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公开(公告)号:US20250014859A1
公开(公告)日:2025-01-09
申请号:US18687252
申请日:2021-09-01
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Ayana MURAKI , Tatsuya ASAHATA , Satoshi TOMIMATSU , Makoto SATO
IPC: H01J37/302 , H01J37/28
Abstract: The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.
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公开(公告)号:US20180204704A1
公开(公告)日:2018-07-19
申请号:US15871753
申请日:2018-01-15
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Masato SUZUKI , Satoshi TOMIMATSU , Makoto SATO
IPC: H01J37/20 , H01J37/28 , G01N23/2204 , H01J37/302 , H01J37/22
CPC classification number: H01J37/20 , G01N23/2204 , G01N2223/418 , H01J37/222 , H01J37/28 , H01J37/3023 , H01J2237/208 , H01J2237/2817 , H01J2237/31745
Abstract: Disclosed is a charged particle beam apparatus for automatically preparing a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that irradiates a charged particle beam, a sample stage that moves with the sample placed thereon, a sample piece transferring device that holds and transports the sample piece separated and extracted from the sample, a holder fixing base that holds a sample piece holder to which the sample piece is transferred, and a computer that performs control of destroying the sample piece held by the sample piece transferring device when an abnormality occurs after the sample piece transferring device holds the sample piece.
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公开(公告)号:US20170278664A1
公开(公告)日:2017-09-28
申请号:US15468290
申请日:2017-03-24
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Makoto SATO , Satoshi TOMIMATSU , Atsushi UEMOTO , Tatsuya ASAHATA
CPC classification number: H01J37/023 , H01J37/20 , H01J37/3023 , H01J37/304 , H01J37/3056 , H01J2237/208 , H01J2237/31745
Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.
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公开(公告)号:US20200251303A1
公开(公告)日:2020-08-06
申请号:US16495506
申请日:2018-03-27
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Toshiaki FUJI , Satoshi TOMIMATSU , Hiroyuki SUZUKI
Abstract: This charged particle beam apparatus is provided with: a charged particle beam lens-barrel for irradiating a sample with a charged particle beams; a tilting base that has a first sample holding portion capable of holding the sample and that holds the first sample holding portion to be turnable about a first axis; a tilting base that has a second sample holding portion capable of holding the sample and that holds the second sample holding portion to be turnable about a second axis parallel to the first axis; and a driving force supplier that supplies to the tilting bases with a driving force for turning the tilting bases in association with each other.
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公开(公告)号:US20190304745A1
公开(公告)日:2019-10-03
申请号:US16364898
申请日:2019-03-26
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Masato SUZUKI , Satoshi TOMIMATSU , Makoto SATO , Tatsuya ASAHATA
IPC: H01J37/305 , H01J37/20
Abstract: To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.
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公开(公告)号:US20190157037A1
公开(公告)日:2019-05-23
申请号:US16192723
申请日:2018-11-15
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Satoshi TOMIMATSU , Tatsuya Asahata , Makoto Sato , Masato Suzuki
IPC: H01J37/28 , G02B27/09 , G01N23/225
Abstract: (Task) To repeatedly perform an operation of extracting a sample piece formed by processing a sample with an ion beam and of transferring the extracted sample piece to a sample piece holder.(Problem Solving Means) A charged particle beam apparatus includes a computer that sets a shaping processing region including a bottom portion of s ample piece in a thickness direction of the sample piece corresponding to a depth direction at the time of processing a sample after a needle holds the sample piece, and controls a focused ion beam irradiation optical system to irradiate the shaping processing region with a focused ion beam to thereby shape the sample piece.
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公开(公告)号:US20170178858A1
公开(公告)日:2017-06-22
申请号:US15448308
申请日:2017-03-02
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Satoshi TOMIMATSU , Makoto SATO , Atsushi UEMOTO , Tatsuya ASAHATA , Yo YAMAMOTO
IPC: H01J37/302 , H01J37/20
CPC classification number: H01J37/3023 , H01J37/20 , H01J2237/208 , H01J2237/31745
Abstract: A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.
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公开(公告)号:US20250140513A1
公开(公告)日:2025-05-01
申请号:US18687688
申请日:2021-09-01
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Satoshi TOMIMATSU , Tatsuya ASAHATA , Makoto SATO , Masato SUZUKI
IPC: H01J37/20 , H01J37/22 , H01J37/30 , H01J37/317
Abstract: This charged particle beam device (10) comprises a focused ion beam irradiation optical system (14), an electron beam irradiation optics (15), a needle (18), a needle drive mechanism (19), a display device (21), and a computer (22). The computer (22) stores coordinate data for the needle drive mechanism (19) when the tip of the needle (18) matches a prescribed position in an image obtained by irradiating the needle (18) with a focused ion beam or an electron beam. The computer (22) controls the needle drive mechanism (19) and the focused ion beam irradiation optics (14) such that when the total amount of change in the coordinate data in a suitable period is at least a prescribed threshold, a process is executed for removing, by means of irradiation with the focused ion beam, at least a portion of a deposition film attached to the tip of the needle (18).
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公开(公告)号:US20200266031A1
公开(公告)日:2020-08-20
申请号:US16790450
申请日:2020-02-13
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Masato SUZUKI , Ikuko NAKATANI , Satoshi TOMIMATSU , Makoto SATO
IPC: H01J37/30
Abstract: Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.
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公开(公告)号:US20180204705A1
公开(公告)日:2018-07-19
申请号:US15871767
申请日:2018-01-15
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor: Satoshi TOMIMATSU , Makoto SATO , Masato SUZUKI
IPC: H01J37/20 , H01J37/28 , H01J37/285 , H01J37/305
Abstract: Disclosed is a charged particle beam apparatus for automatically preparing a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system configured to irradiate an object with a charged particle beam, a stage configured to move with the sample placed thereon, a sample piece transferring device configured to hold and transport the sample piece separated and extracted from the sample, a holder fixing base configured to hold a sample piece holder to which the sample piece is to be transferred, an electrical conduction sensor configured to detect electrical conduction between the sample piece transferring device and an object, and a computer configured to set a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.
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