公开(公告)号：US10236158B2

公开(公告)日：2019-03-19

申请号：US15586858

申请日：2017-05-04

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kenichi Kataoka ,  Mitsuhiro Okazawa ,  Yoshiro Yamanaka

IPC: H01J37/30 ,  H01J37/317

Abstract: A heat transfer plate according to the present embodiment includes a first heat transfer unit transferring heat generated in a member mounted on the first heat transfer unit, the heat being generated due to shaping or controlling of a beam generated by a light source in a decompressed atmosphere, a second heat transfer unit provided around the first heat transfer unit, and a plurality of third heat transfer units making the first heat transfer unit movable with respect to the second heat transfer unit, the plurality of third heat transfer units connecting the first and second heat transfer units.

公开(公告)号：US11908659B2

公开(公告)日：2024-02-20

申请号：US17805887

申请日：2022-06-08

Applicant: NuFlare Technology, Inc.

Inventor： Toshiki Kimura ,  Hirofumi Morita ,  Takanao Touya ,  Mitsuhiro Okazawa

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J2237/0435

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.

公开(公告)号：US11574797B2

公开(公告)日：2023-02-07

申请号：US17448559

申请日：2021-09-23

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Mitsuhiro Okazawa

IPC: H01J37/317 ,  H01J37/304 ,  H01J37/04

Abstract: A multiple-charged particle-beam irradiation apparatus includes a shaping aperture array substrate that causes a charged particle beam to pass through a plurality of first apertures to form multi-beams, a plurality of blanking aperture array substrates each provided with a plurality of second apertures, which enable corresponding beams to pass, and including a blanker arranged at each of the second apertures, a movable table on which the blanking aperture array substrates are mounted so as to be spaced apart from each other in a second direction, which is orthogonal to a first direction along an optical axis, and that moves in the second direction to position one of the blanking aperture array substrates on the optical axis, and an alignment mechanism that performs an alignment adjustment between the blanking aperture array substrate on the optical axis and the shaping aperture array substrate.

公开(公告)号：US11205557B2

公开(公告)日：2021-12-21

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/24 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US11217428B2

公开(公告)日：2022-01-04

申请号：US16835369

申请日：2020-03-31

Applicant: NuFlare Technology, Inc.

Inventor： Mitsuhiro Okazawa ,  Hirofumi Morita

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/04

Abstract: Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.

公开(公告)号：US11177107B2

公开(公告)日：2021-11-16

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/24 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US20200335297A1

公开(公告)日：2020-10-22

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.