公开(公告)号：US20200004162A1

公开(公告)日：2020-01-02

申请号：US16570382

申请日：2019-09-13

申请人： ASML NETHERLANDS B.V.

发明人： Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Han Henricus Aldegonda LEMPENS ,  Miao YU ,  Cornelius Maria ROPS ,  Ruud OLIESLAGERS ,  Arturnç ULUCAN ,  Theodorus Wilhelmus POLET ,  Patrick Johannes Wilhelmus SPRUYTENBURG

IPC分类号： G03F7/20 ,  H01L21/027

摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US20160179015A1

公开(公告)日：2016-06-23

申请号：US15054010

申请日：2016-02-25

申请人： ASML NETHERLANDS B.V.

发明人： Theodorus Wilhelmus POLET ,  Henrikus Herman Marie COX ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Gregory Martin Mason CORCORAN ,  Frank Johannes Jacobus VAN BOXTEL

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

公开(公告)号：US20180364584A1

公开(公告)日：2018-12-20

申请号：US15781813

申请日：2016-11-02

申请人： ASML NETHERLANDS B.V.

发明人： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alverto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70716

摘要： A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC分类号： G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20240192607A1

公开(公告)日：2024-06-13

申请号：US17641206

申请日：2020-08-26

申请人： ASML NETHERLANDS B.V.

发明人： Theodorus Wilhelmus POLET ,  Koen STEFFENS ,  Ronald VAN DER HAM ,  Gerben PIETERSE ,  Erik Henricus Egidius Catharina EUMMELEN ,  Francis FAHRNI

IPC分类号： G03F7/00 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70733 ,  G03F7/70991

摘要： A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

公开(公告)号：US20210181641A1

公开(公告)日：2021-06-17

申请号：US17186117

申请日：2021-02-26

申请人： ASML NETHERLANDS B.V.

发明人： Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Han Henricus Aldegonda LEMPENS ,  Miao YU ,  Cornelius Maria ROPS ,  Ruud OLIESLAGERS ,  Artunç ULUCAN ,  Theodorus Wilhelmus POLET ,  Patrick Johannes Wilhelmus SPRUYTENBURG

IPC分类号： G03F7/20 ,  H01L21/027

摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US20180210350A1

公开(公告)日：2018-07-26

申请号：US15320300

申请日：2015-06-04

申请人： ASML NETHERLANDS B.V.

发明人： Gerben PIETERSE ,  Theodorus Wilhelmus POLET ,  Johannes Jacobus Matheus BASELMANS ,  Willem Jan BOUMAN ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70316 ,  G03F7/70341

摘要： An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

公开(公告)号：US20180196354A1

公开(公告)日：2018-07-12

申请号：US15741763

申请日：2016-07-13

申请人： ASML NETHERLANDS B.V.

发明人： Cornelius Maria ROPS ,  Willem Jan BOUMAN ,  Theodorus Wilhelmus POLET

IPC分类号： G03F7/20 ,  H01L21/027 ,  G02B27/00

CPC分类号： G03F7/70341 ,  G02B27/0006 ,  G03F7/2041 ,  G03F7/70783 ,  G03F7/70808 ,  G03F7/70891 ,  G03F7/70958 ,  H01L21/0274

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam through the projection system onto a target portion of a substrate. A liquid confinement structure confines an immersion liquid in a space between the projection system and the substrate. The projection system includes: an exit surface through which to project the patterned radiation beam; and a further surface facing the liquid confinement structure. The further surface has a first static receding contact angle with respect to the immersion liquid. The exit surface has a second static receding contact angle with respect to the immersion liquid. The first static receding contact angle is: greater than the second static receding contact angle; and less than 65 degrees.

公开(公告)号：US20230053840A1

公开(公告)日：2023-02-23

申请号：US17952119

申请日：2022-09-23

申请人： ASML NETHERLANDS B.V.

发明人： Pepijn VAN DEN EIJNDEN ,  Cornelius Maria ROPS ,  Theodorus Wilhelmus POLET ,  Floor Lodewijk KEUKENS ,  Gheorghe TANASA ,  Rogier Hendrikus Magdalena CORTIE ,  Koen CUYPERS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Evert VAN VLIET ,  Nicolaas TEN KATE ,  Mark Johannes Hermanus FRENCKEN ,  Jantien Laura VAN ERVE ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC分类号： G03F7/20

摘要： A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US20210116824A1

公开(公告)日：2021-04-22

申请号：US16981813

申请日：2019-03-13

申请人： ASML NETHERLANDS B.V.

发明人： Miao YU ,  Petrus, Martinus, Gerardus, Jothannes ARTS ,  Erik, Henricus, Egidius, Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Maarten HOLTRUST ,  Han, Henricus, Aldegonda LEMPENS ,  Ferdy MIGCHELBRINK ,  Theodorus Wilhelmus POLET ,  Gheorghe TANASA

IPC分类号： G03F7/20

摘要： A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.