公开(公告)号：US12107519B2

公开(公告)日：2024-10-01

申请号：US18080589

申请日：2022-12-13

申请人： Selfie Snapper, Inc.

发明人： Denis Koci

IPC分类号： B25J9/16 ,  H02N13/00

CPC分类号： H02N13/00

摘要： Disclosed embodiments include electroadhesion devices for securing smartphones and other consumer devices to target surfaces. In various embodiments, the electroadhesion device may include a digital switch for adjusting the output voltage generated by a voltage converter. The digital switch may enable safe operation of the electroadhesion device by ensuring the output voltage generated by the voltage converter is compatible with the target surface. To determine a compatible output voltage, the electroadhesion device may include one or more sensors that may measure one or more characteristics of the target surface including conductivity, porosity, hardness, smoothness, and the like.

公开(公告)号：US20240280088A1

公开(公告)日：2024-08-22

申请号：US18172637

申请日：2023-02-22

申请人： Toyota Motor Engineering & Manufacturing North America, Inc.

发明人： Yufei Zhu ,  Paul A. Gilmore ,  Taewoo Nam ,  Rikin Gupta ,  Xintong Deng

IPC分类号： F03G7/06 ,  H02N13/00

CPC分类号： F03G7/06143 ,  F03G7/062 ,  H02N13/00 ,  F03G7/066

摘要： An actuator can include one or more shape memory material members and an electrostatic clutch. When an activation input is provided to the one or more shape memory material members, the one or more shape memory material members contract, which causes the actuator to morph into an activated configuration. A height of the actuator increases in the activated configuration. The electrostatic clutch can be configured to maintain the actuator in the activated configuration when the activation input to the one or more shape memory material members is discontinued. One or more processors can be operatively connected to selectively and independently activate the one or more shape memory material members and the electrostatic clutch.

公开(公告)号：US20240258940A1

公开(公告)日：2024-08-01

申请号：US18103600

申请日：2023-01-31

申请人： Applied Materials, Inc.

发明人： Mitsutoshi FUKADA

IPC分类号： H02N13/00 ,  B23Q3/15

CPC分类号： H02N13/00 ,  B23Q3/15

摘要： Embodiments of substrate supports for use in process chambers are provided herein. In some embodiments, a substrate support includes: an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches; and one or more chucking electrodes disposed in the ESC.

公开(公告)号：US20240234107A1

公开(公告)日：2024-07-11

申请号：US18399821

申请日：2023-12-29

申请人： Tokyo Electron Limited

发明人： Masato MINAMI ,  Tomoya WATANABE

IPC分类号： H01J37/32 ,  H02N13/00

CPC分类号： H01J37/32715 ,  H02N13/00 ,  H01J2237/2007

摘要： An electrostatic chuck having a support surface configured to support a substrate, wherein the support surface is configured by a plurality of protrusions that is formed at a same height and is arranged in a direction in which the support surface extends, wherein a distance between the plurality of protrusions adjacent to each other is in a range of 0.2 mm to 0.5 mm, and wherein, in a plan view of the support surface, an area occupancy rate of the plurality of protrusions in a 1 mm2 unit of the support surface is in a range of 3% to 40%.

公开(公告)号：US12028000B2

公开(公告)日：2024-07-02

申请号：US18132617

申请日：2023-04-10

申请人： ASML Netherlands B.V.

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Jeroen Gertruda Antonius Huinck ,  Han Willem Hendrik Severt ,  Allard Eelco Kooiker ,  Michael Johannes Christiaan Ronde ,  Arno Maria Wellink ,  Shibing Liu ,  Ying Luo ,  Yixiang Wang ,  Chia-Yao Chen ,  Bohang Zhu ,  Jurgen Van Soest

IPC分类号： H02N13/00 ,  G03F7/00

CPC分类号： H02N13/00 ,  G03F7/70708 ,  G03F7/70716

摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20240195332A1

公开(公告)日：2024-06-13

申请号：US18552282

申请日：2022-03-01

申请人： KYOCERA Corporation

发明人： Kenichi AKABANE

IPC分类号： H02N13/00 ,  B23Q3/15

CPC分类号： H02N13/00 ,  B23Q3/15

摘要： An electrostatic chuck includes a ceramic substrate, a base plate, and an embedded member. The ceramic substrate includes a first surface on which a to-be-treated object is placed, a second surface opposite to the first surface, and a first channel penetrating through the first surface and the second surface. The base plate is bonded to the second surface of the ceramic substrate and includes a through hole at least at a position corresponding to the first channel. The embedded member is located in the through hole and includes a porous body facing the first channel and a second channel communicating with the first channel via the porous body. The first channel and the second channel are located apart from each other in a plane perspective view.

公开(公告)号：US11935729B2

公开(公告)日：2024-03-19

申请号：US17190178

申请日：2021-03-02

申请人： Tokyo Electron Limited

发明人： Hajime Tamura ,  Yasuharu Sasaki ,  Shin Yamaguchi ,  Tsuguto Sugawara ,  Katsuyuki Koizumi

IPC分类号： H01J37/32 ,  H02N13/00

CPC分类号： H01J37/32715 ,  H01J37/32082 ,  H01J37/32642 ,  H02N13/00 ,  H01J2237/2007 ,  H01J2237/334

摘要： The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The first electrode is provided in the first region to receive a first electrical bias. The second electrode is provided in at least the second region to receive a second electrical bias. The second electrode extends below the first electrode to face the first electrode within the first region.

公开(公告)号：US11887877B2

公开(公告)日：2024-01-30

申请号：US16649969

申请日：2018-09-26

申请人： SUMITOMO OSAKA CEMENT CO., LTD.

发明人： Mamoru Kosakai ,  Masaki Ozaki ,  Keisuke Maeda

IPC分类号： H01L21/683 ,  H01L21/3065 ,  H01L21/67 ,  H01L21/768 ,  H01J37/32 ,  H02N13/00

CPC分类号： H01L21/6833 ,  H01J37/32091 ,  H01L21/3065 ,  H01L21/67098 ,  H01L21/76826 ,  H02N13/00

摘要： An electrostatic chuck device includes: an electrostatic chuck part having a sample placing surface on which a sample is placed and having a first electrode for electrostatic attraction; a cooling base part placed on a side opposite to the sample placing surface with respect to the electrostatic chuck part to cool the electrostatic chuck part; and an adhesive layer that bonds the electrostatic chuck part and the cooling base part together, in which the electrostatic chuck part has a recess and protrusion on the adhesive layer side, and a sheet resistance value of the first electrode is higher than 1.0Ω/□ and lower than 1.0×1010Ω/□.

公开(公告)号：US11784079B2

公开(公告)日：2023-10-10

申请号：US16619921

申请日：2018-06-28

申请人： SUMITOMO OSAKA CEMENT CO., LTD.

发明人： Nobuhiro Hidaka ,  Hironori Kugimoto

IPC分类号： H01L21/683 ,  C04B35/117 ,  H02N13/00

CPC分类号： H01L21/6833 ,  C04B35/117 ,  C04B2235/3217 ,  C04B2235/3463 ,  C04B2235/3826 ,  C04B2235/5472 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/80 ,  C04B2235/85 ,  C04B2235/87 ,  H02N13/00

摘要： A composite sintered body, wherein the composite sintered body consists of ceramic composite sintered body, the ceramic composite sintered body comprises aluminum oxide as a main phase, and silicon carbide as a sub-phase, in which the composite sintered body has mullite in crystal grains of the aluminum oxide.

公开(公告)号：US11725635B1

公开(公告)日：2023-08-15

申请号：US17704588

申请日：2022-03-25

申请人： Toyota Motor Engineering & Manufacturing North America, Inc.

发明人： Yuyang Song ,  Masato Tanaka ,  Tsuyoshi Nomura ,  Danil V. Prokhorov

IPC分类号： F03G7/06 ,  H02N13/00 ,  H05B3/00 ,  B25J9/10

CPC分类号： F03G7/06114 ,  H02N13/00 ,  H05B3/0004 ,  B25J9/1075

摘要： An inflatable structure includes an inflatable membrane with an outer surface, and a skin with a textured space-filling Turing pattern disposed on the outer surface of the inflatable membrane. A variable stiffness filament is coupled to the inflatable structure and the variable stiffness filament has a first stiffness at a first temperature and a second stiffness different than the first stiffness at a second temperature different than the first temperature. An electrical energy source is included and in electrical communication with the variable stiffness filament, and the electrical energy source is configured to apply Joule heating to and increase a temperature of the variable stiffness filament from the first temperature to the second temperature such variable stiffness actively controls a stiffness of the inflatable structure.