发明申请
- 专利标题： Radiation system and lithographic apparatus
- 专利标题（中）： 辐射系统和光刻设备
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申请号： US11133460申请日： 2005-05-20
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公开(公告)号： US20060261290A1公开(公告)日： 2006-11-23
- 发明人: Maarten Wilhelmus Van Herpen , Vadim Banine , Arnoud Wassink , Derk Klunder
- 申请人： Maarten Wilhelmus Van Herpen , Vadim Banine , Arnoud Wassink , Derk Klunder
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： A61N5/00
- IPC分类号： A61N5/00
摘要：
A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.
公开/授权文献
- US07233010B2 Radiation system and lithographic apparatus 公开/授权日：2007-06-19
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