公开(公告)号：US11205557B2

公开(公告)日：2021-12-21

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/24 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US12009174B2

公开(公告)日：2024-06-11

申请号：US17651278

申请日：2022-02-16

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kazuhiro Kishi ,  Munehiro Ogasawara

IPC: H01J37/04 ,  H01J37/26 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/26 ,  H01J2237/0435

Abstract: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.

公开(公告)号：US11177107B2

公开(公告)日：2021-11-16

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/24 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US20200335297A1

公开(公告)日：2020-10-22

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.