公开(公告)号：US10684551B2

公开(公告)日：2020-06-16

申请号：US16392220

申请日：2019-04-23

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G02B5/08 ,  G02B7/18 ,  G02B27/00 ,  G03B27/54 ,  G02B5/00 ,  B82Y10/00 ,  G02B17/06 ,  G21K1/06 ,  G02B3/00

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US20190310555A1

公开(公告)日：2019-10-10

申请号：US16392220

申请日：2019-04-23

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G03B27/54 ,  G02B5/08 ,  G02B5/00 ,  G02B17/06 ,  B82Y10/00 ,  G02B3/00 ,  G21K1/06 ,  G02B27/00 ,  G02B7/18

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US09921483B2

公开(公告)日：2018-03-20

申请号：US14981018

申请日：2015-12-28

Applicant: Carl Zeiss SMT GmbH

Inventor： Oliver Dier ,  Tobias Hackl ,  Franz-Josef Stickel ,  Ulrich Loering ,  Tilmann Assmus ,  Juergen Mueller ,  Vladimir Kamenov ,  Siegfried Rennon

IPC: G03B27/42 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  H05G2/00 ,  G02B27/00

CPC classification number: G03F7/702 ,  G02B5/0816 ,  G02B5/0891 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/706 ,  G03F7/70975 ,  G21K1/062 ,  H05G2/005

Abstract: A mirror (1) for EUV lithography includes a substrate (2) and a reflective coating (3, 4). The reflective coating has a first group (3) of layers (3a, 3b) and a second group (4) of layers (4a, 4b), wherein the first group and second group of layers (3a, 3b; 4a, 4b) reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating (6) is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer (5) having a layer thickness variation for correcting the surface form of the mirror.

公开(公告)号：US10831114B2

公开(公告)日：2020-11-10

申请号：US16545560

申请日：2019-08-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Björn Liebaug ,  Franz-Josef Stickel ,  Jürgen Hofmann ,  Dietmar Dürr

IPC: G03F7/20

Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.

公开(公告)号：US09316929B2

公开(公告)日：2016-04-19

申请号：US13754720

申请日：2013-01-30

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  B82Y10/00 ,  G02B5/08 ,  G02B7/18 ,  G02B17/06 ,  G02B27/00 ,  G21K1/06 ,  G02B3/00 ,  G02B5/00 ,  G03B27/54

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract translation: 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。

公开(公告)号：US10146138B2

公开(公告)日：2018-12-04

申请号：US15649097

申请日：2017-07-13

Applicant: Carl Zeiss SMT GmbH

Inventor： Kerstin Hild ,  Franz-Josef Stickel ,  Robert Fichtl ,  Joachim Hartjes

IPC: G03F7/20 ,  G21K1/06 ,  G02B27/00 ,  G02B26/06

Abstract: A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.

公开(公告)号：US20180299784A1

公开(公告)日：2018-10-18

申请号：US16013687

申请日：2018-06-20

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  G02B7/18 ,  G02B27/00 ,  G02B3/00 ,  G02B17/06 ,  G03B27/54 ,  B82Y10/00

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US20190377273A1

公开(公告)日：2019-12-12

申请号：US16545560

申请日：2019-08-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Björn Liebaug ,  Franz-Josef Stickel ,  Jürgen Hofmann ,  Dietmar Dürr

IPC: G03F7/20

Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.

公开(公告)号：US10031423B2

公开(公告)日：2018-07-24

申请号：US15650533

申请日：2017-07-14

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  G02B27/00 ,  G02B7/18 ,  G03B27/54 ,  G02B3/00 ,  G02B17/06 ,  B82Y10/00

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US09746778B2

公开(公告)日：2017-08-29

申请号：US15070872

申请日：2016-03-15

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G02B7/18 ,  G02B5/08 ,  G02B27/00 ,  G21K1/06 ,  B82Y10/00 ,  G02B17/06 ,  G02B3/00 ,  G03B27/54

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.