公开(公告)号：US20070085987A1

公开(公告)日：2007-04-19

申请号：US11252230

申请日：2005-10-18

申请人： Joost Ottens ,  Aschwin Lodewijk Hendricus Van Meer ,  Wim Tel ,  Jacob Vink ,  Rene Theodorus Compen ,  Petrus Gerrits

发明人： Joost Ottens ,  Aschwin Lodewijk Hendricus Van Meer ,  Wim Tel ,  Jacob Vink ,  Rene Theodorus Compen ,  Petrus Gerrits

IPC分类号： G03B27/42

CPC分类号： G03F7/70916 ,  G03F7/7065 ,  G03F7/707 ,  G03F9/7003

摘要： The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.

摘要翻译： 本发明提供一种用于光刻设备的高度检测装置。 高度测绘装置包括高度测绘单元，用于提供待放置在光刻设备的辐射束中的待放置物体的顶表面的至少一个高度图，待施加到其上的夹持力夹持在被构造的支撑体上 支持对象。 高度测绘装置还包括控制单元，用于控制映射单元以相对于至少两个不同的夹紧压力水平提供对象的至少一个高度图。

公开(公告)号：US20060102849A1

公开(公告)日：2006-05-18

申请号：US10970658

申请日：2004-10-22

申请人： Jeroen Johannes Mertens ,  Aschwin Lodewijk Hendricus Van Meer ,  Joost Ottens ,  Edwin Gompel

发明人： Jeroen Johannes Mertens ,  Aschwin Lodewijk Hendricus Van Meer ,  Joost Ottens ,  Edwin Gompel

IPC分类号： G21K5/10

CPC分类号： H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

摘要： An apparatus including a support table for supporting a substrate is disclosed. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.

摘要翻译： 公开了一种包括用于支撑衬底的支撑台的设备。 支撑台包括在使用期间与衬底接触以支撑衬底的多个支撑突起。 支撑台包括多个传热突起，其在使用期间朝向基板延伸，而当基板由支撑突起支撑时，不接触基板。 用于与衬底交换热量的含气体的热交换间隙在传热突起和衬底之间延伸。

公开(公告)号：US20050002010A1

公开(公告)日：2005-01-06

申请号：US10840797

申请日：2004-05-07

申请人： Koen Jacobus Zaal ,  Tjarko Adriaan Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Joost Ottens

发明人： Koen Jacobus Zaal ,  Tjarko Adriaan Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Joost Ottens

IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

摘要翻译： 一种光刻投影装置，具有用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持基板的基板保持器，所述基板保持器设置有提供用于将基板压靠在基板保持器上的保持力; 释放结构，其被构造和布置成抵抗所述保持力从所述保持器中弹出所述基板; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻投影装置可以包括控制器，用于控制释放结构，以便以最终释放之前减小的释放力将基板从保持器释放。

公开(公告)号：US20080297758A1

公开(公告)日：2008-12-04

申请号：US12213930

申请日：2008-06-26

申请人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Van Meer ,  Patrick Johannes Cornelus Smulders ,  Franciscus Andreas Cornelis Spanjers ,  Johannes Petrus Martinus Ber Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

发明人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Van Meer ,  Patrick Johannes Cornelus Smulders ,  Franciscus Andreas Cornelis Spanjers ,  Johannes Petrus Martinus Ber Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

IPC分类号： G03B27/58

CPC分类号： G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

摘要： The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.

摘要翻译： 本发明涉及一种用于传送物体（W）的传送装置。 传送装置包括用于在第一位置处夹持物体（W）的至少一个然后在靠近接收器（20）的第二位置处释放物体（W）的至少一个并且释放物体（W）的夹持器（15） 在靠近接收器（20）的第二位置处夹持物体之后的第一位置。 传送装置还设置有测量装置（22），该测量装置设置成在至少一个维度上测量夹具（15）相对于接收器（20）的相对位置。 此外，基于测量的相对位置，相对于期望的相对位置来定义相对位置误差。 调整夹持器（15）和接收器（20）的相对位置以最小化第二位置中的相对位置误差。

公开(公告)号：US20050117141A1

公开(公告)日：2005-06-02

申请号：US10926402

申请日：2004-08-26

申请人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

发明人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70825

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.

摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。 物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。 该装置还包括用于从所述物品支撑件释放所述物品的释放装置。