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    Catadioptric projection objective
    1.
    发明授权
    Catadioptric projection objective 有权

    公开(公告)号：US10042146B2

    公开(公告)日：2018-08-07

    申请号：US15654766

    申请日：2017-07-20

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    IPC: G02B17/08 ,  G03F7/20 ,  G02B1/11

    Abstract: A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.

    Catadioptric projection objective
    4.
    发明授权
    Catadioptric projection objective 有权
    反射折射投影物镜

    公开(公告)号：US08873137B2

    公开(公告)日：2014-10-28

    申请号：US13871366

    申请日：2013-04-26

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    IPC: G02B5/08 ,  G02B17/08 ,  G03F7/20

    CPC classification number: G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

    Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.1% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

    Abstract translation: 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.1％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

    CATADIOPTRIC PROJECTION OBJECTIVE
    5.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开

    公开(公告)号：US20180095258A1

    公开(公告)日：2018-04-05

    申请号：US15654766

    申请日：2017-07-20

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    IPC: G02B17/08 ,  G03F7/20 ,  G02B1/11

    CPC classification number: G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

    Abstract: A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.

    Catadioptric projection objective
    8.
    发明授权
    Catadioptric projection objective 有权

    公开(公告)号：US09726870B2

    公开(公告)日：2017-08-08

    申请号：US15002492

    申请日：2016-01-21

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    IPC: G02B17/08 ,  G03F7/20 ,  G02B1/11

    CPC classification number: G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

    Abstract: A projection objective for microlithography for imaging an object field onto an image field includes: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective including an aperture; and a first folding mirror for deflecting radiation toward a concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; in which the projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and an image plane, and at least one surface of at least one lens in the second partial objective has an antireflection coating including at least six layers.

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