37/305 ,  G01N23/2055

摘要： A method is provided for performing electron diffraction pattern analysis upon a sample in a vacuum chamber of a microscope. Firstly a sample is isolated from part of a specimen using a focused particle beam. A manipulator end effector is then attached to the sample so as to effect a predetermined orientation between the end effector and the sample. With the sample detached, the manipulator end effector is rotated about a rotation axis to bring the sample into a predetermined geometry with respect to an electron beam and diffraction pattern imaging apparatus so as to enable an electron diffraction pattern to be obtained from the sample while the sample is still fixed to the manipulator end effector. An electron beam is caused to impinge upon the sample attached to the manipulator end effector so as to obtain an electron diffraction pattern.

公开(公告)号：US20170358422A1

公开(公告)日：2017-12-14

申请号：US15615289

申请日：2017-06-06

申请人： Tsinghua University ,  HON HAI PRECISION INDUSTRY CO., LTD.

发明人： PENG LIU ,  WEI ZHAO ,  XIAO-YANG LIN ,  DUAN-LIANG ZHOU ,  CHUN-HAI ZHANG ,  KAI-LI JIANG ,  SHOU-SHAN FAN

IPC分类号： H01J37/295 ,  H01J37/18 ,  H01J37/22 ,  H01J37/20

CPC分类号： H01J37/295 ,  G01N23/20058 ,  H01J37/18 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/0245 ,  H01J2237/063 ,  H01J2237/182 ,  H01J2237/1825 ,  H01J2237/20 ,  H01J2237/20228 ,  H01J2237/2447

摘要： The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.