公开(公告)号：US20230369015A1

公开(公告)日：2023-11-16

申请号：US18299749

申请日：2023-04-13

申请人： NuFlare Technology, Inc.

发明人： Kenichi YASUI ,  Yasuo KATO

IPC分类号： H01J37/317 ,  H01J37/302 ,  H01J37/04

CPC分类号： H01J37/3177 ,  H01J37/3026 ,  H01J37/045 ,  H01J2237/31762

摘要： In one embodiment, a coverage calculating method is for calculating a coverage of a pattern in each of pixel regions obtained by dividing a writing region onto which the pattern is to be written by irradiation with a charged particle beam. Each of the pixel regions has a predetermined size. The method includes generating a plurality of first pixel regions by virtually dividing the writing region, the first pixel regions each having a first size, calculating a coverage of a pattern in the first pixel region, generating a plurality of second pixel regions by virtually dividing the first pixel region, the second pixel regions each having a second size smaller than the first size, selecting a second pixel region approximating a pattern shape in the first pixel region, and calculating a coverage in the selected second pixel region.

公开(公告)号：US20230282444A1

公开(公告)日：2023-09-07

申请号：US18108583

申请日：2023-02-11

申请人： PDF SOLUTIONS, INC.

发明人： Indranil DE ,  Jeremy CHENG ,  Thomas SOKOLLIK ,  Yoram SCHWARZ ,  Stephen LAM ,  Xumin SHEN

IPC分类号： H01J37/317 ,  H01J37/30 ,  G01R31/306 ,  G01R31/265

CPC分类号： H01J37/3175 ,  G01R31/2653 ,  G01R31/306 ,  H01J37/3005 ,  H01J2237/31762

摘要： Systems, devices, and methods for performing a non-contact electrical measurement (NCEM) on a NCEM-enabled cell included in a NCEM-enabled cell vehicle may be configured to perform NCEMs while the NCEM-enabled cell vehicle is moving. The movement may be due to vibrations in the system and/or movement of a movable stage on which the NCEM-enabled cell vehicle is positioned. Position information for an electron beam column producing the electron beam performing the NCEMs and/or for the moving stage may be used to align the electron beam with targets on the NCEM-enabled cell vehicle while it is moving.

公开(公告)号：US20230260749A1

公开(公告)日：2023-08-17

申请号：US18159177

申请日：2023-01-25

申请人： NuFlare Technology, Inc.

发明人： Hirofumi MORITA

IPC分类号： H01J37/317

CPC分类号： H01J37/3177 ,  H01J2237/24578 ,  H01J2237/30488 ,  H01J2237/083 ,  H01J2237/0437 ,  H01J2237/31762

摘要： A multi charged particle beam apparatus irradiates a substrate placed on a stage with a multi charged particle beam through an illumination optical system including a plurality of components, and an objective lens successively. In one embodiment, an optical system adjustment method for the multi charged particle beam apparatus includes measuring positional deviation amounts of a plurality of individual beams included in the multi charged particle beam at two or more different heights in an optical axis direction of a measurement surface or an imaging position of the multi charged particle beam, calculating a normalized position difference based on the two or more heights and the positional deviation amounts, the normalized position difference being an illumination system aberration equivalent amount of the illumination optical system, and adjusting a set value for at least one of the plurality of components using a value of the normalized position difference.

公开(公告)号：US20190139733A1

公开(公告)日：2019-05-09

申请号：US16103616

申请日：2018-08-14

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Jensen Yang ,  Shy-Jay Lin ,  Yen-Hao Huang

IPC分类号： H01J37/00 ,  H01J37/317

CPC分类号： H01J37/00 ,  H01J37/3174 ,  H01J2237/31762

摘要： A method includes receiving, by an input buffer of a switching device, a packet, determining, by a scheduling engine of the switching device, a destination output buffer for the packet, receiving, by the scheduling engine of the switching device, an availability of the destination output buffer and a vacancy level of a memory device that is associated with the destination output buffer, and based on the availability of the destination output buffer and the vacancy level of the memory device, determining, by the scheduling engine of the switching device, a routing destination of the packet. The routing destination includes the input buffer, the destination output buffer, and the memory device.

公开(公告)号：US20190027340A1

公开(公告)日：2019-01-24

申请号：US15997899

申请日：2018-06-05

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Satoru Hirose ,  Rieko Nishimura ,  Ryosuke Ueba

IPC分类号： H01J37/302 ,  H01J37/20 ,  H01J37/147 ,  H01J37/317

CPC分类号： H01J37/3026 ,  G03F1/78 ,  H01J37/147 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/31762 ,  H01J2237/31774 ,  H01J2237/31776 ,  H01J2237/31798

摘要： A charged particle beam writing apparatus includes a writing data generation circuitry to input character information or information of an item selected, for specifying an apparatus quality check pattern used for evaluating apparatus quality of a charged particle beam writing apparatus, and to generate writing data of the apparatus quality check pattern based on the character information or the information of the item selected, and a combination circuitry to input writing data of an actual chip pattern to be written on a target object, and to combine the writing data of the actual chip pattern and the writing data of the apparatus quality check pattern such that the actual chip pattern and the apparatus quality check pattern do not overlap with each other.

公开(公告)号：US09899182B2

公开(公告)日：2018-02-20

申请号：US15329880

申请日：2014-12-22

申请人： INTEL CORPORATION

发明人： Yan A. Borodovsky

IPC分类号： H01J3/36 ,  G03F7/20 ,  H01L21/027 ,  H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  H01J37/3026 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769

摘要： Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.

公开(公告)号：US09859100B2

公开(公告)日：2018-01-02

申请号：US15157278

申请日：2016-05-17

申请人： D2S, Inc.

发明人： Akira Fujimura ,  Kazuyuki Hagiwara ,  Robert C. Pack

IPC分类号： H01J37/317 ,  H01J37/302 ,  G03F1/36 ,  G03F7/20 ,  G03F1/78

CPC分类号： H01J37/3174 ,  G03F1/36 ,  G03F1/78 ,  G03F7/2063 ,  H01J37/3023 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31771 ,  H01J2237/31774 ,  H01J2237/31776

摘要： A method for mask process correction or forming a pattern on a reticle using charged particle beam lithography is disclosed, where the reticle is to be used in an optical lithographic process to form a pattern on a wafer, where sensitivity of the wafer pattern is calculated with respect to changes in dimension of the reticle pattern, and where pattern exposure information is modified to increase edge slope of the reticle pattern where sensitivity of the wafer pattern is high. A method for fracturing or mask data preparation is also disclosed, where pattern exposure information is determined that can form a pattern on a reticle using charged particle beam lithography, where the reticle is to be used in an optical lithographic process to form a pattern on a wafer, and where sensitivity of the wafer pattern is calculated with respect to changes in dimension of the reticle pattern.

公开(公告)号：US09805907B2

公开(公告)日：2017-10-31

申请号：US15002121

申请日：2016-01-20

申请人： NuFlare Technology, Inc.

发明人： Hiroshi Matsumoto

IPC分类号： H01J37/147 ,  H01J37/317 ,  H01J37/302 ,  H01J37/06 ,  H01J37/20 ,  G11B9/10

CPC分类号： H01J37/1472 ,  G11B9/10 ,  H01J37/06 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/30483 ,  H01J2237/31762 ,  H01J2237/31766

摘要： A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.

公开(公告)号：US20170243714A1

公开(公告)日：2017-08-24

申请号：US15437514

申请日：2017-02-21

申请人： NuFlare Technology, Inc.

发明人： Kei HASEGAWA ,  Hayato KIMURA

IPC分类号： H01J37/22 ,  H01J37/302 ,  H01J37/317

CPC分类号： H01J37/222 ,  H01J37/302 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/30416 ,  H01J2237/31762 ,  H01J2237/31774

摘要： Disclosed is a method of diagnosing a conversion process for converting a format of image data including unit data corresponding to charged particle beams into a format suitable for an aperture array, the aperture array having a plurality of controllers provided to match a plurality of the charged particle beams to control the charged particle beams, and a driver configured to drive the controllers. The method includes: extracting the unit data having an identical first rank based on an arrangement of the unit data in the image data from the unit data of each block including a predetermined number of the unit data and calculating a first checksum of each of the first rank; extracting the unit data having an identical second rank after the conversion process from the unit data of each block and calculating a second checksum of each of the second rank; and comparing the first and second checksums.

公开(公告)号：US09659745B2

公开(公告)日：2017-05-23

申请号：US14619281

申请日：2015-02-11

申请人： NuFlare Technology, Inc.

发明人： Kenichi Yasui

IPC分类号： H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3005 ,  G03F1/84 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/22 ,  H01J2237/3175 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31776 ,  H01J2237/31798

摘要： A charged particle beam drawing apparatus of an embodiment includes: a graphic information file for storing graphic information for each of elements (for example, patterns) at a level underlying an element (for example, a cell) at a particular level in hierarchically-structured drawing data which has elements at each level; and an attribute information file for storing attribute information to be given to each of the elements at the underlying level in association with information (for example, an index number) on the element at the particular level.