公开(公告)号：US20060250590A1

公开(公告)日：2006-11-09

申请号：US11120176

申请日：2005-05-03

Applicant: Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

Inventor： Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

IPC: G03B27/42

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20060176458A1

公开(公告)日：2006-08-10

申请号：US11375039

申请日：2006-03-15

Applicant: Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

Abstract translation: 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。

公开(公告)号：US20060158627A1

公开(公告)日：2006-07-20

申请号：US11330394

申请日：2006-01-12

Applicant: Nicolaas Kemper ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Frits Meulen

Inventor： Nicolaas Kemper ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Frits Meulen

IPC: G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.

Abstract translation: 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹口，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。

公开(公告)号：US20060158626A1

公开(公告)日：2006-07-20

申请号：US11298942

申请日：2005-12-12

Applicant: Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Bob Streefkerk

Inventor： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

Abstract: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.

Abstract translation: 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中，使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数，并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外，提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。

公开(公告)号：US20060121209A1

公开(公告)日：2006-06-08

申请号：US11005219

申请日：2004-12-07

Applicant: Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

Inventor： Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

IPC: B05D1/36 ,  B05D3/00 ,  B29C71/04

CPC classification number: G03F7/70341

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

Abstract translation: 光刻投影装置包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

Applicant: Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

Inventor： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC: G03B27/52

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20050264778A1

公开(公告)日：2005-12-01

申请号：US10857614

申请日：2004-06-01

Applicant: Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US20050263068A1

公开(公告)日：2005-12-01

申请号：US10966110

申请日：2004-10-18

Applicant: Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

Inventor： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

IPC: G03F7/20 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00 ,  H01L21/027

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20050048220A1

公开(公告)日：2005-03-03

申请号：US10900394

申请日：2004-07-28

Applicant: Jeroen Johannes Sophia Mertens ,  Christiaan Hoogendam ,  Hans Jansen ,  Patricius Aloysius Tinnemans ,  Leon Van Den Schoor ,  Sjoerd Donders ,  Bob Streefkerk

Inventor： Jeroen Johannes Sophia Mertens ,  Christiaan Hoogendam ,  Hans Jansen ,  Patricius Aloysius Tinnemans ,  Leon Van Den Schoor ,  Sjoerd Donders ,  Bob Streefkerk

IPC: G03F7/20 ,  H01L21/027 ,  B05D5/12 ,  B05C11/00

CPC classification number: G03F7/70341

Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。

公开(公告)号：US20070041001A1

公开(公告)日：2007-02-22

申请号：US11499855

申请日：2006-08-07

Applicant: Hans Jansen ,  Christiaan Hoogendam ,  Timotheus Sengers ,  Anthonie Kuijper

Inventor： Hans Jansen ,  Christiaan Hoogendam ,  Timotheus Sengers ,  Anthonie Kuijper

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/70616

Abstract: A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.

Abstract translation: 一种光刻投影装置，其中液体供应系统和基板上的物体的几何形状被布置以避免流过传感器的高速浸没液体。