公开(公告)号：US20210090853A1

公开(公告)日：2021-03-25

申请号：US17027341

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma ASO ,  Xin MAN ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/30 ,  H01J37/28

Abstract: The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.

公开(公告)号：US20190279843A1

公开(公告)日：2019-09-12

申请号：US16294543

申请日：2019-03-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Makoto SATO

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/28 ,  H01J37/22 ,  H01J37/305

Abstract: An apparatus for processing and observing a cross-section includes: a sample bed holding a sample; a focused ion beam column radiating a focused ion beam to the sample; an electron beam column radiating an electron beam to the sample, perpendicularly to the focused ion beam; an electron detector detecting secondary electrons or reflection electrons generated from the sample; a irradiation position controller controlling irradiation positions of the focused ion beam and the electron beam based on target irradiation position information showing target irradiation positions of beams on the sample; a process controller controlling a cross-section-exposing process that exposes a cross-section of the sample by radiating the focused ion beam to the sample and a cross-section image-obtaining process that obtains a cross-section image of the cross-section by radiating the electron beam to the cross-section; and an image quality corrector correcting image quality of the cross-section image obtained.

公开(公告)号：US20140077097A1

公开(公告)日：2014-03-20

申请号：US14025985

申请日：2013-09-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Toshiaki FUJII

IPC: G01N23/203

CPC classification number: G01N23/203

Abstract: A crystal analysis apparatus includes: a measurement data storage configured to store electron back-scattering pattern (EBSP) data measured at electron beam irradiation points on a plurality of cross-sections of a sample formed substantially in parallel at prescribed intervals; a crystal orientation database configured to accumulate therein information of crystal orientations corresponding to EBSPs; and a map constructing unit that constructs a three-dimensional crystal orientation map based on distribution of crystal orientations in normal directions of a plurality of faces of a polyhedral image having the cross-sections arranged at the prescribed intervals by reading out the crystal orientations in the normal directions of the faces from the crystal orientation database on the basis of the EBSP data stored in the measurement data storage.

Abstract translation: 晶体分析装置包括：测量数据存储器，被配置为存储在电子束照射点处测量的电子后向散射图案（EBSP）数据，所述数据基本上以规定间隔平行形成的样品的多个横截面; 晶体取向数据库，其被配置为在其中累积与EBSP对应的晶体取向的信息; 以及地图构造单元，其基于通过读出所述三维晶体取向图中的晶体取向，以基于以规定间隔布置的多面体图像的多个面的多个面的正交方向的分布来构造三维晶体取向图 根据存储在测量数据存储器中的EBSP数据，从晶体取向数据库的面的法线方向。

公开(公告)号：US20150060695A1

公开(公告)日：2015-03-05

申请号：US14470183

申请日：2014-08-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/317 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/317 ,  H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J37/3056 ,  H01J2237/20214 ,  H01J2237/2067 ,  H01J2237/2445 ,  H01J2237/24585 ,  H01J2237/25 ,  H01J2237/2555 ,  H01J2237/2561

Abstract: A charged particle beam apparatus includes: an electron beam irradiation unit irradiating a sample with electron beams having a first irradiation axis; a rotation stage holding the sample and having a rotation axis in a direction perpendicular to the first irradiation axis; an ion beam irradiation unit irradiating the sample with ion beams having a second irradiation axis that is substantially parallel to the rotation axis; a detection unit detecting at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams and electron beams; and a gaseous ion beam irradiation unit irradiating the sample with gaseous ion beams.

Abstract translation: 带电粒子束装置包括：电子束照射单元，用具有第一照射轴的电子束照射样品; 旋转台，保持所述样品并且具有与所述第一照射轴垂直的方向的旋转轴; 离子束照射单元，用具有大致平行于旋转轴的第二照射轴的离子束照射样品; 检测单元，通过用离子束和电子束的照射检测经由样品产生的带电粒子和X射线中的至少一个; 气态离子束照射单元用气体离子束照射样品。

公开(公告)号：US20150060664A1

公开(公告)日：2015-03-05

申请号：US14475046

申请日：2014-09-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: G01N23/22 ,  G01N23/225 ,  G01N1/32 ,  G01N23/203

CPC classification number: H01J37/222 ,  G01N1/32 ,  G01N23/20091 ,  G01N23/2202 ,  G01N23/2251 ,  G01N2223/418 ,  H01J37/28 ,  H01J37/292 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/2811 ,  H01J2237/31749

Abstract: A cross-section processing-and-observation method includes: a cross-section exposure step of irradiating a sample with a focused ion beam to expose a cross-section of the sample; a cross-sectional image acquisition step of irradiating the cross-section with an electron beam to acquire a cross-sectional image of the cross-section; and a step of repeatedly performing the cross-section exposure step and the cross-sectional image acquisition step along a predetermined direction of the sample at a setting interval to acquire a plurality of cross-sectional images of the sample. In the cross-sectional image acquisition step, a cross-sectional image is acquired under different condition settings for a plurality of regions of the cross-section.

Abstract translation: 横截面加工和观察方法包括：横截面曝光步骤，用聚焦离子束照射样品以暴露样品的横截面; 横截面图像获取步骤，用电子束照射横截面以获得横截面的横截面图像; 以及以设定间隔沿着样品的规定方向重复进行横截面曝光工序和横截面图像获取工序的步骤，取得样品的多个横截面图像。 在横截面图像获取步骤中，在横截面的多个区域的不同条件设置下获取横截面图像。

公开(公告)号：US20130251914A1

公开(公告)日：2013-09-26

申请号：US13842184

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Ikuko NAKATANI

IPC: C23C16/48

CPC classification number: C23C16/486 ,  C23C16/047 ,  H01J37/3056 ,  H01J2237/31745

Abstract: Provided is a sample preparation method, including: processing a sample by an ion beam, thereby forming a thin film portion having a thickness that allows an electron beam to transmit therethrough; supplying deposition gas to the thin film portion; and irradiating the thin film portion with the electron beam, thereby forming a deposition film on a front surface of the thin film portion and a deposition film on a rear surface of the thin film portion opposed to the front surface.

Abstract translation: 提供了一种样品制备方法，包括：通过离子束处理样品，从而形成具有允许电子束透射的厚度的薄膜部分; 向薄膜部分供应沉积气体; 并用电子束照射薄膜部分，从而在薄膜部分的前表面上形成沉积膜，并在薄膜部分的与前表面相对的后表面上形成沉积膜。

公开(公告)号：US20210090855A1

公开(公告)日：2021-03-25

申请号：US17027312

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma ASO ,  Xin MAN ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  G01N23/2258 ,  G01N23/2206

Abstract: The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

公开(公告)号：US20150262788A1

公开(公告)日：2015-09-17

申请号：US14728004

申请日：2015-06-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/28 ,  H01J37/304 ,  H01J37/30 ,  G01N23/225 ,  G01T1/36

CPC classification number: H01J37/265 ,  G01N1/32 ,  G01N23/04 ,  G01N23/2208 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/2255 ,  G01T1/36 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J2237/2611 ,  H01J2237/28 ,  H01J2237/2807 ,  H01J2237/2812 ,  H01J2237/30472 ,  H01J2237/30483 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus comprises a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections. In a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material or of a non-specified material that is different from a pre-specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

Abstract translation: 由横截面加工和观察装置执行的横截面加工和观察方法包括：用离子束照射样品形成横截面的横截面处理步骤; 横截面观察步骤，通过用电子束照射横截面来获得横截面的观察图像; 并且重复横截面处理步骤和横截面观察步骤，以获得多个横截面的观察图像。 在执行横截面的能量分散X射线光谱法（EDS）测量并且检测到与预定材料不同的指定材料或非指定材料的X射线的情况下， 改变离子束的照射条件以获得指定材料的多个横截面的观察图像，并且执行指定材料的横截面处理和观察。

公开(公告)号：US20140291511A1

公开(公告)日：2014-10-02

申请号：US14220981

申请日：2014-03-20

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/30 ,  H01J37/252 ,  H01J37/26

CPC classification number: H01J37/3002 ,  H01J37/252 ,  H01J37/26 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/30455

Abstract: A charged particle beam apparatus includes a sample stage, a focused ion beam column, a scattered electron detector that detects backscattered electrons generated from a cross-section of a sample, a crystal orientation information generation unit that generates crystal orientation information on a predetermined region of the cross-section, and an angle calculation unit that calculates attachment angles of the sample stage, corresponding to a direction of the cross-section. In response to receiving input of information indicating that the crystal orientation information on the region displayed on a display unit is changed to aimed second crystal orientation information, the angle calculation unit calculates the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and the focused ion beam column performs etching processing on the cross-section at the calculated attachment angles.

Abstract translation: 带电粒子束装置包括：样品台，聚焦离子束柱，检测从样品的横截面产生的反向散射电子的散射电子检测器;晶体取向信息生成单元，其在预定区域上生成晶体取向信息; 横截面，以及角度计算单元，其计算与横截面方向对应的样品台的附着角度。 响应于接收到指示将显示在显示单元上的区域的晶体取向信息改变为目标第二晶体取向信息的信息的输入，角度计算单元计算与用于生成显示单元的横截面的方向相对应的附着角度 第二晶体取向信息，聚焦离子束列以计算出的安装角度对横截面进行蚀刻处理。

公开(公告)号：US20130248707A1

公开(公告)日：2013-09-26

申请号：US13842274

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Atsushi UEMOTO

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/31745

Abstract: A sample observation method including: placing a sample stage at a first tilt angle with respect to a charged particle beam, and irradiating an observation surface of a sample with the charged particle beam to acquire a first charged particle image; tilting the sample stage to a second tilt angle different from the first tilt angle about a first sample stage axis, and irradiating the observation surface with the charged particle beam to acquire a second charged particle image; tilting the sample stage to a tilt angle at which an area of the observation surface in the acquired charged particle image is larger between the first charged particle image and the second charged particle image; and irradiating the observation surface with the charged particle beam to observe the observation surface.

Abstract translation: 一种样本观察方法，包括：将样品台放置在相对于带电粒子束的第一倾斜角度处，并且用带电粒子束照射样品的观察表面以获取第一带电粒子图像; 将样品台倾斜到与第一倾斜角度不同于第一样品台轴线的第二倾斜角度，并且用带电粒子束照射观察表面以获得第二带电粒子图像; 将所述样品台倾斜到所述获取的带电粒子图像中的所述观察表面的区域在所述第一带电粒子图像和所述第二带电粒子图像之间较大的倾斜角度; 用带电粒子束照射观察面观察观察面。