公开(公告)号：US20070159613A1

公开(公告)日：2007-07-12

申请号：US11709834

申请日：2007-02-23

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

公开(公告)号：US20070114451A1

公开(公告)日：2007-05-24

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20060119807A1

公开(公告)日：2006-06-08

申请号：US11001082

申请日：2004-12-02

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.

摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。

公开(公告)号：US20060102849A1

公开(公告)日：2006-05-18

申请号：US10970658

申请日：2004-10-22

申请人： Jeroen Johannes Mertens ,  Aschwin Lodewijk Hendricus Van Meer ,  Joost Ottens ,  Edwin Gompel

发明人： Jeroen Johannes Mertens ,  Aschwin Lodewijk Hendricus Van Meer ,  Joost Ottens ,  Edwin Gompel

IPC分类号： G21K5/10

CPC分类号： H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

摘要： An apparatus including a support table for supporting a substrate is disclosed. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.

摘要翻译： 公开了一种包括用于支撑衬底的支撑台的设备。 支撑台包括在使用期间与衬底接触以支撑衬底的多个支撑突起。 支撑台包括多个传热突起，其在使用期间朝向基板延伸，而当基板由支撑突起支撑时，不接触基板。 用于与衬底交换热量的含气体的热交换间隙在传热突起和衬底之间延伸。

公开(公告)号：US20060017893A1

公开(公告)日：2006-01-26

申请号：US10895998

申请日：2004-07-22

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/707 ,  G03F7/70341

摘要： In an immersion-type lithographic apparatus, in which a surface of a substrate is immersed in liquid during an exposure operation, the substrate is held against a substrate table. On completion of the exposure operation, the substrate is lifted clear of the substrate table. In order to overcome a tendency caused by a film of residual liquid to cause the substrate to stick to the substrate table, pins used to lift the substrate are arranged and operated so that, at least initially, force is applied to the substrate at a location offset from its central axis.

摘要翻译： 在曝光操作中将基板的表面浸入液体的浸渍式光刻设备中，将基板保持在基板台上。 在完成曝光操作时，将衬底提升离开衬底台。 为了克服由残留液体的膜导致基板粘附到基板台上的倾向，布置和操作用于提升基板的销，使得至少最初将力施加到基板的位置 偏离其中心轴。

公开(公告)号：US20050175776A1

公开(公告)日：2005-08-11

申请号：US10986178

申请日：2004-11-12

申请人： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

发明人： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

IPC分类号： H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

申请人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20070268471A1

公开(公告)日：2007-11-22

申请号：US11710408

申请日：2007-02-26

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20070132970A1

公开(公告)日：2007-06-14

申请号：US11448990

申请日：2006-06-08

申请人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20060250601A1

公开(公告)日：2006-11-09

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。