-
公开(公告)号：US20240210834A1
公开(公告)日：2024-06-27
申请号：US18422781
申请日：2024-01-25
Applicant: FUJIFILM Corporation
Inventor： Masato SHIRAKAWA
CPC classification number: G03F7/3057 , B41F5/24 , G03F7/305 , G03F7/3085
Abstract: There are provided a washout processor and a washing method that suppress generation of a brush mark and that suppress generation of development unevenness. There is provided a washout processor that develops an imagewise exposed flexographic printing plate precursor using a washing solution with a developing brush, the washout processor including a development unit that performs development using the washing solution by simultaneously performing circular movement and linear reciprocation of the developing brush on the flexographic printing plate precursor, in which the circular movement and the linear reciprocation of the developing brush by the development unit satisfy at least one of the following condition (a) or (b). Condition (a) In a case where a stop time in a case of switching between directions of the linear reciprocation of the developing brush is t seconds and a rotation speed of the circular movement of the developing brush is R times per second, t
-
公开(公告)号：US20170212422A1
公开(公告)日：2017-07-27
申请号：US15482587
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
-
公开(公告)号：US20170115571A1
公开(公告)日：2017-04-27
申请号：US15401385
申请日：2017-01-09
Applicant: FUJIFILM Corporation
Inventor： Keita KATO , Keiyu OU , Michihiro SHIRAKAWA , Akiyoshi GOTO
IPC: G03F7/09 , G03F7/039 , G03F7/40 , G03F7/32 , G03F7/095 , G03F7/16 , G03F7/30 , G03F7/038 , G03F7/20
CPC classification number: G03F7/094 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/095 , G03F7/11 , G03F7/162 , G03F7/168 , G03F7/2006 , G03F7/2041 , G03F7/3085 , G03F7/322 , G03F7/325 , G03F7/40
Abstract: A pattern forming method includes (A) a step of forming a first resist film on a substrate by using a first resist composition, (B) a step of exposing the first resist film, (C) a step of forming a first pattern by developing the exposed first resist film, (D) a step of forming a planarization layer on the substrate provided with the first pattern by using composition for forming a planarization layer (a), (E) a step of forming a second resist film on the planarization layer by using a second resist composition, (F) a step of exposing the second resist film, and (G) a step of forming a second pattern by developing the exposed second resist film in this order, in which the first pattern is insoluble in the composition for forming the planarization layer (a), and a method for manufacturing an electronic device using the pattern forming method.
-
公开(公告)号：US4732173A
公开(公告)日：1988-03-22
申请号：US796933
申请日：1985-12-20
Applicant: James J. Czaja , John J. Herrmann
Inventor： James J. Czaja , John J. Herrmann
CPC classification number: G03F7/3085 , H05K3/0085 , Y10S134/902
Abstract: Vertical photoresist developer for processing of any size of printed circuit boards carried on a processing cassette. The processing cassette is carried by a chain through a main chamber, a rinse chamber and a drying chamber, all the processing chambers in line with each other. The processing system is electromechanical and electrically controlled, as well as air and liquid flow control. The developer is system oriented and symmetrical in operation to either side of the board.
Abstract translation: 垂直光刻胶显影剂，用于处理在处理盒上携带的任何尺寸的印刷电路板。 处理盒由链条通过主室，冲洗室和干燥室承载，所有处理室彼此一致。 处理系统是机电和电气控制，以及空气和液体流量控制。 开发人员是面向系统的，操作对称在板的任一侧。
-
公开(公告)号：US4214522A
公开(公告)日：1980-07-29
申请号：US899859
申请日：1978-04-25
Applicant: Dag Bille
Inventor： Dag Bille
CPC classification number: G03F7/30 , G03F7/3085
Abstract: An apparatus for manufacturing or treating a stencil intended for use in a silkscreen printing machine. The stencil has been lighttreated to transfer a design to a pre-treated net or film. The film being subjected to a water-treatment process to rinse the film to develop said pattern. The apparatus comprises at least two pipes having mutually facing nozzles and being arranged to co-act with a displaceable holder in a manner such one of said at least two pipes passes on the rear of the film and the other of said at least two pipes passes on the other side of said film.
Abstract translation: 用于制造或处理用于丝网印刷机中的模板的设备。 模具已经轻轻地将设计转移到预处理过的网或胶片上。 对薄膜进行水处理以冲洗薄膜以形成所述图案。 该装置包括至少两个具有相互面对的喷嘴的管道，并被布置成以可移动的保持器的方式与所述至少两个管道中的一个管道在膜的后部通过，并且所述至少两个管道中的另一个通过 在电影的另一边。
-
Patent Agency Ranking
公开(公告)号：US09477153B2
公开(公告)日：2016-10-25
申请号：US14484076
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
-
公开(公告)号：US20130070219A1
公开(公告)日：2013-03-21
申请号：US13589841
申请日：2012-08-20
Applicant: Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
-
公开(公告)号：US20110181849A1
公开(公告)日：2011-07-28
申请号：US13010002
申请日：2011-01-20
Applicant: Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
Inventor： Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
Abstract translation: 提供一种浸没式光刻设备，其具有衬底台，该衬底台包括被配置为接收泄漏到衬底台上的衬底的边缘与衬底所在的凹部的边缘之间的间隙中的浸没流体的漏极。 提供热调节系统以通过将一个或多个流体射流引导到支撑衬底的部分的相反侧来至少对支撑衬底的凹部的部分进行热调节。
-
公开(公告)号：US20060250601A1
公开(公告)日：2006-11-09
申请号：US11120186
申请日：2005-05-03
Applicant: Bob Streefkerk , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hans Jansen , Martinus Hendrikus Leenders , Paulus Martinus Liebregts , Jeroen Johannes Mertens , Jan-Gerard Van Der Toorn , Michel Riepen
Inventor： Bob Streefkerk , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hans Jansen , Martinus Hendrikus Leenders , Paulus Martinus Liebregts , Jeroen Johannes Mertens , Jan-Gerard Van Der Toorn , Michel Riepen
IPC: G03B27/58
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
-
公开(公告)号：US06270267B1
公开(公告)日：2001-08-07
申请号：US09582036
申请日：2000-06-21
Applicant: Nobuo Ogawa , Tsutomu Kojima
Inventor： Nobuo Ogawa , Tsutomu Kojima
IPC: G03D500
CPC classification number: G03F7/3092 , G03F7/30 , G03F7/3085
Abstract: A method of developing a photosensitive resin plate comprising, in order to greatly prolonging the service life of a developing solution and increase the number of plates that can be developed using a specified amount of the developing solution, supplying under circulation a developing solution (2) stored in a developer tank (1) and containing a surfactant to the surface of the tank (1), characterized in that a porous sheet (6) impregnated with a defoamer is disposed on or in the vicinity of the liquid surface of the developer tank (1) so that the developing solution (2) dropped from the surface of the photosensitive resin plate (5) passes through the porous sheet (6).
Abstract translation: 一种显影感光性树脂板的方法，其特征在于，为了大幅度延长显影液的使用寿命，通过使用规定量的显影液增加可显影的板数，在显影液（2） 储存在显影剂罐（1）中并且包含表面活性剂到所述罐（1）的表面，其特征在于，浸渍有消泡剂的多孔板（6）设置在所述显影剂罐的液体表面上或其附近 （1），使得从感光性树脂板（5）的表面落下的显影液（2）通过多孔片材（6）。
-
-
-
-
-
-
-
-
-
Search Results
44
records
(took 0.016 seconds)
