-
公开(公告)号：US20210210303A1
公开(公告)日：2021-07-08
申请号：US17209626
申请日：2021-03-23
发明人： Dirk Zeidler , Hans Fritz , Ingo Mueller , Georgo Metalidis
IPC分类号： H01J37/12 , H01J37/153 , H01J37/244
摘要： A particle beam system includes: a particle source to generate a beam of charged particles; a first multi-lens array including a first multiplicity of individually adjustable and focusing particle lenses so that at least some of the particles pass through openings in the multi-lens array in the form of a plurality of individual particle beams; a second multi-aperture plate including a multiplicity of second openings downstream of the first multi-lens array so that some of the particles which pass the first multi-lens array impinge on the second multi-aperture plate and some of the particles which pass the first multi-lens array pass through the openings in the second multi-aperture plate; and a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array and thus individually adjust the focusing of the associated particle lens for each individual particle beam.
-
公开(公告)号：US10811215B2
公开(公告)日：2020-10-20
申请号：US16416447
申请日：2019-05-20
发明人： Dirk Zeidler , Stefan Schubert , Ingo Mueller , Joerg Jacobi , Mario Muetzel , Antonio Casares , Christof Riedesel
IPC分类号： H01J37/14 , H01J37/05 , H01J37/147 , H01J37/21 , H01J37/244 , H01J37/28 , H01J37/06
摘要： A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.
-
公开(公告)号：US20240128048A1
公开(公告)日：2024-04-18
申请号：US18393170
申请日：2023-12-21
发明人： Ingo Mueller , Nicolas Kaufmann , Michael Behnke , Hans Fritz
CPC分类号： H01J37/243 , H01J37/12 , H01J37/261 , H01J2237/0435 , H01J2237/24564
摘要： A method for operating a multi-beam particle microscope which operates using a plurality of individual charged particle beams, wherein the method includes the following steps: measuring the beam current; determining a deviation of the measured beam current from a nominal beam current; decomposing the determined deviation into a drift component and into a high-frequency component; and controlling the high-frequency component of the beam current via a first closed-loop beam current control mechanism and/or compensating an effect of the high-frequency component on a recording quality of the multi-beam particle microscope using different mechanism than a closed-loop beam current control mechanism. An electrostatic control lens arranged in the beam generating system between extractor and anode can be used as first closed-loop beam current control mechanism. Adapting an extractor voltage of the beam generating system can be avoided.
-
公开(公告)号：US12057290B2
公开(公告)日：2024-08-06
申请号：US17572767
申请日：2022-01-11
发明人： Hans Fritz , Ingo Mueller
IPC分类号： H01J37/317 , H01J37/10 , H01J37/145 , H01J37/147 , H01J37/26 , H01J37/302
CPC分类号： H01J37/3177 , H01J37/10 , H01J37/145 , H01J37/147 , H01J37/263 , H01J37/3023 , H01J2237/0453 , H01J2237/04926
摘要： A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.
-
公开(公告)号：US20230065475A1
公开(公告)日：2023-03-02
申请号：US17983220
申请日：2022-11-08
发明人： Dirk Zeidler , Hans Fritz , Ingo Mueller
IPC分类号： H01J37/09 , H01J37/28 , H01J37/21 , H01J37/14 , H01J37/147 , H01J37/153 , H01J37/073
摘要： A particle beam system includes a multi-source system. The multi-source system comprises an electron emitter array as a particle multi-source. The inhomogeneous emission characteristics of the various emitters in this multi-source system are correctable, or pre-correctable for subsequent particle-optical imaging, via particle-optical components that are producible via MEMS technology. A beam current of the individual particle beams is adjustable in the multi-source system.
-
公开(公告)号：US11164715B2
公开(公告)日：2021-11-02
申请号：US17021724
申请日：2020-09-15
发明人： Dirk Zeidler , Stefan Schubert , Ingo Mueller , Joerg Jacobi , Mario Muetzel , Antonio Casares , Christof Riedesel
IPC分类号： H01J37/14 , H01J37/05 , H01J37/147 , H01J37/21 , H01J37/244 , H01J37/28 , H01J37/06
摘要： A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.
-
公开(公告)号：US11562880B2
公开(公告)日：2023-01-24
申请号：US17209626
申请日：2021-03-23
发明人： Dirk Zeidler , Hans Fritz , Ingo Mueller , Georgo Metalidis
IPC分类号： H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28
摘要： A particle beam system includes: a particle source to generate a beam of charged particles; a first multi-lens array including a first multiplicity of individually adjustable and focusing particle lenses so that at least some of the particles pass through openings in the multi-lens array in the form of a plurality of individual particle beams; a second multi-aperture plate including a multiplicity of second openings downstream of the first multi-lens array so that some of the particles which pass the first multi-lens array impinge on the second multi-aperture plate and some of the particles which pass the first multi-lens array pass through the openings in the second multi-aperture plate; and a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array and thus individually adjust the focusing of the associated particle lens for each individual particle beam.
-
公开(公告)号：US20220277927A1
公开(公告)日：2022-09-01
申请号：US17663323
申请日：2022-05-13
发明人： Stefan Schubert , Dieter Schumacher , Erik Essers , Ingo Mueller , Arne Thoma , Joerg Jacobi , Wilhelm Bolsinger , Dirk Zeidler
IPC分类号： H01J37/28 , H01J37/317 , H01J37/147 , H01J37/04 , H01J37/244
摘要： A particle beam system, such as a multi-beam particle microscope, includes a multi-beam deflection device and a beam stop. The multi-beam deflection device is arranged in the particle-optical beam path downstream of the multi-beam generator and upstream of the beam switch of the particle beam system. The multi-beam deflection device serves collectively blanks a multiplicity of charged individual particle beams. These impinge on a beam stop, which is arranged in the particle-optical beam path level with a site at which a particle beam diameter is reduced or is at a minimum. By way of example, such sites are the cross-over plane of the individual particle beams or an intermediate image plane. Associated methods for operating the particle beam system and associated computer program products are disclosed.
-
公开(公告)号：US20220246388A1
公开(公告)日：2022-08-04
申请号：US17582504
申请日：2022-01-24
发明人： Nicole Rauwolf , Nico Kaemmer , Michael Behnke , Ingo Mueller , Dirk Zeidler , Arne Thoma , Christof Riedesel , Gunther Scheunert
摘要： A multiple particle beam microscope and an associated method set a desired focal plane with an optical resolution and set a telecentric irradiation with the plurality of the primary beams. A method determines an optimal setting plane, into which an object surface is brought. Further, a system provides an improved resolution and telecentric irradiation for a large number of primary beams. Targeted selection and targeted individual influencing of individual primary beams and/or a mechanism means for influencing the plurality of primary beams in collective fashion can be implemented.
-
公开(公告)号：US20210142980A1
公开(公告)日：2021-05-13
申请号：US17125825
申请日：2020-12-17
发明人： Dirk Zeidler , Hans Fritz , Ingo Mueller , Stefan Schubert , Arne Thoma , András Major
IPC分类号： H01J37/317 , H01J37/147 , H01J37/14
摘要： A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.017 秒)
