公开(公告)号：US12028000B2

公开(公告)日：2024-07-02

申请号：US18132617

申请日：2023-04-10

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis Van Der Toorn ,  Jeroen Gertruda Antonius Huinck ,  Han Willem Hendrik Severt ,  Allard Eelco Kooiker ,  Michael Johannes Christiaan Ronde ,  Arno Maria Wellink ,  Shibing Liu ,  Ying Luo ,  Yixiang Wang ,  Chia-Yao Chen ,  Bohang Zhu ,  Jurgen Van Soest

IPC: H02N13/00 ,  G03F7/00

CPC classification number: H02N13/00 ,  G03F7/70708 ,  G03F7/70716

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US11302512B2

公开(公告)日：2022-04-12

申请号：US16809519

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Antonius Henricus Arends ,  Lucas Kuindersma ,  Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Robertus Jacobus Theodorus Van Kempen ,  Niels Johannes Maria Bosch ,  Henricus Martinus Johannes Van De Groes ,  Kuo-Feng Tseng ,  Hans Butler ,  Michael Johannes Christiaan Ronde

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

公开(公告)号：US10649347B2

公开(公告)日：2020-05-12

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael Johannes Christiaan Ronde ,  Lucas Kuindersma ,  Niels Johannes Maria Bosch ,  Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20 ,  H01J37/26

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.