公开(公告)号：US20150221473A1

公开(公告)日：2015-08-06

申请号：US14526172

申请日：2014-10-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Makoto SATO ,  Atsushi UEMOTO

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract translation: 一种带电粒子束装置，包括用带电粒子束照射样品的柱，检测从样品发射的二次粒子的检测器，图像数据生成部，生成表示由二次粒子的量的二维分布的二维分布的图像数据， 所述检测器和控制器分别在所述图像数据的样品的表面上分别设置用于第一和第二光束条件的第一和第二位置调整照射帧，通过分别照射所述第一和第二位置调整照射来形成第一和第二照射迹线 具有第一和第二光束条件的带电粒子束的帧，基于第一照射迹线的预定位置和第二照射迹线的预定位置之间的位置偏移量来校正第二处理照射帧的位置。

公开(公告)号：US20140291512A1

公开(公告)日：2014-10-02

申请号：US14221611

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ikuko NAKATANI ,  Makoto SATO

IPC: G01N23/225

CPC classification number: G01N23/2258 ,  G01N1/32 ,  G01N23/2251 ,  H01J37/3045 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A focused ion beam apparatus includes: an image generation unit which generates a sample image including location detection marks formed on a sample based on secondary charged particles generated with emission of a focused ion beam to a sample; a display unit which displays a sample image; and a control unit which, in a case of performing working by emitting the focused ion beam to a working region beyond a display range, moves a sample stage, detects locations of the location detection marks included in the sample image after the movement of the sample stage as reference marks from the location detection marks included in the sample image before moving the sample stage, and controls an emission location of the focused ion beam based on the reference marks detected in the sample image after being moved.

Abstract translation: 聚焦离子束装置包括：图像生成单元，其基于通过发射聚焦离子束而产生的二次带电粒子产生包含在样本上形成的位置检测标记的样本图像; 显示单元，其显示样本图像; 以及控制单元，在通过将聚焦离子束发射到超过显示范围的工作区域进行工作的情况下，移动样品台，检测样品移动后样品图像中包含的位置检测标记的位置 在移动样品台之前，将样本图像中包含的位置检测标记作为参考标记，并且基于移动后的样本图像中检测到的参考标记来控制聚焦离子束的发射位置。

公开(公告)号：US20250014859A1

公开(公告)日：2025-01-09

申请号：US18687252

申请日：2021-09-01

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Tatsuya ASAHATA ,  Satoshi TOMIMATSU ,  Makoto SATO

IPC: H01J37/302 ,  H01J37/28

Abstract: The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.

公开(公告)号：US20180204704A1

公开(公告)日：2018-07-19

申请号：US15871753

申请日：2018-01-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masato SUZUKI ,  Satoshi TOMIMATSU ,  Makoto SATO

IPC: H01J37/20 ,  H01J37/28 ,  G01N23/2204 ,  H01J37/302 ,  H01J37/22

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N2223/418 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3023 ,  H01J2237/208 ,  H01J2237/2817 ,  H01J2237/31745

Abstract: Disclosed is a charged particle beam apparatus for automatically preparing a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that irradiates a charged particle beam, a sample stage that moves with the sample placed thereon, a sample piece transferring device that holds and transports the sample piece separated and extracted from the sample, a holder fixing base that holds a sample piece holder to which the sample piece is transferred, and a computer that performs control of destroying the sample piece held by the sample piece transferring device when an abnormality occurs after the sample piece transferring device holds the sample piece.

公开(公告)号：US20150270096A1

公开(公告)日：2015-09-24

申请号：US14665391

申请日：2015-03-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto SATO ,  Tatsuya ASAHATA ,  Masahiro KIYOHARA ,  Ikuko NAKATANI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/30438

Abstract: A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.

Abstract translation: 带电粒子束装置设置有控制器，其被配置为控制其他部件并执行操作，包括：照射操作，用于在逐渐改变带电粒子束的扫描范围以从 第一职位 第一图像获取操作，用于获取所述带电粒子束移动的每个部分的图像; 指示器形成操作，当带电粒子束的扫描范围达到第二位置时，通过带电粒子束在第二位置形成指示器; 第二图像获取操作，用于在形成指示器的状态下获取第二位置的图像; 以及调整操作，以调整带电粒子束的阶段和扫描范围之间的相对位置。

公开(公告)号：US20210090855A1

公开(公告)日：2021-03-25

申请号：US17027312

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma ASO ,  Xin MAN ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  G01N23/2258 ,  G01N23/2206

Abstract: The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

公开(公告)号：US20170278664A1

公开(公告)日：2017-09-28

申请号：US15468290

申请日：2017-03-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto SATO ,  Satoshi TOMIMATSU ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/02 ,  H01J37/20

CPC classification number: H01J37/023 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

公开(公告)号：US20160093467A1

公开(公告)日：2016-03-31

申请号：US14859726

申请日：2015-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Atsushi UEMOTO ,  Makoto SATO

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J2237/317

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

Abstract translation: 带电粒子束装置包括用于固定样品的台，用于驱动台的驱动机构，聚焦离子束柱，电子束柱，检测从照射了带电粒子束的样品发射的二次带电粒子的检测器 在样品的表面上供给用于形成沉积膜的气体的气体供给装置，以及生成表示由检测器检测出的二次带电粒子的位置分布的图像数据的控制装置。 控制装置在用聚焦离子束照射样品之前用电子束照射样品，通过电子束识别图像数据中的样品中提供的对准标记，并使用该样品的照射区域进行定位 对齐标记。

公开(公告)号：US20190304745A1

公开(公告)日：2019-10-03

申请号：US16364898

申请日：2019-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masato SUZUKI ,  Satoshi TOMIMATSU ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/305 ,  H01J37/20

Abstract: To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.

公开(公告)号：US20170178858A1

公开(公告)日：2017-06-22

申请号：US15448308

申请日：2017-03-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi TOMIMATSU ,  Makoto SATO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Yo YAMAMOTO

IPC: H01J37/302 ,  H01J37/20

CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.