- 专利标题: APPARATUS AND METHOD FOR PROCESSING OR IMAGING A SAMPLE
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申请号: US15222708申请日: 2016-07-28
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公开(公告)号: US20180033586A1公开(公告)日: 2018-02-01
- 发明人: Paul IJmert SCHEFFERS , Jerry Johannes Martinus Peijster
- 申请人: Mapper Lithography IP B.V.
- 主分类号: H01J37/04
- IPC分类号: H01J37/04 ; H01J37/147 ; H01J37/20
摘要:
The invention relates to an apparatus and method for exposing a sample. The apparatus comprises a source for electromagnetic radiation or particles having energy, an exposing unit for exposing said sample to said electromagnetic radiation or particles, and a substrate holding device for holding said sample at least during said exposing.The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement which is arranged for substantially maintaining the component at a predetermined first temperature.The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature, which is at or near the first temperature.
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