发明授权
- 专利标题: Charge neutralization of electron beam systems
- 专利标题(中): 电子束系统的电荷中和
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申请号: US09536897申请日: 2000-03-28
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公开(公告)号: US06465795B1公开(公告)日: 2002-10-15
- 发明人: Juan R. Madonado , Lee H. Veneklasen , Matthias Brunner , Ralf Schmid
- 申请人: Juan R. Madonado , Lee H. Veneklasen , Matthias Brunner , Ralf Schmid
- 主分类号: H01J4000
- IPC分类号: H01J4000
摘要:
In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.
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