COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM

    公开(公告)号:US20250014859A1

    公开(公告)日:2025-01-09

    申请号:US18687252

    申请日:2021-09-01

    Abstract: The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.

    CHARGED PARTICLE BEAM APPARATUS
    3.
    发明申请

    公开(公告)号:US20170278664A1

    公开(公告)日:2017-09-28

    申请号:US15468290

    申请日:2017-03-24

    Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

    CHARGED PARTICLE BEAM APPARATUS
    4.
    发明申请

    公开(公告)号:US20200251303A1

    公开(公告)日:2020-08-06

    申请号:US16495506

    申请日:2018-03-27

    Abstract: This charged particle beam apparatus is provided with: a charged particle beam lens-barrel for irradiating a sample with a charged particle beams; a tilting base that has a first sample holding portion capable of holding the sample and that holds the first sample holding portion to be turnable about a first axis; a tilting base that has a second sample holding portion capable of holding the sample and that holds the second sample holding portion to be turnable about a second axis parallel to the first axis; and a driving force supplier that supplies to the tilting bases with a driving force for turning the tilting bases in association with each other.

    CHARGED PARTICLE BEAM DEVICE
    5.
    发明申请

    公开(公告)号:US20190304745A1

    公开(公告)日:2019-10-03

    申请号:US16364898

    申请日:2019-03-26

    Abstract: To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.

    CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请

    公开(公告)号:US20190157037A1

    公开(公告)日:2019-05-23

    申请号:US16192723

    申请日:2018-11-15

    Abstract: (Task) To repeatedly perform an operation of extracting a sample piece formed by processing a sample with an ion beam and of transferring the extracted sample piece to a sample piece holder.(Problem Solving Means) A charged particle beam apparatus includes a computer that sets a shaping processing region including a bottom portion of s ample piece in a thickness direction of the sample piece corresponding to a depth direction at the time of processing a sample after a needle holds the sample piece, and controls a focused ion beam irradiation optical system to irradiate the shaping processing region with a focused ion beam to thereby shape the sample piece.

    CHARGED PARTICLE BEAM DEVICE
    8.
    发明申请

    公开(公告)号:US20250140513A1

    公开(公告)日:2025-05-01

    申请号:US18687688

    申请日:2021-09-01

    Abstract: This charged particle beam device (10) comprises a focused ion beam irradiation optical system (14), an electron beam irradiation optics (15), a needle (18), a needle drive mechanism (19), a display device (21), and a computer (22). The computer (22) stores coordinate data for the needle drive mechanism (19) when the tip of the needle (18) matches a prescribed position in an image obtained by irradiating the needle (18) with a focused ion beam or an electron beam. The computer (22) controls the needle drive mechanism (19) and the focused ion beam irradiation optics (14) such that when the total amount of change in the coordinate data in a suitable period is at least a prescribed threshold, a process is executed for removing, by means of irradiation with the focused ion beam, at least a portion of a deposition film attached to the tip of the needle (18).

    METHOD OF PREPARING THIN FILM SAMPLE PIECE AND CHARGED PARTICLE BEAM APPARATUS

    公开(公告)号:US20200266031A1

    公开(公告)日:2020-08-20

    申请号:US16790450

    申请日:2020-02-13

    Abstract: Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.

    CHARGED PARTICLE BEAM APPARATUS
    10.
    发明申请

    公开(公告)号:US20180204705A1

    公开(公告)日:2018-07-19

    申请号:US15871767

    申请日:2018-01-15

    Abstract: Disclosed is a charged particle beam apparatus for automatically preparing a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system configured to irradiate an object with a charged particle beam, a stage configured to move with the sample placed thereon, a sample piece transferring device configured to hold and transport the sample piece separated and extracted from the sample, a holder fixing base configured to hold a sample piece holder to which the sample piece is to be transferred, an electrical conduction sensor configured to detect electrical conduction between the sample piece transferring device and an object, and a computer configured to set a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.

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