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    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE
    2.
    发明申请
    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
    成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算

    公开(公告)号：US20120069312A1

    公开(公告)日：2012-03-22

    申请号：US13197065

    申请日：2011-08-03

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

    IPC分类号： G03F7/20 ,  G03B27/70 ,  G02B17/06

    CPC分类号： G03F7/70233 ,  G02B17/0647 ,  G02B17/0652 ,  G02B17/0663 ,  G03F7/7015 ,  G03F7/7025

    摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

    摘要翻译： 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。

    Lithographic apparatus and method of reducing thermal distortion
    3.
    发明申请
    Lithographic apparatus and method of reducing thermal distortion 失效
    平版印刷设备和减少热变形的方法

    公开(公告)号：US20070273851A1

    公开(公告)日：2007-11-29

    申请号：US11440437

    申请日：2006-05-25

    申请人： Jozef Finders ,  Erik Loopstra

    发明人： Jozef Finders ,  Erik Loopstra

    IPC分类号： G03B27/52

    CPC分类号： G03B27/522 ,  G03F7/70258 ,  G03F7/70875

    摘要： A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.

    摘要翻译： 公开了一种光刻设备，其具有被配置为向图案形成装置供应能量以加热图案形成装置以形成图案形成装置的期望热变形图案的加热器，以及被配置为在对应于所需热量的装置中实现光学校正的控制器 畸变图案，以减少图案形成装置的热变形对图案的影响。

    Stage apparatus, lithographic apparatus and device manufacturing method
    4.
    发明申请
    Stage apparatus, lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20070013894A1

    公开(公告)日：2007-01-18

    申请号：US11335715

    申请日：2006-01-20

    申请人： Erik Loopstra

    发明人： Erik Loopstra

    IPC分类号： G03B27/58

    CPC分类号： G03B27/58 ,  G03F7/70425 ,  G03F7/70716

    摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

    Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light
    5.
    发明申请
    Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light 有权
    用于改变照明场中的光的强度分布而不会使光的远心变形的方法

    公开(公告)号：US20070013891A1

    公开(公告)日：2007-01-18

    申请号：US11523695

    申请日：2006-09-20

    申请人： Stephen Roux ,  Erik Loopstra ,  Michael Nelson

    发明人： Stephen Roux ,  Erik Loopstra ,  Michael Nelson

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70558 ,  G03F7/70066

    摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

    摘要翻译： 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。

    Lithographic apparatus and device manufacturing method
    7.
    发明申请
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20060227309A1

    公开(公告)日：2006-10-12

    申请号：US11224308

    申请日：2005-09-13

    申请人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

    发明人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70775

    摘要： A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.

    Lithographic apparatus and device manufacturing method
    10.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060139589A1

    公开(公告)日：2006-06-29

    申请号：US11022939

    申请日：2004-12-28

    申请人： Tammo Uitterdijk ,  Erik Loopstra ,  Laurens Sanderse

    发明人： Tammo Uitterdijk ,  Erik Loopstra ,  Laurens Sanderse

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70341 ,  G03F7/70958

    摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

    摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。