公开(公告)号：US20240219844A1

公开(公告)日：2024-07-04

申请号：US18426549

申请日：2024-01-30

Applicant: Carl Zeiss SMT GmbH

Inventor： Nicole Auth ,  Michael Budach ,  Christian Felix Hermanns ,  Fan Tu

IPC: G03F7/00 ,  G03F1/54

CPC classification number: G03F7/70608 ,  G03F1/54 ,  G03F7/70958

Abstract: The present invention refers to a method for determining at least one optical property of at least one deposition material used for a lithographic mask which comprises the steps: (a) determining a height value of the at least one deposition material deposited on a substrate for each of at least three different deposition heights of the deposition material, wherein the at least three different deposition heights are in a nanoscale range; (b) determining a reflectivity value of the at least one deposition material for each of the at least three different deposition heights, wherein determining the reflectivity values comprises using photons generated by an optical inspection system; and (c) determining the at least one optical property of the at least one deposition material by adapting simulated reflectivity data to the measured reflectivity values for each of the at least three different deposition heights.

公开(公告)号：US11762281B2

公开(公告)日：2023-09-19

申请号：US17130537

申请日：2020-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles Abegg ,  Nirupam Banerjee ,  Michiel Alexander Blauw ,  Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Matthias Kruizinga ,  Egbert Lenderink ,  Nicolae Maxim ,  Andrey Nikipelov ,  Arnoud Willem Notenboom ,  Claudia Piliego ,  Mária Péter ,  Gijsbert Rispens ,  Nadja Schuh ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Antonius Willem Verburg ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/82 ,  G02B5/20 ,  G03F7/00 ,  G02B5/28

CPC classification number: G03F1/62 ,  G02B5/208 ,  G02B5/283 ,  G03F1/82 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20230205090A1

公开(公告)日：2023-06-29

申请号：US18171449

申请日：2023-02-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Sandro HOFFMANN ,  Valentin Jonatan BOLSINGER ,  Sandra HASCHKE

IPC: G03F7/20

CPC classification number: G03F7/2008 ,  G03F7/70958 ,  G03F7/70983

Abstract: A reflective optical element (17), in particular for an illumination optical unit of a projection exposure apparatus includes: a structured surface (25a) that preferably forms a grating structure (29), and a reflective coating (36) that is applied to the structured surface (25a). The reflective coating (36) covers the structured surface (25a) discontinuously, and the reflective optical element (17) has at least one protective layer (37) that covers the structured surface (25a) continuously. Also disclosed are an illumination optical unit (4) for a projection exposure apparatus (1) including at least one reflective optical element (17) of this type, to a projection exposure apparatus (1) including an illumination optical unit (4) of this type, and to a method for producing a protective layer (37) on a reflective optical element (17) of this type.

公开(公告)号：US11681236B2

公开(公告)日：2023-06-20

申请号：US17373020

申请日：2021-07-12

Applicant: Carl Zeiss SMT GmbH

Inventor： Vitaliy Shklover ,  Jeffrey Erxmeyer

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70958 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983

Abstract: In situ dynamic protection of an optical element surface against degradation includes disposing the optical element in an interior of an optical assembly for the FUV/VUV wavelength range and supplying at least one volatile fluorine-containing compound (A, B) to the interior for dynamic deposition of a fluorine-containing protective layer on the surface. The protective layer (7) is deposited on the surface layer by layer via a molecular layer deposition process. The compound includes a fluorine-containing reactant (A) supplied to the interior in a pulsed manner. A further reactant (B) is supplied to the interior also in a pulsed manner. An associated optical assembly includes an interior in which a surface is disposed, and at least one metering apparatus (123) that supplies a reactant to the interior. The metering apparatus provides a pulsed supply of the compound as a reactant (A, B) for layer by layer molecular layer deposition.

公开(公告)号：US20190064676A1

公开(公告)日：2019-02-28

申请号：US16131326

申请日：2018-09-14

Applicant: Carl Zeiss SMT GmbH

Inventor： Toralf Gruner ,  Ricarda Schoemer

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G02B5/208 ,  G02B5/22 ,  G02B27/0025 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70891 ,  G03F7/70958

Abstract: An attenuation filter is configured to define attenuation of the intensity of ultraviolet radiation with a specified working wavelength from a wavelength range of 150-370 nm according to a specifiable local distribution in a projection lens of a microlithographic projection exposure apparatus. The attenuation filter has a substrate and an absorption layer on the substrate. The substrate is sufficiently transparent at the working wavelength. The absorption absorbs incident ultraviolet radiation of the working wavelength according to the specifiable local distribution at different locations of a used area to varying degrees. The attenuation filter reduces or avoids a thermally induced wavefront variation error in the ultraviolet radiation which has passed through the attenuation filter owing to locally varying heating of the substrate, which is caused by the absorption of the ultraviolet radiation that varies locally over the substrate. A thickness of the substrate is less than 100 um.

公开(公告)号：US20180196354A1

公开(公告)日：2018-07-12

申请号：US15741763

申请日：2016-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Willem Jan BOUMAN ,  Theodorus Wilhelmus POLET

IPC: G03F7/20 ,  H01L21/027 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0006 ,  G03F7/2041 ,  G03F7/70783 ,  G03F7/70808 ,  G03F7/70891 ,  G03F7/70958 ,  H01L21/0274

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam through the projection system onto a target portion of a substrate. A liquid confinement structure confines an immersion liquid in a space between the projection system and the substrate. The projection system includes: an exit surface through which to project the patterned radiation beam; and a further surface facing the liquid confinement structure. The further surface has a first static receding contact angle with respect to the immersion liquid. The exit surface has a second static receding contact angle with respect to the immersion liquid. The first static receding contact angle is: greater than the second static receding contact angle; and less than 65 degrees.

公开(公告)号：US10012908B2

公开(公告)日：2018-07-03

申请号：US15410048

申请日：2017-01-19

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Vinayak Vishwanath Hassan ,  Cara Beasley ,  Majeed A. Foad

IPC: G03F1/24 ,  G02B1/14 ,  G03F7/20 ,  C23C16/44 ,  H01J37/32 ,  H01J37/34 ,  C23C14/06 ,  C23C14/14 ,  G21K1/06 ,  G03F1/48 ,  G03F1/52 ,  G02B5/08

CPC classification number: G03F7/702 ,  C23C14/0605 ,  C23C14/0635 ,  C23C14/14 ,  C23C16/44 ,  G02B1/14 ,  G02B5/085 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F7/70033 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  H01J37/32798 ,  H01J37/3429

Abstract: An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

公开(公告)号：US09952515B2

公开(公告)日：2018-04-24

申请号：US14839633

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US09939739B2

公开(公告)日：2018-04-10

申请号：US15056295

申请日：2016-02-29

Applicant: NIKON CORPORATION

Inventor： Naoyuki Kobayashi ,  Akikazu Tanimoto

IPC: G03B27/42 ,  G03B27/52 ,  G03F7/20 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

Abstract: A liquid immersion exposure method exposes a substrate with exposure light through liquid, and uses a projection system, a stage system having a holder that holds the substrate, a supply port via which the liquid is supplied arranged such that an upper surface of the substrate faces the supply port and that is spaced a first distance from an optical axis of the projection system, and a recovery port via which the liquid is collected arranged such that the upper surface of the substrate faces the recovery port, which is spaced a second distance greater than the first distance from the optical axis of the projection system, and that encircles the supply port. In the method, the substrate held on the holder is positioned based on a detection result of an alignment system that detects an alignment mark of the substrate not through the liquid.

公开(公告)号：US09933711B2

公开(公告)日：2018-04-03

申请号：US14227352

申请日：2014-03-27

Applicant: Carl Zeiss Laser Optics GmbH

Inventor： Vitaliy Shklover ,  Michael Schall ,  Johannes Kraus ,  Oliver Gloeckl ,  Jeffrey Erxmeyer ,  Horst Feldermann ,  Konstantin Forcht ,  Ute Heinemeyer

IPC: G03B27/54 ,  G03F7/20 ,  G02B1/115

CPC classification number: G03F7/70958 ,  G02B1/115 ,  G03F7/20 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/70316

Abstract: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.