- 专利标题: CHARGED PARTICLE BEAM APPARATUS
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申请号: US15468290申请日: 2017-03-24
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公开(公告)号: US20170278664A1公开(公告)日: 2017-09-28
- 发明人: Makoto SATO , Satoshi TOMIMATSU , Atsushi UEMOTO , Tatsuya ASAHATA
- 申请人: HITACHI HIGH-TECH SCIENCE CORPORATION
- 优先权: JP2016-062672 20160325
- 主分类号: H01J37/02
- IPC分类号: H01J37/02 ; H01J37/20
摘要:
A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.
公开/授权文献
- US10658147B2 Charged particle beam apparatus 公开/授权日:2020-05-19
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