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54 条记录 (耗时 0.026 秒)

    Inspection method and apparatus using same
    2.
    发明申请
    Inspection method and apparatus using same 有权
    检验方法及使用方法

    公开(公告)号：US20070258086A1

    公开(公告)日：2007-11-08

    申请号：US11418454

    申请日：2006-05-05

    申请人： Arno Bleeker ,  Vadim Banine ,  Johannes Onvlee ,  Jacques Van Der Donck ,  Michiel Oderwald

    发明人： Arno Bleeker ,  Vadim Banine ,  Johannes Onvlee ,  Jacques Van Der Donck ,  Michiel Oderwald

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F1/86

    摘要： The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.

    摘要翻译： 本发明涉及一种在包含图案化结构的物体上检查污染颗粒的方法和装置。 该装置包括用于将辐射束引导到物体的辐射系统。 物体被配置为散射光束。 该装置还包括被配置为接收来自物体的散射辐射的光学系统和设置在光学系统中的滤光器。 滤波器与图案化结构相关联，以便滤出散射辐射的辐射。 该装置还包括检测器，其被布置成检测由滤波器传输的辐射的一部分。 因此，可以快速且准确地检测污染颗粒。

    Radiation source
    3.
    发明申请
    Radiation source 失效
    辐射源

    公开(公告)号：US20070152175A1

    公开(公告)日：2007-07-05

    申请号：US11319770

    申请日：2005-12-29

    申请人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

    发明人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

    IPC分类号： G21G4/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005

    摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

    摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。

    Lithographic apparatus, system and device manufacturing method
    4.
    发明申请
    Lithographic apparatus, system and device manufacturing method 有权
    平版印刷设备，系统和器件制造方法

    公开(公告)号：US20070146660A1

    公开(公告)日：2007-06-28

    申请号：US11319193

    申请日：2005-12-28

    申请人： Marc Lorenz Van Der Velden ,  Vadim Banine ,  Bastiaan Mertens ,  Johannes Josephina Moors ,  Markus Weiss ,  Bastiaan Wolschrijn ,  Michiel Nijkerk

    发明人： Marc Lorenz Van Der Velden ,  Vadim Banine ,  Bastiaan Mertens ,  Johannes Josephina Moors ,  Markus Weiss ,  Bastiaan Wolschrijn ,  Michiel Nijkerk

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70933 ,  G03F7/70916 ,  G03F7/7095

    摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.

    摘要翻译： 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

    Controlling the flow through the collector during cleaning
    6.
    发明申请
    Controlling the flow through the collector during cleaning 失效
    在清洁过程中控制通过收集器的流量

    公开(公告)号：US20070131878A1

    公开(公告)日：2007-06-14

    申请号：US11296701

    申请日：2005-12-08

    申请人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Vadim Banine ,  Sonia Skelly ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

    摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

    摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

    Radiation system and lithographic apparatus
    7.
    发明申请
    Radiation system and lithographic apparatus 失效
    辐射系统和光刻设备

    公开(公告)号：US20060261290A1

    公开(公告)日：2006-11-23

    申请号：US11133460

    申请日：2005-05-20

    申请人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

    发明人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166

    摘要： A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.

    摘要翻译： 公开了一种用于在光刻设备中提供投影辐射束的辐射系统。 辐射系统包括用于提供EUV辐射的EUV源，以及包括用于捕获来自EUV源的污染物质的多个箔板的污染屏障。 箔板以光学关闭的布置布置，使得至少一个箔片板反射至少一次通过污染屏障的EUV辐射。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20060114441A1

    公开(公告)日：2006-06-01

    申请号：US11335681

    申请日：2006-01-20

    申请人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

    发明人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70008 ,  G03F7/7005

    摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

    Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
    10.
    发明申请
    Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap 有权
    平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法

    公开(公告)号：US20060012761A1

    公开(公告)日：2006-01-19

    申请号：US10890404

    申请日：2004-07-14

    申请人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

    发明人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

    摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

    摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。