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公开(公告)号：US20180299788A1
公开(公告)日：2018-10-18
申请号：US16013131
申请日：2018-06-20
申请人： NIKON CORPORATION
发明人： Akimitsu EBIHARA
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An exposure apparatus exposes a substrate with illumination light via a liquid. A liquid immersion member of the exposure apparatus has a lower surface, a plurality of collection ports, and a plurality of supply ports. The lower surface has an opening through which illumination light passes. The collection ports are arranged at the lower surface to surround the opening, and the supply ports are arranged at the lower surface and between the opening and the collection ports to surround the opening, such that the liquid is supplied via the supply ports onto the substrate while the substrate is arranged opposite to a plane-convex lens of a projection optical system and such that the liquid is collected via the collection ports from the substrate.
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2.发明申请公开(公告)号：US20180095259A1
公开(公告)日：2018-04-05
申请号：US15783482
申请日：2017-10-13
申请人： Carl Zeiss SMT GmbH
发明人： Thomas Schicketanz , Toralf Gruner
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
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公开(公告)号：US20180052398A1
公开(公告)日：2018-02-22
申请号：US15800807
申请日：2017-11-01
申请人： NIKON CORPORATION
发明人： Yasuhiro OMURA , Takaya OKADA , Hiroyuki NAGASAKA
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis of a circle corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
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公开(公告)号：US09726979B2
公开(公告)日：2017-08-08
申请号：US14672497
申请日：2015-03-30
申请人： Carl Zeiss SMT GmbH
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
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公开(公告)号：US09618734B2
公开(公告)日：2017-04-11
申请号：US14741550
申请日：2015-06-17
CPC分类号： G02B17/0832 , G02B13/18 , G02B13/22 , G02B17/08 , G02B27/0025 , G03F7/7015 , G03F7/70225
摘要： A common optical components exposer lens set having a single non-spherical surface, comprising a common optical element set, comprising a first, second, and third lens arranged sequentially; a spherical reflecting mirror, arranged below the third spherical lens; and a planar reflecting lens, comprising a first and second planar reflecting, inclinedly arranged above the first lens, so that an equi-multiplication exposer lens set is formed by the spherical mirror set, so as to impinge a pattern on an object onto a photosensitive surface. As such, a single non-spherical surface and overlapping assembly, composed of three lenses having the single non-spherical surface and a spherical reflecting lens and two planar reflecting lenses overlapping together, in which two optical material types are arranged with respect to each other.
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公开(公告)号：US20160282729A1
公开(公告)日：2016-09-29
申请号：US15008519
申请日：2016-01-28
申请人： Carl Zeiss SMT GmbH
发明人： Norbert Wabra , Robert Eder
IPC分类号： G03F7/20
CPC分类号： G03F7/706 , G02B27/0025 , G03F7/7015 , G03F7/70191 , G03F7/70225 , G03F7/70241 , G03F7/70308 , G03F7/70591 , G03F7/70975
摘要： A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.
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公开(公告)号：US09436103B2
公开(公告)日：2016-09-06
申请号：US14281291
申请日：2014-05-19
申请人： Ultratech, Inc.
发明人： Peiqian Zhao , Emily M. True , Raymond Ellis , Andrew M. Hawryluk
CPC分类号： G03F7/70958 , G02B17/0892 , G03F7/7015 , G03F7/70225
摘要： A Wynne-Dyson projection lens for use in an ultraviolet optical lithography system is disclosed, wherein the projection lens is configured to have reduced susceptibility to damage from ultraviolet radiation. The projection lens utilizes lens elements that are made of optical glasses that are resistant to damage from ultraviolet radiation, but that also provide sufficient degrees of freedom to correct aberrations. The glass types used for the lens elements are selected from the group of optical glasses consisting of: fused silica, S-FPL51Y, S-FSL5Y, BSM51Y and BAL15Y.
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公开(公告)号：US09360763B2
公开(公告)日：2016-06-07
申请号：US14486305
申请日：2014-09-15
申请人： NIKON CORPORATION
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
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公开(公告)号：US09310696B2
公开(公告)日：2016-04-12
申请号：US14486216
申请日：2014-09-15
申请人： NIKON CORPORATION
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
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公开(公告)号：US09097984B2
公开(公告)日：2015-08-04
申请号：US14337475
申请日：2014-07-22
申请人： Carl Zeiss SMT GmbH
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
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