公开(公告)号：US20210090851A1

公开(公告)日：2021-03-25

申请号：US17030992

申请日：2020-09-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20 ,  H01J37/26

Abstract: To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.

公开(公告)号：US20160064187A1

公开(公告)日：2016-03-03

申请号：US14833563

申请日：2015-08-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi TOMIMATSU ,  Makoto SATO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Yo YAMAMOTO

IPC: H01J37/302 ,  H01J37/20

CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

Abstract: ProblemTo automatically repeat an operation of extracting and transferring a sample piece, which is formed by processing a sample using an ion beam, to a sample piece holder.SolutionA charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

Abstract translation: 问题为了自动重复将通过使用离子束处理样品而形成的样品的提取和转印操作重复到样品片保持器。 解决方案带电粒子束包括：计算机，其使用由通过用带电粒子束照射针而获得的吸收的当前图像形成的模板来控制针致动机构以使针接近样本片，并且将针 从通过用带电粒子束照射针获得的二次电子图像获取针。

公开(公告)号：US20150115156A1

公开(公告)日：2015-04-30

申请号：US14520595

申请日：2014-10-22

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hidekazu SUZUKI ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/26 ,  H01J37/305 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3056 ,  G01N1/32 ,  H01J37/304 ,  H01J2237/31745

Abstract: A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.

Abstract translation: 提供一种横截面加工方法和横截面加工装置，其中可以在通过聚焦离子束由具有不同硬度的多种物质组成的样品中形成平坦的横截面。 基于通过观察截面获得的SEM图像的横截面信息，可以可变地控制聚焦离子束的照射间隔，照射时间等进行处理区域的蚀刻。 以这种方式，即使样品由具有不同硬度的多种物质组成，也可以形成具有均匀蚀刻速率的平坦观察面。

公开(公告)号：US20210296084A1

公开(公告)日：2021-09-23

申请号：US17203008

申请日：2021-03-16

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masahiro KIYOHARA ,  Atsushi UEMOTO

IPC: H01J37/20 ,  H01J37/304

Abstract: Provided is a charged particle beam apparatus including a focused ion beam column, a sample holder, a stage supporting the sample holder, a securing member rotating unit, a stage driving unit, and a control device. The sample holder includes a securing member fixing a sample. The securing member rotating unit rotates the securing member around a first rotational axis and a second rotational axis. The stage driving unit translates the stage in three dimensions and rotates the stage around a third rotational axis. The control device acquires a correction value for correcting a change in a position of a center of rotation for rotation around at least one among a first rotational axis, a second rotational axis, and a third rotational axis. The control device translates the stage according to the correction value.

公开(公告)号：US20150228451A1

公开(公告)日：2015-08-13

申请号：US14617273

申请日：2015-02-09

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Hidekazu SUZUKI ,  Yo YAMAMOTO

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/3023 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2602

Abstract: A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.

Abstract translation: 带电粒子束装置包括：带电粒子束柱，被配置为用照射目标的带电粒子束; 检测器，被配置为通过照射带电粒子束来检测从照射目标物发射的二次带电粒子; 布置在带电粒子束的照射区域中的针; 针致动器，其构造成致动所述针; 以及控制器，被配置为控制针致动器沿着由预设目标位置和预设路线点构成的移动路线致动针。 控制器控制针致动器以为每个路点设置针的致动方向。

公开(公告)号：US20150221473A1

公开(公告)日：2015-08-06

申请号：US14526172

申请日：2014-10-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Makoto SATO ,  Atsushi UEMOTO

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract translation: 一种带电粒子束装置，包括用带电粒子束照射样品的柱，检测从样品发射的二次粒子的检测器，图像数据生成部，生成表示由二次粒子的量的二维分布的二维分布的图像数据， 所述检测器和控制器分别在所述图像数据的样品的表面上分别设置用于第一和第二光束条件的第一和第二位置调整照射帧，通过分别照射所述第一和第二位置调整照射来形成第一和第二照射迹线 具有第一和第二光束条件的带电粒子束的帧，基于第一照射迹线的预定位置和第二照射迹线的预定位置之间的位置偏移量来校正第二处理照射帧的位置。

公开(公告)号：US20150060695A1

公开(公告)日：2015-03-05

申请号：US14470183

申请日：2014-08-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/317 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/317 ,  H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J37/3056 ,  H01J2237/20214 ,  H01J2237/2067 ,  H01J2237/2445 ,  H01J2237/24585 ,  H01J2237/25 ,  H01J2237/2555 ,  H01J2237/2561

Abstract: A charged particle beam apparatus includes: an electron beam irradiation unit irradiating a sample with electron beams having a first irradiation axis; a rotation stage holding the sample and having a rotation axis in a direction perpendicular to the first irradiation axis; an ion beam irradiation unit irradiating the sample with ion beams having a second irradiation axis that is substantially parallel to the rotation axis; a detection unit detecting at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams and electron beams; and a gaseous ion beam irradiation unit irradiating the sample with gaseous ion beams.

Abstract translation: 带电粒子束装置包括：电子束照射单元，用具有第一照射轴的电子束照射样品; 旋转台，保持所述样品并且具有与所述第一照射轴垂直的方向的旋转轴; 离子束照射单元，用具有大致平行于旋转轴的第二照射轴的离子束照射样品; 检测单元，通过用离子束和电子束的照射检测经由样品产生的带电粒子和X射线中的至少一个; 气态离子束照射单元用气体离子束照射样品。

公开(公告)号：US20150060664A1

公开(公告)日：2015-03-05

申请号：US14475046

申请日：2014-09-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: G01N23/22 ,  G01N23/225 ,  G01N1/32 ,  G01N23/203

CPC classification number: H01J37/222 ,  G01N1/32 ,  G01N23/20091 ,  G01N23/2202 ,  G01N23/2251 ,  G01N2223/418 ,  H01J37/28 ,  H01J37/292 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/2811 ,  H01J2237/31749

Abstract: A cross-section processing-and-observation method includes: a cross-section exposure step of irradiating a sample with a focused ion beam to expose a cross-section of the sample; a cross-sectional image acquisition step of irradiating the cross-section with an electron beam to acquire a cross-sectional image of the cross-section; and a step of repeatedly performing the cross-section exposure step and the cross-sectional image acquisition step along a predetermined direction of the sample at a setting interval to acquire a plurality of cross-sectional images of the sample. In the cross-sectional image acquisition step, a cross-sectional image is acquired under different condition settings for a plurality of regions of the cross-section.

Abstract translation: 横截面加工和观察方法包括：横截面曝光步骤，用聚焦离子束照射样品以暴露样品的横截面; 横截面图像获取步骤，用电子束照射横截面以获得横截面的横截面图像; 以及以设定间隔沿着样品的规定方向重复进行横截面曝光工序和横截面图像获取工序的步骤，取得样品的多个横截面图像。 在横截面图像获取步骤中，在横截面的多个区域的不同条件设置下获取横截面图像。

公开(公告)号：US20250140518A1

公开(公告)日：2025-05-01

申请号：US18692790

申请日：2021-09-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki NAGAMINE ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Xin MAN

IPC: H01J37/304 ,  H01J37/26 ,  H01J37/30 ,  H01J37/305

Abstract: This machining method includes: a machining step of irradiating a sample constituted from a stack of multiple layers with a focused ion beam so as to machine a cross-section of the sample by a predetermined amount; an image generation step of generating an observation image of the cross-section of the sample by irradiating the sample with an electron beam after the machining step is ended; and a specific-layer determination step of determining whether a specific layer of the multiple layers is exposed based on the observation image.

公开(公告)号：US20240379323A1

公开(公告)日：2024-11-14

申请号：US18692789

申请日：2021-09-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki NAGAMINE ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Xin MAN

IPC: H01J37/22 ,  H01J37/26

Abstract: The present invention provides a control method for a charged particle beam device for irradiating a sample in which a plurality of layers is laminated with a focused ion beam to process a cross-section of the sample at a processing angle that is a prescribed angle. The control method includes: an image generation step for irradiating the sample with an electron beam, detecting secondary electrons or reflected electrons generated from the sample, and generating an observation image of a cross-section of the sample based on results of detection; an angle deviation calculation step for calculating the angle deviation between the angle of the cross-section and the processing angle based on the observation image; and a control step for controlling orientation of the sample or a direction of radiation with the electron beam so as to eliminate the angle deviation calculated in the angle deviation calculation step.