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公开(公告)号：US09457549B2
公开(公告)日：2016-10-04
申请号：US14662346
申请日：2015-03-19
发明人： Guido De Boer , Ralph Van Melle , Teunis Van De Peut , Henk Derks , Frederik Matthias Spiegelhalder , Roy Josephus Stephanus Derks , Edwin Johannes Theodorus Smulders
IPC分类号： G02B6/32 , B32B37/14 , B82Y10/00 , B82Y40/00 , G02B6/36 , H01J37/317 , B32B37/12 , B32B38/00
CPC分类号： B32B37/142 , B32B37/1284 , B32B37/1292 , B32B38/0012 , B32B2551/00 , B82Y10/00 , B82Y40/00 , G02B6/3612 , H01J37/3177 , H01J2237/0435 , H01J2237/2482 , Y10T156/1002
摘要： A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.
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公开(公告)号：US09978562B2
公开(公告)日：2018-05-22
申请号：US14287241
申请日：2014-05-27
IPC分类号： H01J37/317 , H01J37/302 , H01J37/30 , G06T1/20 , B82Y10/00 , B82Y40/00 , H01J37/04 , G03F7/20 , G06T1/60 , H04N1/405
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G03F7/70475 , G06T1/20 , G06T1/60 , H01J37/045 , H01J37/3002 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/3175 , H01J2237/31761 , H01J2237/31764 , H04N1/405
摘要： A method for exposing a wafer according to pattern data using a charged particle lithography machine generating a plurality of charged particle beamlets for exposing the wafer. The method comprises providing the pattern data in a vector format, rendering the vector pattern data to generate multi-level pattern data, dithering the multi-level pattern data to generate two-level pattern data, supplying the two-level pattern data to the charged particle lithography machine, and switching on and off the beamlets generated by the charged particle lithography machine on the basis of the two-level pattern data, wherein the pattern data is adjusted on the basis of corrective data.
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公开(公告)号：US10297420B2
公开(公告)日：2019-05-21
申请号：US14287234
申请日：2014-05-27
IPC分类号： H01J37/302 , H01J37/317 , G06T1/60 , G06T1/20 , B82Y10/00 , B82Y40/00 , H01J37/04 , H01J37/30 , G03F7/20 , H04N1/405
摘要： A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing the wafer, the electron optical column including a beamlet blanker array for switching the beamlets on or off, a data path for transmitting beamlet control data for control of the switching of the beamlets, and a wafer positioning system for moving the wafer under the electron optical column in a scan direction. The wafer positioning system is provided with synchronization signals from the data path to align the wafer with the electron beams from the electron-optical column. The data path further comprises one or more processing units for generating the beamlet control data and one or more transmission channels for transmitting the beamlet control data to the beamlet blanker array.
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公开(公告)号：US20150136994A1
公开(公告)日：2015-05-21
申请号：US14400561
申请日：2013-05-08
IPC分类号： H01J37/317 , H01J37/30
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/243 , H01J37/3007 , H01J37/3177 , H01J2237/0264 , H01J2237/0437 , H01J2237/2485 , H01J2237/31754 , H01J2237/31774
摘要： The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).
摘要翻译： 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。
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公开(公告)号：US09455122B2
公开(公告)日：2016-09-27
申请号：US14400561
申请日：2013-05-08
IPC分类号： H01J37/317 , H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/30
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/243 , H01J37/3007 , H01J37/3177 , H01J2237/0264 , H01J2237/0437 , H01J2237/2485 , H01J2237/31754 , H01J2237/31774
摘要： The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).
摘要翻译： 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。
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