公开(公告)号：US09899182B2

公开(公告)日：2018-02-20

申请号：US15329880

申请日：2014-12-22

申请人： INTEL CORPORATION

发明人： Yan A. Borodovsky

IPC分类号： H01J3/36 ,  G03F7/20 ,  H01L21/027 ,  H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  H01J37/3026 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769

摘要： Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.

公开(公告)号：US20170277043A1

公开(公告)日：2017-09-28

申请号：US15620699

申请日：2017-06-12

申请人： Mapper Lithography IP B.V.

发明人： Guido de Boer ,  Thomas Adriaan Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

摘要： The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.

公开(公告)号：US09760028B2

公开(公告)日：2017-09-12

申请号：US14383570

申请日：2013-03-08

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Niels Vergeer

IPC分类号： G03B27/58 ,  G03F9/00 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

CPC分类号： G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7088 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30438

摘要： A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.

公开(公告)号：US09678443B2

公开(公告)日：2017-06-13

申请号：US13436736

申请日：2012-03-30

申请人： Guido de Boer ,  Thomas Adriaan Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

发明人： Guido de Boer ,  Thomas Adriaan Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC分类号： G03B27/42 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

摘要： The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.

公开(公告)号：US20170125208A1

公开(公告)日：2017-05-04

申请号：US15338637

申请日：2016-10-31

申请人： NuFlare Technology, Inc.

发明人： Nobutaka KIKUIRI ,  lkunao ISOMURA

IPC分类号： H01J37/22 ,  H01J37/04 ,  H01J37/141 ,  H01J37/20 ,  H01J37/244

CPC分类号： H01J37/222 ,  H01J37/045 ,  H01J37/141 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

摘要： A pattern inspection apparatus includes a data processing circuitry to input detection data based on a secondary electron from a substrate for each irradiation unit region, where n1×m1 irradiation unit regions in irradiation unit regions configure one of n2×m2 image reference regions configuring an inspection measurement image, to calculate, for each of the n2×m2 image reference regions, a statistic value acquired from the detection data of all the n1×m1 irradiation unit regions in one of the n2×m2 image reference regions, and to define the statistic value as image reference data for the image reference region, and a comparison processing circuitry to receive transmission of the image reference data for each image reference region, and to compare, using a reference image corresponding to the inspection measurement image composed of the n2×m2 image reference regions, the measurement image with the reference image for each image reference region.

公开(公告)号：US09606460B2

公开(公告)日：2017-03-28

申请号：US14940349

申请日：2015-11-13

申请人： CANON KABUSHIKI KAISHA

发明人： Yuichi Iwasaki ,  Satoru Oishi ,  Hideki Ina

IPC分类号： G21K5/04 ,  G03F9/00

CPC分类号： G03F9/70 ,  G03F9/7088 ,  H01J2237/30438 ,  H01J2237/3175

摘要： The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

公开(公告)号：US09366524B2

公开(公告)日：2016-06-14

申请号：US14481076

申请日：2014-09-09

申请人： KLA-Tencor Corporation

发明人： Mark A. McCord ,  Joseph DiRegolo

IPC分类号： G01B11/14 ,  G01B11/06 ,  G01B11/27 ,  G03F9/00

CPC分类号： G01B11/0608 ,  G01B11/27 ,  G03F9/7007 ,  G03F9/7034 ,  G03F9/7069 ,  H01J2237/2482 ,  H01J2237/30438 ,  H01J2237/31774

摘要： One embodiment relates to a device that senses alignment and height of a work piece. The device may include both an alignment sensor and a height sensor. The alignment sensor generates a first illumination beam that illuminates an alignment mark on the work piece so as to create a first reflected beam, and determines the alignment of the work piece using the first reflected beam. The height sensor generates a second illumination beam that is directed to a surface of the work piece at an oblique angle so as to form a second illumination spot and images the second illumination spot to determine the height of the work piece. Other embodiments, aspects and features are also disclosed.

摘要翻译： 一个实施例涉及感测工件的对准和高度的装置。 该装置可以包括对准传感器和高度传感器。 对准传感器产生照亮工件上的对准标记的第一照明光束，以产生第一反射光束，并且使用第一反射光束确定工件的对准。 所述高度传感器产生第二照明光束，所述第二照明光束以斜角指向所述工件的表面，以便形成第二照明光点并且对所述第二照明光斑进行成像以确定所述工件的高度。 还公开了其它实施例，方面和特征。

公开(公告)号：US20150213997A1

公开(公告)日：2015-07-30

申请号：US14684607

申请日：2015-04-13

申请人： Carl Zeiss Microscopy, LLC

发明人： Billy W. Ward ,  John A. Notte, IV ,  Louis S. Farkas, III ,  Randall G. Percival ,  Raymond Hill ,  Klaus Edinger ,  Lars Markwort ,  Dirk Aderhold ,  Ulrich Mantz

IPC分类号： H01J37/08 ,  H01J37/304 ,  H01J37/305 ,  H01J37/256 ,  H01J37/317

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J27/26 ,  H01J37/08 ,  H01J37/20 ,  H01J37/252 ,  H01J37/256 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/08 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/2566 ,  H01J2237/2623 ,  H01J2237/2812 ,  H01J2237/30438 ,  H01J2237/31701 ,  H01J2237/3174 ,  H01J2237/3175 ,  H01J2237/31755

摘要： Ion sources, systems and methods are disclosed.

公开(公告)号：US09035248B2

公开(公告)日：2015-05-19

申请号：US14279679

申请日：2014-05-16

申请人： CANON KABUSHIKI KAISHA

发明人： Naosuke Nishimura

IPC分类号： H01J37/30 ,  H01J37/20 ,  H01J37/317

CPC分类号： H01J37/20 ,  H01J37/3177 ,  H01J2237/2001 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/30438

摘要： The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising an optical system configured to irradiate the substrate with the charged particle beam, a substrate stage configured to hold the substrate, an aperture member provided with the substrate stage, a detector configured to detect a charged particle beam having passed through an aperture of the aperture member, and a support configured to support the detector, wherein the support and the substrate stage are separated from each other.

摘要翻译： 本发明提供了一种用于在带有带电粒子束的衬底上进行绘图的绘图装置，该装置包括被配置为用带电粒子束照射衬底的光学系统，被配置为保持衬底的衬底台， 衬底台，被配置为检测穿过孔径构件的孔的带电粒子束的检测器和被配置为支撑检测器的支撑件，其中支撑件和衬底台架彼此分离。

公开(公告)号：US08003956B2

公开(公告)日：2011-08-23

申请号：US12244978

申请日：2008-10-03

申请人： D. Jeffrey Lischer ,  John (Bon-Woong) Koo ,  Peter F. Kurunczi ,  Shardul Patel ,  Wilhelm P. Platow

发明人： D. Jeffrey Lischer ,  John (Bon-Woong) Koo ,  Peter F. Kurunczi ,  Shardul Patel ,  Wilhelm P. Platow

IPC分类号： G21K5/10

CPC分类号： H01J37/3171 ,  H01J37/026 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/006 ,  H01J2237/047 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/248 ,  H01J2237/30438 ,  H01J2237/30477 ,  H01J2237/31701 ,  H01J2237/31703

摘要： An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an aperture. A work piece positioned downstream of the ion source for receiving the extracted ions in the form of an ion beam. A bleed gas channel disposed between the ion source and the work piece. The bleed gas channel supplying a gas used to neutralize the space charge effect associated with the ion beam.

摘要翻译： 一种用于中和与高电流低能量离子束相关的空间电荷效应的离子注入系统。 植入系统包括被配置为接收掺杂剂气体并产生具有特定能量和质量的离子的离子源，离子通过孔提取离子。 位于离子源下游的工件，用于接收离子束形式的提取的离子。 排放气体通道，设置在离子源和工件之间。 排出气体通道供应用于中和与离子束相关联的空间电荷效应的气体。