公开(公告)号：US11355314B2

公开(公告)日：2022-06-07

申请号：US17123883

申请日：2020-12-16

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/30 ,  H01J37/305 ,  H01J27/02 ,  H01J37/08 ,  B08B3/08 ,  H01J37/063 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US20190108973A1

公开(公告)日：2019-04-11

申请号：US16210633

申请日：2018-12-05

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  H01J37/063 ,  B08B3/08 ,  H01J37/08 ,  H01J27/02 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US11508545B2

公开(公告)日：2022-11-22

申请号：US14741902

申请日：2015-06-17

Applicant: CANON ANELVA CORPORATION

Inventor： Masashi Tsujiyama ,  Yasushi Yasumatsu ,  Kaori Motochi

IPC: H01J37/147 ,  H01J37/32 ,  H01J27/02 ,  H01J27/16

Abstract: An object of the invention is to provide a grid assembly which is easy to assemble and is high in assembly reproducibility, and an ion beam etching apparatus including it. A grid assembly is constructed of three grids each in the shape of a circular plate, which are stacked one on top of another. The grid assembly includes three fixing holes for fixing the three grids, and three positioning holes for positioning the three grids. In assembly, the three grids are stacked one on top of another on a first ring so that positioning pins provided on the first ring are inserted into the positioning holes. Then, a second ring is stacked on top of the three grids, and bolts are inserted into the fixing holes. Thus, positioning is performed by using the fixed positioning pins and thereafter the fixing can be performed, which facilitates the assembly.

公开(公告)号：US10224179B2

公开(公告)日：2019-03-05

申请号：US14878206

申请日：2015-10-08

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/08 ,  H01J27/02 ,  B08B3/08 ,  H01J37/063 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US20220262598A1

公开(公告)日：2022-08-18

申请号：US17739830

申请日：2022-05-09

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  H01J27/02 ,  H01J37/08 ,  B08B3/08 ,  H01J37/063 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US09721747B2

公开(公告)日：2017-08-01

申请号：US15366660

申请日：2016-12-01

Applicant: CANON ANELVA CORPORATION

Inventor： Masashi Tsujiyama ,  Yukito Nakagawa ,  Yasushi Yasumatsu

IPC: H01J9/14 ,  H01J27/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08

CPC classification number: H01J27/024 ,  H01J9/14 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/303 ,  H01J2237/31701 ,  H01J2237/3174

Abstract: A grid of the present invention is a plate-shaped grid provided with a hole. The grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, and the hole is formed in the grid so as to cut off the carbon fibers.

公开(公告)号：US20160056016A1

公开(公告)日：2016-02-25

申请号：US14878206

申请日：2015-10-08

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  H01J37/063 ,  B08B3/08 ,  H01J37/317

CPC classification number: H01J37/3053 ,  B08B3/08 ,  H01J27/024 ,  H01J37/063 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/083 ,  H01J2237/3151

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

Abstract translation: 提供了一种离子束处理装置，其包括离子产生室，处理室和通过将在离子产生室中产生的离子提取到处理室来形成离子束的电极。 所述电极包括靠近所述离子产生室设置的第一电极，并设置有离子通道孔以允许所述离子通过，以及邻近所述第一电极设置并且比所述第一电极更靠近所述处理室设置的第二电极，以及 设置有允许离子通过的离子通道孔。 该装置还包括分别对第一电极和第二电极施加不同电位的功率单元，以便加速由离子产生室中的离子发生器产生的离子。 第一电极的材料与第二电极的材料不同。

公开(公告)号：US20250014861A1

公开(公告)日：2025-01-09

申请号：US18890298

申请日：2024-09-19

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  B08B3/08 ,  H01J27/02 ,  H01J37/063 ,  H01J37/08 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US12119203B2

公开(公告)日：2024-10-15

申请号：US17739830

申请日：2022-05-09

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/30 ,  B08B3/08 ,  H01J27/02 ,  H01J37/063 ,  H01J37/08 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/3053 ,  B08B3/08 ,  H01J27/024 ,  H01J37/063 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/083 ,  H01J2237/3151

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US20210104377A1

公开(公告)日：2021-04-08

申请号：US17123883

申请日：2020-12-16

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  B08B3/08 ,  H01J27/02 ,  H01J37/063 ,  H01J37/08 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.