公开(公告)号：US10133186B2

公开(公告)日：2018-11-20

申请号：US15299285

申请日：2016-10-20

申请人： Mapper Lithography IP B.V.

发明人： Bart Schipper

IPC分类号： G03B27/58 ,  G03F7/20

摘要： An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.

公开(公告)号：US10079206B2

公开(公告)日：2018-09-18

申请号：US15389581

申请日：2016-12-23

申请人： MAPPER Lithography IP B.V.

发明人： Marcel Nicolaas Jacobus van Kervinck ,  Vincent Sylvester Kuiper ,  Marco Jan-Jaco Wieland

IPC分类号： H01L21/44 ,  H01L23/528 ,  G06F17/50 ,  G03F7/20

CPC分类号： H01L23/528 ,  G03F7/2059 ,  G03F7/2061 ,  G06F17/5068 ,  G06F17/5077 ,  H01L21/263 ,  H01L21/76816 ,  H01L25/0655 ,  H01L27/0207 ,  H01L27/0617 ,  H01L29/0684 ,  H01L29/0692

摘要： Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.

公开(公告)号：US10037864B2

公开(公告)日：2018-07-31

申请号：US15594712

申请日：2017-05-15

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC分类号： G03B27/52 ,  H01J37/09 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/302

CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

摘要： The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.

公开(公告)号：US20180188659A1

公开(公告)日：2018-07-05

申请号：US15396032

申请日：2016-12-30

申请人： Mapper Lithography IP B.V.

发明人： Jerry Johannes Martinus PEIJSTER

IPC分类号： G03F7/20

CPC分类号： G03F7/70258 ,  G03F7/70833 ,  H01J37/3174

摘要： The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

公开(公告)号：US10008362B1

公开(公告)日：2018-06-26

申请号：US15390777

申请日：2016-12-27

申请人： Mapper Lithography IP B.V.

发明人： Johannes Petrus Sprengers ,  Christiaan Otten

IPC分类号： H01J37/18 ,  G02B6/42 ,  H01J37/302 ,  H01J37/317

摘要： Fiber feedthrough device (50), for forming a hermetic seal around optical fibers in a flat fiber group (60) with a group width. The device comprises a slotted member and a base (62). The base defines a hole (65) that extends entirely through the base along a feedthrough direction (X), and is adapted to accommodate the slotted member. The slotted member (52) defines first and second surfaces (53) on opposite sides associated with the feedthrough direction, and a side surface (55, 56) facing transverse to the feedthrough direction. The slotted member comprises a slot (58), which extends along the feedthrough direction through the slotted member, and opens into the first and second surfaces and into a longitudinal opening (59) along the side surface. The slot extends transversely into the slotted member up to a slot depth at least equal to the fiber group width.

公开(公告)号：US09934943B2

公开(公告)日：2018-04-03

申请号：US14787775

申请日：2014-05-05

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Vincent Sylvester Kuiper ,  Erwin Slot

IPC分类号： H01J37/317 ,  H01J37/09 ,  H01J37/30

CPC分类号： H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

摘要： A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

公开(公告)号：US09905322B2

公开(公告)日：2018-02-27

申请号：US14541233

申请日：2014-11-14

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Marco Jan-Jaco Wieland ,  Willem Henk Urbanus

IPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/30 ,  H01J37/24 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

摘要： The invention relates to a collimator electrode stack (70), comprising: —at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and —a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160).The invention further relates to a method of operating a charged particle beam generator.

公开(公告)号：US20180033586A1

公开(公告)日：2018-02-01

申请号：US15222708

申请日：2016-07-28

申请人： Mapper Lithography IP B.V.

发明人： Paul IJmert SCHEFFERS ,  Jerry Johannes Martinus Peijster

IPC分类号： H01J37/04 ,  H01J37/147 ,  H01J37/20

CPC分类号： H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J2237/2002 ,  H01J2237/2602 ,  H01J2237/3175

摘要： The invention relates to an apparatus and method for exposing a sample. The apparatus comprises a source for electromagnetic radiation or particles having energy, an exposing unit for exposing said sample to said electromagnetic radiation or particles, and a substrate holding device for holding said sample at least during said exposing.The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement which is arranged for substantially maintaining the component at a predetermined first temperature.The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature, which is at or near the first temperature.

公开(公告)号：US09457549B2

公开(公告)日：2016-10-04

申请号：US14662346

申请日：2015-03-19

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Guido De Boer ,  Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks ,  Frederik Matthias Spiegelhalder ,  Roy Josephus Stephanus Derks ,  Edwin Johannes Theodorus Smulders

IPC分类号： G02B6/32 ,  B32B37/14 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/36 ,  H01J37/317 ,  B32B37/12 ,  B32B38/00

CPC分类号： B32B37/142 ,  B32B37/1284 ,  B32B37/1292 ,  B32B38/0012 ,  B32B2551/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/3612 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/2482 ,  Y10T156/1002

摘要： A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.

公开(公告)号：US20160268099A1

公开(公告)日：2016-09-15

申请号：US14644261

申请日：2015-03-11

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Niels VERGEER

IPC分类号： H01J37/317 ,  G01N21/88

CPC分类号： H01J37/3177 ,  G01N21/88 ,  G03F9/7088 ,  H01J37/3045 ,  H01J2237/2482 ,  H01J2237/30433 ,  H01J2237/31798

摘要： Methods and systems for verification of a mark written on a target surface during a multiple beam lithography process, and for verifying beam position of individual beams on the target surface based on mark verification are disclosed. A mark can be verified by scanning an optical beam over the mark and measuring the reflected optical beam and the position of the target with respect to the optical beam. By comparing the intensity of the reflected light as a function of distance over the mark with reference mark data representing an intended definition of the mark, and any deviation between the measured representation and the reference mark data are determined. If any deviation deviate more than the predetermined limit, incorrectly positioned beams can be verified from the data.

摘要翻译： 公开了用于在多光束光刻工艺期间用于验证在目标表面上记录的标记的方法和系统，以及用于基于标记验证来验证目标表面上的各个光束的光束位置。 可以通过在标记上扫描光束并测量反射光束和靶相对于光束的位置来验证标记。 通过将反射光的强度作为标记上的距离的函数与表示标记的预期定义的参考标记数据进行比较，并且确定测量的表示与参考标记数据之间的任何偏差。 如果任何偏差偏离超过预定极限，则可以从数据中验证不正确定位的波束。