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    Lithography contamination control
    1.
    发明授权
    Lithography contamination control 有权

    公开(公告)号：US12055867B2

    公开(公告)日：2024-08-06

    申请号：US18311795

    申请日：2023-05-03

    申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

    发明人： Chieh Hsieh ,  Tai-Yu Chen ,  Cho-Ying Lin ,  Heng-Hsin Liu ,  Li-Jui Chen ,  Shang-Chieh Chien

    IPC分类号： G03F7/00 ,  G02B17/06 ,  H05G2/00

    CPC分类号： G03F7/70925 ,  G02B17/0663 ,  G03F7/70033 ,  G03F7/70491 ,  G03F7/70808 ,  G03F7/70916 ,  H05G2/008

    摘要： A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

    Imaging optical unit for a projection exposure apparatus
    6.
    发明授权
    Imaging optical unit for a projection exposure apparatus 有权
    用于投影曝光装置的成像光学单元

    公开(公告)号：US09459539B2

    公开(公告)日：2016-10-04

    申请号：US13956770

    申请日：2013-08-01

    申请人： Carl Zeiss SMT GmbH

    发明人： Hans-Juergen Mann ,  Christoph Menke ,  Susanne Beder

    IPC分类号： G03F7/20 ,  G02B17/06

    CPC分类号： G03F7/70233 ,  G02B17/06 ,  G02B17/0663 ,  G03F7/7015

    摘要： An imaging optical unit for a projection exposure apparatus serves for imaging an object field in an object plane into an image field in an image plane. The image field is arranged at a field distance from the object plane. The optical unit has a plurality of mirrors. The imaging optical unit has a wavefront aberration over the image field of a maximum of 0.3 nm and an image-side numerical aperture of at least 0.5. The image field in at least one dimension has an extent of at least 10 mm. The result is an imaging optical unit in particular suited as part of an optical system for a projection exposure apparatus for projection lithography.

    摘要翻译： 用于投影曝光装置的成像光学单元用于将物平面中的物场成像成像面中的图像场。 图像场被布置在距物体平面的场距离处。 光学单元具有多个反射镜。 成像光学单元在最大为0.3nm的图像场和具有至少0.5的图像侧数值孔径上具有波前像差。 至少一个维度中的图像场具有至少10mm的范围。 结果是成像光学单元特别适用于用于投影光刻的投影曝光设备的光学系统的一部分。

    Imaging optical system
    7.
    发明授权
    Imaging optical system 有权
    成像光学系统

    公开(公告)号：US09298100B2

    公开(公告)日：2016-03-29

    申请号：US14329076

    申请日：2014-07-11

    申请人： Carl Zeiss SMT GmbH

    发明人： Hans-Juergen Mann

    IPC分类号： G03F7/20 ,  G02B17/06

    CPC分类号： G03F7/702 ,  G02B17/06 ,  G02B17/0647 ,  G02B17/0663 ,  G03F7/70191 ,  G03F7/70233

    摘要： The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such im-aging optical systems, methods of using such projection exposure installa-tions, and components made by such methods.

    摘要翻译： 本发明一般涉及成像光学系统，其包括多个反射镜，其对位于像平面中的图像场中的物体平面中的物体场进行成像，其中至少一个反射镜具有用于成像光的通孔 通过 本公开还通常涉及包括这种瞬时光学系统的投影曝光设备，使用这种投影曝光安装的方法以及由这些方法制成的部件。

    Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
    8.
    发明授权
    Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit 有权
    包括这种成像光学单元的用于投影光刻的成像光学单元和投影曝光设备

    公开(公告)号：US09291751B2

    公开(公告)日：2016-03-22

    申请号：US13919500

    申请日：2013-06-17

    申请人： Carl Zeiss SMT GmbH

    发明人： Hans-Juergen Rostalski ,  Sascha Migura ,  Thomas Schicketanz

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G02B5/08 ,  G03F7/20 ,  G02B17/06

    CPC分类号： G02B5/0891 ,  G02B17/0663 ,  G03F7/70091 ,  G03F7/70233

    摘要： An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.

    摘要翻译： 成像光学单元（7）用于将物平面（5）中的物场（4）成像为图像平面（9）中的图像场（8）。 成像光学单元（7）具有引导成像光（3）的多个成分（M1〜M6，GI）。 成像光学单元（7）被实现为瞳孔遮蔽系统。 成像光学单元（7）具有至少一个用于掠入射成像光（3）的反射镜（GI）。 其结果是具有低成像像差和紧凑结构的可处理组合的成像光学单元。