公开(公告)号：US20240234078A1

公开(公告)日：2024-07-11

申请号：US18095951

申请日：2023-01-11

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Adam Faust ,  Yosef Basson

IPC: H01J37/02 ,  H01J37/20

CPC classification number: H01J37/026 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/2007

Abstract: A device for discharging an electrostatic chuck located within a vacuum chamber, the device includes a plasma distribution unit that is configured to receive plasma from an external plasma source that is located outside the vacuum chamber, and perform a distribution of the plasma within the vacuum chamber that discharges the electrostatic chuck. The device also includes a controller for controlling the distribution of the plasma; wherein the distribution of the plasma occurs during a plasma distribution period that is shorter than a duration of a plasma based cleaning process of the electrostatic chuck.

公开(公告)号：US11915901B2

公开(公告)日：2024-02-27

申请号：US18023545

申请日：2021-08-27

Applicant: ULVAC-PHI, INCORPORATED

Inventor： Scott R. Bryan ,  Gregory L. Fisher ,  David H. Narum ,  Ronald E. Negri

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/2527

Abstract: Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons or secondary ions which are detected and provide the modulated signal for imaging of the sample; and dual polarity flood beams to effect neutralization of surface charge and surface potential variation.

公开(公告)号：US20190170671A1

公开(公告)日：2019-06-06

申请号：US16147277

申请日：2018-09-28

Applicant: Hermes Microvision, Inc.

Inventor： Guochong WENG ,  Youjin WANG ,  Chiyan KUAN ,  Chung-Shih PAN

IPC: G01N23/2251 ,  H05F3/02 ,  H01J37/28 ,  H01J37/02 ,  H01J37/20

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US20170207063A1

公开(公告)日：2017-07-20

申请号：US15131520

申请日：2016-04-18

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Michael W. Osborne ,  David E. Suuronen ,  Julian G. Blake

IPC: H01J37/304 ,  H01L21/66 ,  H01J37/317 ,  H01L21/265

CPC classification number: H01J37/304 ,  H01J37/026 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/30405 ,  H01J2237/31703 ,  H01L21/265 ,  H01L22/14 ,  H01L22/20

Abstract: An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generating a control signal responsive to a measurement signal, the control signal to adjust operation of the plasma flood gun to a target operating level. At the target operating level the flux of electrons may comprise a stabilizing dose of electrons, the stabilizing concentration of electrons, the stabilizing concentration reducing a clamp current variation in the electrostatic clamp to a target value, the target value being less than a second value of clamp current variation when the plasma flood gun is not operating.

公开(公告)号：US09484180B2

公开(公告)日：2016-11-01

申请号：US14475905

申请日：2014-09-03

Applicant: Tokyo Electron Limited

Inventor： Manabu Iwata ,  Yasuharu Sasaki

IPC: H01J37/32 ,  H01J37/02

CPC classification number: H01J37/026 ,  H01J37/32091 ,  H01J37/32697

Abstract: A plasma processing apparatus includes a processing chamber; a conductive base within the processing chamber; an electrostatic chuck, having an electrode, provided on the base; a high frequency power supply that applies a high frequency power to the base; a first DC power supply that applies a DC voltage to the electrostatic chuck; and a plasma generation unit that generates plasma of a processing gas within the processing chamber. A plasma processing method performed in the plasma processing apparatus includes connecting the first DC power supply to the electrode of the electrostatic chuck; cutting off connection between the first DC power supply and the electrode of the electrostatic chuck; and generating the plasma within the processing chamber by applying the high frequency power to the base in a state that the connection between the first DC power supply and the electrode of the electrostatic chuck is cut off.

Abstract translation: 等离子体处理装置包括处理室; 处理室内的导电基底; 具有设置在基座上的电极的静电卡盘; 将高频电源施加到基座的高频电源; 向所述静电卡盘施加直流电压的第一直流电源; 以及等离子体产生单元，其产生处理室内的处理气体的等离子体。 在等离子体处理装置中执行的等离子体处理方法包括将第一DC电源连接到静电卡盘的电极; 切断第一直流电源与静电卡盘的电极之间的连接; 以及在所述第一DC电源和所述静电卡盘的电极之间的连接被切断的状态下，通过向所述基座施加所述高频电力，在所述处理室内产生所述等离子体。

公开(公告)号：US20160307733A1

公开(公告)日：2016-10-20

申请号：US15193317

申请日：2016-06-27

Applicant: Foret Plasma Labs, LLC

Inventor： Todd Foret

IPC: H01J37/32 ,  H05H1/30 ,  F22B1/28 ,  H01J37/02

CPC classification number: H01J37/32027 ,  F22B1/281 ,  H01J37/026 ,  H01J37/32018 ,  H01J37/32513 ,  H01J37/32541 ,  H01J37/32568 ,  H05H1/30 ,  H05H1/3405 ,  H05H1/42 ,  H05H1/48 ,  H05H2001/3489

Abstract: The present invention provides a glow discharge assembly that includes an electrically conductive cylindrical screen, a flange assembly, an electrode, an insulator and a non-conductive granular material. The electrically conductive cylindrical screen has an open end and a closed end. The flange assembly is attached to and electrically connected to the open end of the electrically conductive cylindrical screen. The flange assembly has a hole with a first diameter aligned with a longitudinal axis of the electrically conductive cylindrical screen. The electrode is aligned with the longitudinal axis of the electrically conductive cylindrical screen and extends through the hole of the flange assembly into the electrically conductive cylindrical screen. The insulator seals the hole of the flange assembly around the electrode and maintains a substantially equidistant gap between the electrically conductive cylindrical screen and the electrode. The non-conductive granular material is disposed within the substantially equidistant gap.

Abstract translation: 本发明提供了一种辉光放电组件，其包括导电圆柱形屏幕，凸缘组件，电极，绝缘体和非导电颗粒材料。 导电圆柱形屏幕具有开口端和封闭端。 凸缘组件附接到导电圆柱形屏幕的开口端并电连接到导电圆柱形屏幕的开口端。 凸缘组件具有孔，其第一直径与导电圆柱形筛网的纵向轴线对准。 电极与导电圆柱形屏幕的纵向轴线对准，并延伸穿过凸缘组件的孔进入导电圆柱形屏幕。 绝缘体围绕电极密封凸缘组件的孔，并且在导电圆柱形屏幕和电极之间保持基本上等距的间隙。 非导电颗粒材料设置在基本上等距离的间隙内。

公开(公告)号：US20160260574A1

公开(公告)日：2016-09-08

申请号：US15059712

申请日：2016-03-03

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz ,  Markus Esseling ,  Dirk Zeidler

IPC: H01J37/02 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0047 ,  H01J2237/006 ,  H01J2237/2801

Abstract: Methods are provided for operating a particle-optical device, wherein electrical charging of a sample to be examined is reduced. The particle-optical device includes a vacuum chamber for receiving a sample, a particle source for generating a primary particle beam directed to the sample, a scan generator for directed guidance of the primary particle beam over the sample surface, and at least one detector for detecting interaction products created during the interaction between the primary particle beam and the sample.

Abstract translation: 提供了用于操作粒子光学器件的方法，其中减少了待检样品的电荷。 颗粒光学装置包括用于接收样品的真空室，用于产生指向样品的一次粒子束的粒子源，用于在样品表面上引导初级粒子束的扫描发生器，以及至少一个用于 检测在初级粒子束和样品之间的相互作用期间产生的相互作用产物。

公开(公告)号：US09355751B2

公开(公告)日：2016-05-31

申请号：US14541238

申请日：2014-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: G21K1/02 ,  G21K5/04 ,  H01J37/24 ,  H01J37/30 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

Abstract translation: 本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开，并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。

公开(公告)号：US20160035537A1

公开(公告)日：2016-02-04

申请号：US14446146

申请日：2014-07-29

Applicant: Applied Materials Israel, Ltd.

Inventor： Gilad Erel ,  Michal Avinun-Kalish ,  Stefan Lanio

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/08

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J2237/0044 ,  H01J2237/0048

Abstract: A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.

Abstract translation: 描述带电粒子束样品检查系统。 该系统包括用于发射至少一个带电粒子束的发射器，被配置为支撑样本的样本支撑台，用于聚焦至少一个带电粒子束的物镜，设置在物镜和样本支架之间的充电控制电极 其中所述充电控制电极具有用于所述至少一个带电粒子束的至少一个开口开口，以及配置为发射用于对所述样本进行充电的另外的带电粒子的泛喷枪，其中所述充电控制电极具有喷枪孔开口。

公开(公告)号：US09113538B2

公开(公告)日：2015-08-18

申请号：US14039939

申请日：2013-09-27

Applicant: HERMES MICROVISION, INC.

Inventor： You-Jin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: A61N5/00 ,  H05F3/02 ,  H01J37/02 ,  H01J37/20 ,  G01N23/225

CPC classification number: H05F3/02 ,  G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2008 ,  H01J2237/2811

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract translation: 提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。