公开(公告)号：US09812289B2

公开(公告)日：2017-11-07

申请号：US15247056

申请日：2016-08-25

Applicant: NuFlare Technology, Inc.

Inventor： Satoru Hirose ,  Takayuki Ohnishi

IPC: H01J37/00 ,  H01J37/304 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/147 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

公开(公告)号：US20190027340A1

公开(公告)日：2019-01-24

申请号：US15997899

申请日：2018-06-05

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Satoru Hirose ,  Rieko Nishimura ,  Ryosuke Ueba

IPC: H01J37/302 ,  H01J37/20 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3026 ,  G03F1/78 ,  H01J37/147 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/31762 ,  H01J2237/31774 ,  H01J2237/31776 ,  H01J2237/31798

Abstract: A charged particle beam writing apparatus includes a writing data generation circuitry to input character information or information of an item selected, for specifying an apparatus quality check pattern used for evaluating apparatus quality of a charged particle beam writing apparatus, and to generate writing data of the apparatus quality check pattern based on the character information or the information of the item selected, and a combination circuitry to input writing data of an actual chip pattern to be written on a target object, and to combine the writing data of the actual chip pattern and the writing data of the apparatus quality check pattern such that the actual chip pattern and the apparatus quality check pattern do not overlap with each other.

公开(公告)号：US10468232B2

公开(公告)日：2019-11-05

申请号：US15997899

申请日：2018-06-05

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Satoru Hirose ,  Rieko Nishimura ,  Ryosuke Ueba

IPC: H01J37/302 ,  H01J37/20 ,  H01J37/147 ,  H01J37/317

Abstract: A charged particle beam writing apparatus includes a writing data generation circuitry to input character information or information of an item selected, for specifying an apparatus quality check pattern used for evaluating apparatus quality of a charged particle beam writing apparatus, and to generate writing data of the apparatus quality check pattern based on the character information or the information of the item selected, and a combination circuitry to input writing data of an actual chip pattern to be written on a target object, and to combine the writing data of the actual chip pattern and the writing data of the apparatus quality check pattern such that the actual chip pattern and the apparatus quality check pattern do not overlap with each other.

公开(公告)号：US09514915B2

公开(公告)日：2016-12-06

申请号：US14956860

申请日：2015-12-02

Applicant: NuFlare Technology, Inc.

Inventor： Satoru Hirose ,  Takayuki Ohnishi

IPC: H01J37/00 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/147 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract translation: 在一个实施例中，带电粒子束描绘装置通过用偏转器偏转带电粒子束来执行绘图。 一种用于评估该装置的方法，包括进行第一图案的拍摄，通过偏转器控制偏转量，沿着第一方向移动来自第一图案的光束的施加位置，以进行第二图案的拍摄，控制偏转 用于将施加位置从第二图案沿着第一方向移动以进行第三图案的拍摄，控制偏转量以沿着与第一方向相反的第二方向从第三图案移动施加位置，以使 计算所述第二图案和所述第四图案之间的间隔，并将所计算的间隔与参考间隔进行比较。

公开(公告)号：US11901156B2

公开(公告)日：2024-02-13

申请号：US17815701

申请日：2022-07-28

Applicant: NuFlare Technology, Inc.

Inventor： Ryosuke Ueba ,  Satoru Hirose ,  Shunsuke Isaji ,  Rieko Nishimura

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/147 ,  H01J37/304

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/3045 ,  H01J2237/0435

Abstract: In one embodiment, a multi-charged-particle-beam writing method includes performing a tracking operation such that, while a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams, deflection positions of the multiple beams follow movement of the stage, and applying the multiple beams to the substrate having a writing area including a plurality of rectangular regions arranged in a mesh during the tracking operation such that each of the plurality of rectangular regions is irradiated with the multiple beams. Each rectangular region includes a plurality of pixels each having a predetermined size and arranged in a mesh. At least one subset of the plurality of pixels is irradiated with the multiple beams in a first shot order and is then irradiated with the multiple beams in a second shot order different from the first shot order.