公开(公告)号：US11961700B2

公开(公告)日：2024-04-16

申请号：US17601697

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Maikel Robert Goosen ,  Albertus Victor Gerardus Mangnus ,  Lucas Kuindersma

IPC: H01J37/22 ,  G06T7/00 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06T7/001 ,  H01J37/28 ,  G06T2207/10061 ,  G06T2207/20048 ,  G06T2207/30141 ,  H01J2237/223 ,  H01J2237/2817

Abstract: Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.

公开(公告)号：US11302512B2

公开(公告)日：2022-04-12

申请号：US16809519

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Antonius Henricus Arends ,  Lucas Kuindersma ,  Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Robertus Jacobus Theodorus Van Kempen ,  Niels Johannes Maria Bosch ,  Henricus Martinus Johannes Van De Groes ,  Kuo-Feng Tseng ,  Hans Butler ,  Michael Johannes Christiaan Ronde

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

公开(公告)号：US10649347B2

公开(公告)日：2020-05-12

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael Johannes Christiaan Ronde ,  Lucas Kuindersma ,  Niels Johannes Maria Bosch ,  Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20 ,  H01J37/26

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.