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公开(公告)号：US20170277043A1
公开(公告)日：2017-09-28
申请号：US15620699
申请日：2017-06-12
CPC分类号： G03F7/70775 , G01B9/02007 , G01B9/02015 , G03F7/70833 , G03F7/7085 , H01J2237/30438
摘要： The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.
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公开(公告)号：US20150321356A1
公开(公告)日：2015-11-12
申请号：US14705928
申请日：2015-05-06
发明人： Joep Gerard Vijverberg , Laurens Vincent Plandsoen , Bas van Gelder , Guido de Boer , Michel Pieter Dansberg
CPC分类号： B25J11/00 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F9/7096 , H01J37/16 , H01J37/3177 , H01J2237/024 , H01J2237/166 , H01L21/6719 , H01L21/67225 , H01L21/67775
摘要： The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
摘要翻译： 本发明涉及用于封闭目标加工机器的组件。 组件包括外壳和转移单元。 外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。 此外，外壳包括在外壳的侧壁中的进入开口。 转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。 传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动 在朝向和/或远离外壳的方向上。
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公开(公告)号：US10144134B2
公开(公告)日：2018-12-04
申请号：US14705928
申请日：2015-05-06
发明人： Joep Gerard Vijverberg , Laurens Vincent Plandsoen , Bas van Gelder , Guido de Boer , Michel Pieter Dansberg
IPC分类号： B25J11/00 , G03F9/00 , G03F7/20 , H01L21/67 , H01L21/677 , H01J37/16 , H01J37/317
摘要： The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
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公开(公告)号：US09690215B2
公开(公告)日：2017-06-27
申请号：US14716801
申请日：2015-05-19
CPC分类号： G03F7/70775 , G01B9/02007 , G01B9/02015 , G03F7/70833 , G03F7/7085 , H01J2237/30438
摘要： The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.
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公开(公告)号：US09082584B2
公开(公告)日：2015-07-14
申请号：US14585829
申请日：2014-12-30
发明人： Jerry Peijster , Guido de Boer
IPC分类号： H01J37/20 , H01J37/317 , H01J37/30
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译： 本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向， 目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器 相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。
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6.发明申请公开(公告)号：US20150162165A1
公开(公告)日：2015-06-11
申请号：US14585829
申请日：2014-12-30
发明人： Jerry PEIJSTER , Guido de Boer
IPC分类号： H01J37/20 , H01J37/30 , H01J37/317
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译： 本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向， 目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器 相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。
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公开(公告)号：US20150268032A1
公开(公告)日：2015-09-24
申请号：US14716801
申请日：2015-05-19
IPC分类号： G01B9/02
CPC分类号： G03F7/70775 , G01B9/02007 , G01B9/02015 , G03F7/70833 , G03F7/7085 , H01J2237/30438
摘要： The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.
摘要翻译： 本发明涉及一种用于测量参考反射镜和测量镜之间的位移方向的差分干涉仪模块。 在一个实施例中，差分干涉仪模块适于朝向第一反射镜发射三个参考光束，并且三个测量光束朝向第二反射镜发射以确定所述第一和第二反射镜之间的位移。 在优选实施例中，相同的模块也用于测量围绕两个垂直轴的相对旋转。 本发明还涉及包括这种干涉仪模块的光刻系统和用于测量这种位移和旋转的方法。
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