Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC装置和装置制造方法
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Application No.: US13010002Application Date: 2011-01-20
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Publication No.: US20110181849A1Publication Date: 2011-07-28
- Inventor: Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
- Applicant: Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/52
- IPC: G03B27/52 ; B23P17/04
Abstract:
An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
Public/Granted literature
- US09618858B2 Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table Public/Granted day:2017-04-11
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