公开(公告)号：US11961697B2

公开(公告)日：2024-04-16

申请号：US18144131

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/15 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：US11594396B2

公开(公告)日：2023-02-28

申请号：US16834778

申请日：2020-03-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-Wei Chen

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244

Abstract: A multi-beam inspection apparatus supporting a plurality of operation modes is disclosed. The charged particle beam apparatus for inspecting a sample supporting a plurality of operation modes comprises a charged particle beam source configured to emit a charged particle beam along a primary optical axis, a movable aperture plate, movable between a first position and a second position, and a controller having circuitry and configured to change the configuration of the apparatus to switch between a first mode and a second mode. In the first mode, the movable aperture plate is positioned in the first position and is configured to allow a first charged particle beamlet derived from the charged particle beam to pass through. In the second mode, the movable aperture plate is positioned in the second position and is configured to allow the first charged particle beamlet and a second charged particle beamlet to pass through.

公开(公告)号：US11222766B2

公开(公告)日：2022-01-11

申请号：US16652398

申请日：2018-09-28

Applicant: ASML Netherlands B.V.

Inventor： Joe Wang ,  Yongxin Wang ,  Zhong-Wei Chen ,  Xuerang Hu

IPC: H01J37/244 ,  H01J37/28

Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.

公开(公告)号：US12278081B2

公开(公告)日：2025-04-15

申请号：US17598841

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Qingpo Xi ,  Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

IPC: H01J37/05 ,  H01J37/147

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

公开(公告)号：US12243709B2

公开(公告)日：2025-03-04

申请号：US17373766

申请日：2021-07-12

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-Wei Chen

IPC: H01J37/145

Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.