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公开(公告)号：US20240302670A1
公开(公告)日：2024-09-12
申请号：US18599566
申请日：2024-03-08
Applicant: Lasertec Corporation
Inventor： Keitaro HAYASHIDA , Shinji TANAKA , Masaki KOICHI , Haruhiko KUSUNOSE
IPC: G02B27/09 , G02B5/08 , G02B26/08 , G02B26/10 , H04N23/72 , H04N23/74 , H04N23/75 , H04N25/71 , H05G2/00
CPC classification number: G02B27/0933 , G02B26/0816 , G02B26/10 , G02B27/0927 , G02B27/0977 , H04N23/72 , H04N23/74 , H04N23/75 , H04N25/71 , H05G2/008 , G02B5/0891
Abstract: Provided are an illumination apparatus and an illumination method capable of uniformly illuminating a visual field region detected by a detector. The present disclosure provides an illumination apparatus including: a drive unit configured to drive an optical member such that illumination light scans, in one direction, a visual field region that is a region extending in the one direction on a sample; and a control unit configured to control the drive unit to cause the illumination light to scan in synchronization with a transfer of a sensor that receives light from the visual field region illuminated by the illumination light.
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2.发明授权公开(公告)号：US11994802B2
公开(公告)日：2024-05-28
申请号：US17464185
申请日：2021-09-01
Applicant: Waymo LLC
Inventor： James Dunphy , David Hutchison
CPC classification number: G03F7/201 , G03F7/0005 , G03F7/2008 , G03F7/2014 , G03F7/26 , G03F7/7015 , G02B5/0891
Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.
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公开(公告)号：US20240118464A1
公开(公告)日：2024-04-11
申请号：US18535383
申请日：2023-12-11
Applicant: MATERION CORPORATION
Inventor： Ki-Sung SONG , Hunho LEE , Edgar E. VIDAL , Kyung H. CHUNG , Jason R. CLUNE
CPC classification number: G02B5/0891 , C22C25/00
Abstract: An apparatus is disclosed which includes an ultraviolet laser and at least one reflective mirror having a substrate which is made from beryllium, an aluminum metal matrix, or silicon carbide. The at least one mirror is adapted to reflect a laser beam generated from the ultraviolet laser, which can then be used on a silicon film used in the production of an electronic display. The laser beam can be used to anneal the silicon film, or in a laser lift-off process for separating the silicon film from a temporary substrate upon which the silicon film was mounted.
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公开(公告)号：US11933980B2
公开(公告)日：2024-03-19
申请号：US18139495
申请日：2023-04-26
Applicant: MAXELL, LTD. , Hitachi Industry & Control Solutions, Ltd.
Inventor： Koji Hirata , Masahiko Yatsu , Toshinori Sugiyama , Kazuomi Kaneko
CPC classification number: G02B27/0101 , B60K35/00 , G02B5/0891 , G02B5/10 , G02B27/0018 , G02B27/0068 , B60K2370/334 , G02B2027/011 , G02B2027/0118
Abstract: The information display apparatus configured to display video information of a virtual image on a reflecting surface of conveyance includes: a display configured to display the video information; and a virtual image optical system configured to display a virtual image at a front of the conveyance by reflecting light emitted from the display by means of the reflecting surface. The virtual image optical system includes a concave mirror and an optical element. The optical element is arranged between the display and the concave mirror, and is configured to correct distortion of the virtual image obtained so as to correspond to a viewpoint position of a driver on a basis of a shape of the concave mirror and a shape of the optical element. The information display apparatus further includes a virtual image double image conversion reducer configured to reduce double image conversion of the virtual image.
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公开(公告)号：US20240019786A1
公开(公告)日：2024-01-18
申请号：US17866656
申请日：2022-07-18
Applicant: Taiwan Semiconductor Manufacturing Company
Inventor： Yung-Yao Lee , Yi-Nong Chung
CPC classification number: G03F7/7015 , G02B5/0891 , G02B7/1815 , G02B17/06 , H01L21/027 , G21K1/067 , G03F7/70033 , G03F7/7085 , G03F7/70891 , G03F7/7095
Abstract: A heated extreme ultraviolet (EUV) mirror, method of making same, and a projection optics box (POB) of an EUV lithography scanner employing same, are disclosed. The POB includes EUV mirrors disposed inside a vacuum chamber and arranged respective to project an image of a reflective EUV photolithography mask disposed on a reticle stage onto a wafer disposed on a wafer stage. Each EUV mirror of the plurality of EUV mirrors includes a mirror support and an EUV-reflective multilayer disposed on a front side of the mirror support. The plurality of EUV mirrors includes at least one heated EUV mirror that further includes a resistive heater disposed in the mirror support of the heated EUV mirror. In integrated circuit manufacturing, the exposure of a photoresist layer on a semiconductor wafer to EUV light using the POB includes controlling mirror temperature using a heater embedded in the EUV mirror.
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Patent Agency Ranking
公开(公告)号：US11872321B2
公开(公告)日：2024-01-16
申请号：US17378158
申请日：2021-07-16
Applicant: 12180235 Canada Ltd.
Inventor： David Allan Prystupa , John Stephen Pacak
IPC: A61L2/00 , G02B5/08 , A61L2/26 , A61L2/10 , A61L9/20 , G21K1/06 , A62B18/02 , A62B7/12 , A62B9/00 , A62B18/08 , F24F8/22 , A62B9/02 , A62B18/00
CPC classification number: A61L2/0047 , A61L2/10 , A61L2/26 , A61L9/20 , A61L9/205 , A62B7/12 , A62B9/00 , A62B18/02 , A62B18/08 , G02B5/0891 , G21K1/062 , A61L2202/11 , A61L2202/14 , A61L2209/111 , A62B9/02 , A62B18/006 , F24F8/22
Abstract: A flow through photochemistry apparatus and methods of use are disclosed in the present application. One or more reactant materials are passed through a reaction chamber and are exposed to electromagnetic radiation. The reaction chamber has reflective walls arranged to reflect electromagnetic radiation across the volume of the chamber a plurality of times, thereby increasing the probability of the electromagnetic radiation interacting with the reactive materials. The reaction chamber may be used for sterilization and photochemistry applications.
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公开(公告)号：US20230417954A1
公开(公告)日：2023-12-28
申请号：US18210461
申请日：2023-06-15
Applicant: CORNING INCORPORATED
Inventor： Donald Erwin Allen , Narendra Shamkant Borgharkar , Ming-Huang Huang , Hoon Kim , Jue Wang
CPC classification number: G02B1/14 , G02B5/0891 , C23C14/14 , C23C14/5846 , C23C14/5873 , C23C16/30 , C23C16/45555 , C23C16/45527 , C23C16/45553 , C23C28/32 , C23C28/34
Abstract: A method of making an enhanced aluminium mirror for vacuum ultraviolet (VUV) optics includes depositing a reflective coating comprising aluminium metal to at least one surface of a substrate through physical vapor deposition (PVD) to produce a mirror comprising the substrate and the reflective coating. The method further includes removing aluminium oxides from an outer surface of the reflective coating by conducting atomic layer etching (ALE) in an Atomic Layer Deposition (ALD) system to produce an etched surface of the reflective coating and depositing an ALD protective layer onto the etched surface of the reflective coating by conducting atomic layer deposition in the ALD system to produce the enhanced aluminium mirror. The enhanced aluminium mirror includes the substrate, the reflective coating deposited on the substrate, and the ALD protective layer covering the etched surface of the reflective coating.
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公开(公告)号：US20230353085A1
公开(公告)日：2023-11-02
申请号：US17937125
申请日：2022-09-30
Applicant: Shenzhen Hello Tech Energy Co Ltd
Inventor： Yanjun ZHU , Xiangwen Luo , Zhongwei Sun
CPC classification number: H02S40/22 , G02B5/0891 , G02B27/0006
Abstract: A reflector is configured to reflect sunlight onto the double-sided power generation cell and mainly includes the reflector. The reflector is provided with a plurality of reflection regions. Each of the plurality of reflection regions is provided with a reflection protrusion having a different inclination angle. The double-sided power generation cell is obliquely disposed between two adjacent ones of the plurality of reflection regions. The reflection regions are capable of reflecting the sunlight onto a light-receiving side and a rear side of the double-sided power generation cell.
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公开(公告)号：US20190196344A1
公开(公告)日：2019-06-27
申请号：US16293774
申请日：2019-03-06
Applicant: Carl Zeiss SMT GmbH
Inventor： Matthias ROOS , Eugen FOCA
CPC classification number: G03F7/70841 , B08B17/065 , G02B5/0816 , G02B5/0891 , G02B27/0006 , G03F7/70033 , G03F7/70916 , G21K1/062
Abstract: A vacuum system, in particular an EUV lithography system, includes: a vacuum housing (2), in which a vacuum environment (16) is formed. A surface (2a) of the vacuum housing is subjected to contaminating particles (17) in the vacuum environment. A surface structure (18) at the surface reduces adhesion of the contaminating particles and has pore-shaped depressions (24) separated from one another by webs (25).
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公开(公告)号：US20190025562A1
公开(公告)日：2019-01-24
申请号：US16139474
申请日：2018-09-24
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Schwab
CPC classification number: G02B17/0663 , G02B5/0891 , G03F7/70008 , G03F7/70233 , G21K1/067
Abstract: A projection optical unit images an object field in an image field. The projection optical unit includes a plurality of mirrors guides imaging light from the object field to the image field. At least two of the mirrors are arranged directly behind one another in the beam path of the imaging light for grazing incidence with an angle of incidence of the imaging light which is greater than 60°. This results in an imaging optical unit that can exhibit a well-corrected imageable field with, at the same time, a high imaging light throughput.
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