公开(公告)号：US08633458B2

公开(公告)日：2014-01-21

申请号：US13296436

申请日：2011-11-15

申请人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, Jr. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

发明人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, Jr. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

IPC分类号： G21G5/00

CPC分类号： C23C14/48 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/1523 ,  H01J2237/20214

摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.

公开(公告)号：US08435804B2

公开(公告)日：2013-05-07

申请号：US13331915

申请日：2011-12-20

申请人： Adam Kell ,  Robert Clark-Phelps ,  Joseph D. Gillespie ,  Gopal Prabhu ,  Takao Sakase ,  Theodore H. Smick ,  Steve Zuniga ,  Steve Bababyan

发明人： Adam Kell ,  Robert Clark-Phelps ,  Joseph D. Gillespie ,  Gopal Prabhu ,  Takao Sakase ,  Theodore H. Smick ,  Steve Zuniga ,  Steve Bababyan

IPC分类号： H01L21/00 ,  H01L31/0224

CPC分类号： H01L31/0288 ,  H01L21/67092 ,  H01L21/67132 ,  H01L21/6838 ,  H01L31/0747 ,  H01L31/1892 ,  Y02E10/50 ,  Y10T156/11 ,  Y10T156/1132

摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and separably contacting the donor body with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body, and a deforming force is applied to the lamina or to the donor body to separate the lamina from the donor body.

摘要翻译： 用于从施主体产生层的方法包括用离子剂量植入施主体，并将施主体与供体体和基座组件直接接触的基座组件分离接触。 薄片从供体体剥离，并且将变形力施加到椎板或施主体以将椎板与供体体分开。

公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US20070105355A1

公开(公告)日：2007-05-10

申请号：US11527594

申请日：2006-09-27

申请人： Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/265 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764 ,  Y10S438/961

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20130119263A1

公开(公告)日：2013-05-16

申请号：US13296436

申请日：2011-11-15

申请人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, JR. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

发明人： Theodore Smick ,  Geoffrey Ryding ,  Hilton Glavish ,  Takao Sakase ,  William Park, JR. ,  Paul Eide ,  Drew Arnold ,  Ronald Horner ,  Joseph Gillespie

IPC分类号： H01J1/50

CPC分类号： C23C14/48 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/1523 ,  H01J2237/20214

摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.

摘要翻译： 使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。 准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。 在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。 质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。

公开(公告)号：US20130056655A1

公开(公告)日：2013-03-07

申请号：US13226590

申请日：2011-09-07

申请人： Theodore Smick ,  Geoffrey Ryding ,  Takao Sakase ,  William Park, JR. ,  Joseph Gillespie ,  Ronald Horner ,  Paul Eide

发明人： Theodore Smick ,  Geoffrey Ryding ,  Takao Sakase ,  William Park, JR. ,  Joseph Gillespie ,  Ronald Horner ,  Paul Eide

IPC分类号： G21K5/10

CPC分类号： C23C14/48 ,  C23C14/505 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/201 ,  H01J2237/20214

摘要： An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.

摘要翻译： 使用具有旋转轴和周边的旋转扫描组件的离子注入的装置和方法。 多个基板保持器围绕周边分布，并且基板保持器布置成保持相应的平面基板。 每个平面基板在周边上具有相应的几何中心。 束线组件提供离子束以用于植入在支架上的平面基底中。 束线组件被布置成沿着最终光束路径引导所述光束。

公开(公告)号：US08268645B2

公开(公告)日：2012-09-18

申请号：US13331909

申请日：2011-12-20

申请人： Adam Kell ,  Robert Clark-Phelps ,  Joseph D. Gillespie ,  Gopal Prabhu ,  Takao Sakase ,  Theodore H. Smick ,  Steve Zuniga ,  Steve Bababyan

发明人： Adam Kell ,  Robert Clark-Phelps ,  Joseph D. Gillespie ,  Gopal Prabhu ,  Takao Sakase ,  Theodore H. Smick ,  Steve Zuniga ,  Steve Bababyan

IPC分类号： H01L21/00 ,  H02N6/00

CPC分类号： H01L31/0288 ,  H01L21/67092 ,  H01L21/6838 ,  H01L31/0747 ,  H01L31/1892 ,  Y02E10/50

摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and heating the donor body to an implant temperature during implanting. The donor body is separably contacted with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body by applying a thermal profile to the donor body. Implantation and exfoliation conditions may be adjusted in order to maximize the defect-free area of the lamina.

摘要翻译： 用于从施主实体产生层的方法包括：在植入期间，将施主体以离子剂量植入，并将施主体加热至植入温度。 施主体与供体体和基座组件直接接触的基座组件分离接触。 通过向施主体施加热分布，使薄片从供体体剥离。 可以调整植入和剥脱条件以最大化层的无缺陷区域。

公开(公告)号：US20090321630A1

公开(公告)日：2009-12-31

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： B01D59/44 ,  A61N5/00 ,  H01J37/08

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US07479644B2

公开(公告)日：2009-01-20

申请号：US11589156

申请日：2006-10-30

申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

IPC分类号： H01J37/317 ,  H01L21/265

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

公开(公告)号：US20080169435A1

公开(公告)日：2008-07-17

申请号：US11652651

申请日：2007-01-12

申请人： Takao Sakase ,  Marvin Farley ,  Steven C. Hays

发明人： Takao Sakase ,  Marvin Farley ,  Steven C. Hays

IPC分类号： G21K5/10 ,  G01R31/00 ,  G06F9/30

CPC分类号： H01J37/304 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/0044 ,  H01J2237/2008 ,  H01J2237/20228 ,  H01J2237/24507

摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the floating potential across an ion beam used for implantation. The invention provides a ion beam monitoring arrangement comprising a device configured to measure the floating potential of an ion beam when incident thereon, wherein the device is coupled to a substrate support so as to face outwardly in a position so as not to be obscured by a substrate of the contemplated size when held by the substrate holder. Thus, measurements of the floating potential may be taken with a substrate held in place. The ion beam monitoring arrangement may be used to move the device into the ion beam in much the same way as it used to scan a substrate through the ion beam.

摘要翻译： 本发明涉及用于离子注入机的离子束监测装置，其中期望监测跨越用于植入的离子束的浮动电位。 本发明提供了一种离子束监测装置，其包括被配置为当入射在其上时测量离子束的浮置电位的装置，其中该装置耦合到衬底支撑件，以便在不被一个 基板保持器保持的预期尺寸的基板。 因此，浮动电位的测量可以在保持在适当位置的基板上进行。 离子束监测装置可以用于将装置以与用于通过离子束扫描基板的方式大致相同的方式移动到离子束中。