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    Electron beam inspection method and electron beam inspection apparatus
    1.
    发明授权
    Electron beam inspection method and electron beam inspection apparatus 有权
    电子束检查方法和电子束检查装置

    公开(公告)号：US07863565B2

    公开(公告)日：2011-01-04

    申请号：US12149512

    申请日：2008-05-02

    申请人： Masaki Hasegawa ,  Hiroya Ohta

    发明人： Masaki Hasegawa ,  Hiroya Ohta

    IPC分类号： H01J37/26 ,  H01J37/29

    CPC分类号： G01N23/225 ,  H01J37/026 ,  H01J37/285 ,  H01J37/29 ,  H01J2237/0047 ,  H01J2237/221 ,  H01J2237/2446 ,  H01J2237/24495 ,  H01J2237/2482 ,  H01J2237/2855

    摘要： An electron beam inspection apparatus images reflected electrons and cancels negative charging derived from electron-beam irradiation. Ultraviolet rays are irradiated and an irradiated area of ultraviolet rays is displayed as a photoelectron image. The photoelectron image and a reflected-electron image are displayed on a monitor while being superposed on each other, to easily grasp the positional relationship between the images and the difference in size between them. Specifically, the shape of the irradiated area of an electron beam includes the shape of the irradiated area of ultraviolet rays on a display screen. The intensity of the ultraviolet rays in the irradiated area of the electron beam is adjusted while the reflected-electron imaging conditions for the reflected-electron image are sustained. Moreover, an amount-of-ultraviolet ray adjustment mechanism is controlled on the monitor so that an amount of the ultraviolet rays is adjusted while observing a reflected-electron image obtained during ultraviolet irradiation.

    摘要翻译： 电子束检查装置对反射电子进行成像并消除由电子束照射产生的负电荷。 照射紫外线，照射紫外线的区域作为光电子图像显示。 光电子图像和反射电子图像在彼此重叠的状态下显示在监视器上，以容易地掌握图像之间的位置关系和它们之间的尺寸差异。 具体地，电子束的照射区域的形状包括在显示屏上照射的紫外线区域的形状。 调整电子束的照射区域中的紫外线的强度，同时维持反射电子图像的反射电子成像条件。 此外，在监视器上控制紫外线量调节机构，使得在观察紫外线照射期间获得的反射电子图像的同时调节紫外线的量。

    Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
    2.
    发明申请
    Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same 有权
    带电粒子束装置，使用其散光的散光的方法和使用其的制造装置的方法

    公开(公告)号：US20080099697A1

    公开(公告)日：2008-05-01

    申请号：US11898358

    申请日：2007-09-11

    申请人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

    发明人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

    IPC分类号： G21K5/10

    CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/153 ,  H01J37/29 ,  H01J2237/0047 ,  H01J2237/1532 ,  H01J2237/216

    摘要： [Problem] To adjust astigmatism quickly with a simple algorithm by utilizing an autofocus estimation value of an image obtained from a pattern formed on a sample. [Means] A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focus estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.

    摘要翻译： [问题]通过利用从样品上形成的图案获得的图像的自动聚焦估计值，通过简单的算法快速调节像散。 用于通过对样品W施加带电粒子束以检测从样品发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样品W的带电粒子束装置300包括散光调节装置17，用于 调整带电粒子束的散光。 散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的聚焦估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴 带电粒子束在中心。 还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

    SURFACE-POTENTIAL DISTRIBUTION MEASURING APPARATUS, IMAGE CARRIER, AND IMAGE FORMING APPARATUS
    3.
    发明申请
    SURFACE-POTENTIAL DISTRIBUTION MEASURING APPARATUS, IMAGE CARRIER, AND IMAGE FORMING APPARATUS 有权
    表面电位分布测量装置，图像载体和图像形成装置

    公开(公告)号：US20080056746A1

    公开(公告)日：2008-03-06

    申请号：US11847790

    申请日：2007-08-30

    申请人： Hiroyuki SUHARA

    发明人： Hiroyuki SUHARA

    IPC分类号： G21K5/00 ,  G03G15/06

    CPC分类号： G01R31/305 ,  G03G15/5037 ,  G03G2215/00033 ,  G03G2215/00054 ,  H01J37/244 ,  H01J37/268 ,  H01J2237/0047 ,  H01J2237/0048 ,  H01J2237/2444 ,  H01J2237/24564 ,  H01J2237/2594

    摘要： A surface-potential distribution measuring apparatus includes an electron gun, an electron-beam optical system, an electron-emission panel, a detector, and a control system. The electron-beam optical system is located between the electron gun and a sample, and focuses a beam of electrons emitted from the electron gun to the surface of the sample. The electron-emission panel is located near the sample to be collided with at least part of the electrons via the sample, and emits secondary electrons corresponding to the number of collided electrons. The detector detects at least part of the secondary electrons. The control system obtains potential distribution on the surface of the sample based on a detection result obtained by the detector.

    摘要翻译： 表面电位分布测量装置包括电子枪，电子束光学系统，电子发射面板，检测器和控制系统。 电子束光学系统位于电子枪和样品之间，并将从电子枪发射的电子束聚焦到样品的表面。 电子发射面板位于样品附近，通过样品与至少部分电子碰撞，并发射对应于碰撞电子数的二次电子。 检测器检测至少部分二次电子。 控制系统根据检测器得到的检测结果，获得样品表面的电位分布。

    Charge neutralization of electron beam systems
    4.
    发明授权
    Charge neutralization of electron beam systems 失效
    电子束系统的电荷中和

    公开(公告)号：US06465795B1

    公开(公告)日：2002-10-15

    申请号：US09536897

    申请日：2000-03-28

    申请人： Juan R. Madonado ,  Lee H. Veneklasen ,  Matthias Brunner ,  Ralf Schmid

    发明人： Juan R. Madonado ,  Lee H. Veneklasen ,  Matthias Brunner ,  Ralf Schmid

    IPC分类号： H01J4000

    CPC分类号： H01J37/026 ,  G01N23/225 ,  H01J2237/0047 ,  H01J2237/3175

    摘要： In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.

    摘要翻译： 在带电粒子或电子束系统中，诸如氩或氦的气体被引入到衬底的表面上并电离以中和由撞击的带电粒子引起的相互作用累积在表面上的电荷。 气体可以分布在整个气体室中或限制在基板上方的区域中。 用于离子化气体的辐射束可以被引导穿过或朝向衬底的表面。 在后一种情况下，气体压力可以减小到零。

    Electrostatic chucking method
    5.
    发明授权
    Electrostatic chucking method 失效
    静电吸盘法

    公开(公告)号：US5221450A

    公开(公告)日：1993-06-22

    申请号：US741080

    申请日：1991-08-06

    申请人： Kei Hattori ,  Makoto Sekine

    发明人： Kei Hattori ,  Makoto Sekine

    IPC分类号： H01L21/304 ,  H01L21/683

    CPC分类号： H01J37/32862 ,  H01L21/6831 ,  H01L21/6833 ,  H01J2237/0047 ,  H01J2237/2007

    摘要： Disclosed is an electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked electrostatically on a chucking material containing an electrode; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it with a plasma gas for a predetermined period. Further, the plasma gas may be capable of etching the chucking material.

    摘要翻译： 公开了一种静电夹持方法，包括以下步骤：（a）将要静电夹持的基板放置在包含电极的夹持材料上; （b）通过向卡盘材料中的电极提供预定的电位将基板夹持到卡盘材料上; （c）从夹紧材料中去除基材; 和（d）通过用等离子体气体溅射预定时间来消除卡盘材料上的剩余电荷。 此外，等离子体气体可以能够蚀刻夹持材料。

    METHODS AND DEVICES FOR CHARGE COMPENSATION
    7.
    发明申请
    METHODS AND DEVICES FOR CHARGE COMPENSATION 审中-公开
    电荷补偿的方法和装置

    公开(公告)号：US20160260574A1

    公开(公告)日：2016-09-08

    申请号：US15059712

    申请日：2016-03-03

    申请人： Carl Zeiss Microscopy GmbH

    发明人： Andreas Schmaunz ,  Markus Esseling ,  Dirk Zeidler

    IPC分类号： H01J37/02 ,  H01J37/22 ,  H01J37/28

    CPC分类号： H01J37/026 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0047 ,  H01J2237/006 ,  H01J2237/2801

    摘要： Methods are provided for operating a particle-optical device, wherein electrical charging of a sample to be examined is reduced. The particle-optical device includes a vacuum chamber for receiving a sample, a particle source for generating a primary particle beam directed to the sample, a scan generator for directed guidance of the primary particle beam over the sample surface, and at least one detector for detecting interaction products created during the interaction between the primary particle beam and the sample.

    摘要翻译： 提供了用于操作粒子光学器件的方法，其中减少了待检样品的电荷。 颗粒光学装置包括用于接收样品的真空室，用于产生指向样品的一次粒子束的粒子源，用于在样品表面上引导初级粒子束的扫描发生器，以及至少一个用于 检测在初级粒子束和样品之间的相互作用期间产生的相互作用产物。

    CHARGED PARTICLE BEAM APPARATUS
    8.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20150097123A1

    公开(公告)日：2015-04-09

    申请号：US14376901

    申请日：2013-01-28

    申请人： Hitachi High-Technologies Corporation

    发明人： Yasushi Ebizuka ,  Seiichiro Kanno ,  Makoto Nishihara ,  Masashi Fujita

    IPC分类号： H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H02N13/00

    CPC分类号： H01J37/226 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/06 ,  H01J2237/2007 ,  H01J2237/2801 ,  H02N13/00

    摘要： An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.

    摘要翻译： 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。