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公开(公告)号:US12196692B2
公开(公告)日:2025-01-14
申请号:US17769690
申请日:2020-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor: Weiming Ren , Xuedong Liu , Zhong-wei Chen , Xiaoyu Ji , Xiaoxue Chen , Weimin Zhou , Frank Nan Zhang
IPC: G01N23/2202 , G01N1/44 , G01N23/2251 , H01J37/02 , H01J37/244 , H01J37/28
Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
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公开(公告)号:US11164719B2
公开(公告)日:2021-11-02
申请号:US16651337
申请日:2018-09-25
Applicant: ASML Netherlands B.V.
Inventor: Yixiang Wang , Frank Nan Zhang
IPC: H01J37/28 , H01J37/26 , G01N23/203 , G01N23/2251
Abstract: Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rate of deposition during the first time period and an average rate of deposition during the second time period are different.
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3.
公开(公告)号:US11929232B2
公开(公告)日:2024-03-12
申请号:US17026044
申请日:2020-09-18
Applicant: ASML Netherlands B.V.
Inventor: Frank Nan Zhang , Zhongwei Chen , Yixiang Wang , Ying Crystal Shen
CPC classification number: H01J37/265 , H01J37/045 , H01J37/266 , H01J37/28 , H01J2237/0044 , H01J2237/0048 , H01J2237/0453 , H01J2237/0455 , H01J2237/0458 , H01J2237/049 , H01J2237/28 , H01J2237/2817
Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
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公开(公告)号:US12087542B2
公开(公告)日:2024-09-10
申请号:US17516654
申请日:2021-11-01
Applicant: ASML Netherlands B.V.
Inventor: Yixiang Wang , Frank Nan Zhang
IPC: H01J37/28 , G01N23/203 , G01N23/2251 , H01J37/26
CPC classification number: H01J37/28 , G01N23/203 , G01N23/2251 , H01J37/261 , H01J2237/0048 , H01J2237/2817
Abstract: Disclosed herein is a method comprising depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rale of deposition during the first time period, and an average rate of deposition during the second time period are different.
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公开(公告)号:US11513087B2
公开(公告)日:2022-11-29
申请号:US17073271
申请日:2020-10-16
Applicant: ASML Netherlands B.V.
Inventor: Weiming Ren , Xuedong Liu , Zhong-wei Chen , Xiaoyu Ji , Xiaoxue Chen , Weimin Zhou , Frank Nan Zhang
IPC: G01N23/2202 , G01N1/44 , G01N23/2251
Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
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6.
公开(公告)号:US10784077B2
公开(公告)日:2020-09-22
申请号:US16053636
申请日:2018-08-02
Applicant: ASML Netherlands B.V.
Inventor: Frank Nan Zhang , Zhongwei Chen , Yixiang Wang , Ying Crystal Shen
Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
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