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公开(公告)号：US10481500B2
公开(公告)日：2019-11-19
申请号：US13197065
申请日：2011-08-03
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
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公开(公告)号：US09465300B2
公开(公告)日：2016-10-11
申请号：US13438428
申请日：2012-04-03
IPC分类号： G02B21/00 , G02B3/00 , G02B9/00 , G02B17/00 , G03F7/20 , G02B21/04 , G02B17/08 , G02B13/16 , G02B13/00 , G02B17/06
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ成像。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转非对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。
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3.发明授权Imaging optics and projection exposure installation for microlithography with an imaging optics 有权用于具有成像光学元件的微光刻的成像光学和投影曝光安装公开(公告)号：US09057964B2
公开(公告)日：2015-06-16
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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公开(公告)号：US09019596B2
公开(公告)日：2015-04-28
申请号：US13361707
申请日：2012-01-30
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
摘要翻译： 反射折射投射物镜具有第一物镜部分，限定光轴的第一部分并对物场进行成像以形成第一实际中间像。 它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。 第二目标部分具有凹面镜并且限定光轴的第二部分。 第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。 折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。 由第一目标部分限定的光轴的第一部分与光轴的第三部分横向偏移并与其平行。
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5.发明授权公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译： 成像光学系统具有多个反射镜。 这些图像将物体平面中的对象场映射成图像平面中的图像场。 在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。 这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长 小于10nm。
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公开(公告)号：US20120162625A1
公开(公告)日：2012-06-28
申请号：US13361707
申请日：2012-01-30
申请人： Aurelian DODOC , Wilhelm ULRICH , Alexander EPPLE
发明人： Aurelian DODOC , Wilhelm ULRICH , Alexander EPPLE
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
摘要翻译： 反射折射投射物镜具有第一物镜部分，限定光轴的第一部分并对物场进行成像以形成第一实际中间图像。 它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。 第二目标部分具有凹面镜并且限定光轴的第二部分。 第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。 折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。 由第一目标部分限定的光轴的第一部分与光轴的第三部分横向偏移并与其平行。
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公开(公告)号：US08169694B2
公开(公告)日：2012-05-01
申请号：US12474247
申请日：2009-05-28
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ成像。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转非对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。
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8.发明申请IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权成像光学和投影曝光安装用于成像光学的微观算法公开(公告)号：US20120069315A1
公开(公告)日：2012-03-22
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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9.发明申请IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算公开(公告)号：US20120069312A1
公开(公告)日：2012-03-22
申请号：US13197065
申请日：2011-08-03
CPC分类号： G03F7/70233 , G02B17/0647 , G02B17/0652 , G02B17/0663 , G03F7/7015 , G03F7/7025
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
摘要翻译： 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。
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公开(公告)号：US08134687B2
公开(公告)日：2012-03-13
申请号：US11660754
申请日：2005-08-23
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。
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