公开(公告)号：US09229339B2

公开(公告)日：2016-01-05

申请号：US13301505

申请日：2011-11-21

申请人： Hans Butler ,  Henrikus Herman Marie Cox

发明人： Hans Butler ,  Henrikus Herman Marie Cox

IPC分类号： G03F7/20 ,  G03B27/53 ,  G03B27/58

CPC分类号： G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。

公开(公告)号：US09116423B2

公开(公告)日：2015-08-25

申请号：US12821806

申请日：2010-06-23

申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置与结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

公开(公告)号：US09057967B2

公开(公告)日：2015-06-16

申请号：US12512754

申请日：2009-07-30

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

公开(公告)号：US08913229B2

公开(公告)日：2014-12-16

申请号：US13477669

申请日：2012-05-22

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

摘要： A method for controlling a multi-stage system includes a stator extending parallel to a first direction; a first and second stage that are moveable relative to the stator; the stages being provided with a magnet system to generate a magnetic field, and the stator being provided with coils to interact with the magnetic fields to position the stages relative to the stator, the method including: determining the position of the stages; selecting a first and a second subset of coils that are capable of having a non-negligible interaction with the magnetic field of respectively the first and the second stage; activating the coils of both subsets, wherein activating the coils includes determining the coils that are part of both subsets; and excluding a coil that is part of both subsets from activating.

摘要翻译： 一种用于控制多级系统的方法包括：平行于第一方向延伸的定子; 相对于定子可移动的第一和第二阶段; 所述阶段设置有磁体系统以产生磁场，并且所述定子设置有线圈以与所述磁场相互作用以相对于所述定子定位所述级，所述方法包括：确定所述级的位置; 选择能够分别与第一和第二阶段的磁场具有不可忽略的相互作用的线圈的第一和第二子集; 激活两个子集的线圈，其中激活线圈包括确定作为两个子集的一部分的线圈; 并排除作为两个子集的一部分激活的线圈。

公开(公告)号：US08781775B2

公开(公告)日：2014-07-15

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G01C17/38

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US08743344B2

公开(公告)日：2014-06-03

申请号：US12470773

申请日：2009-05-22

申请人： Hans Butler ,  Martinus Van Duijnhoven ,  Johan Hendrik Geerke ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Martinus Van Duijnhoven ,  Johan Hendrik Geerke ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G03B27/32

CPC分类号： G03F7/709 ,  G03F7/70691 ,  G03F7/70833 ,  G03F7/70991

摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.

摘要翻译： 第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束。 电缆束的一端固定在第一物体上，另一端固定在第二物体上。 电缆束保持器被配置为沿着电缆束的长度将电缆束保持在特定位置，并且呈现配置为控制电缆束保持器相对于第二对象的位置的控制系统。 提出了一种用于电缆连接的控制系统，以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

公开(公告)号：US08717532B2

公开(公告)日：2014-05-06

申请号：US12969234

申请日：2010-12-15

申请人： Hans Butler ,  Pieter Johannes Gertrudis Meijers ,  Hendrikus Johannes Schellens

发明人： Hans Butler ,  Pieter Johannes Gertrudis Meijers ,  Hendrikus Johannes Schellens

IPC分类号： G03B27/68

CPC分类号： G03F7/70833 ,  F16F15/005 ,  G03F7/70825 ,  H01L41/0825

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system is mounted on a reference structure of the lithographic apparatus by a mount of the lithographic apparatus. The mount includes a first piezoelectric element to exert a force on the projection system, a second piezoelectric element to measure the force, and an interconnection member interposed between the first and second piezoelectric elements, the interconnection member comprising a cut.

摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 投影系统通过光刻设备的安装件安装在光刻设备的参考结构上。 支架包括在投影系统上施加力的第一压电元件，用于测量力的第二压电元件，以及插在第一和第二压电元件之间的互连构件，所述互连构件包括切口。

公开(公告)号：US08705004B2

公开(公告)日：2014-04-22

申请号：US12897355

申请日：2010-10-04

申请人： Hans Butler ,  Remco Jochem Sebastiaan Groenendijk

发明人： Hans Butler ,  Remco Jochem Sebastiaan Groenendijk

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F9/7026 ,  G03F7/70525

摘要： A method is disclosed. A change in position of a substrate in a direction substantially parallel to a direction of propagation of a radiation beam that is, or is to be, projected on to that substrate is determined, which change in position would result in a lithographic error in the application of a pattern to that substrate using that radiation beam. The change in position of the substrate is used to control a property of the radiation beam when, or as, the radiation beam is projected onto the substrate in order to reduce the lithographic error.

摘要翻译： 公开了一种方法。 确定基板在基本上平行于正在投射到该基板上的辐射束的传播方向的方向上的位置的变化，哪个位置的变化将导致应用中的光刻误差 使用该辐射束的该衬底的图案。 当辐射束投射到基板上时，或者作为辐射束投射到基板上以便减小光刻误差，衬底的位置变化用于控制辐射束的性质。

公开(公告)号：US08554510B2

公开(公告)日：2013-10-08

申请号：US12969289

申请日：2010-12-15

申请人： Frank Staals ,  Hans Van Der Laan ,  Hans Butler ,  Gerardus Carolus Johannus Hofmans ,  Sven Gunnar Krister Magnusson

发明人： Frank Staals ,  Hans Van Der Laan ,  Hans Butler ,  Gerardus Carolus Johannus Hofmans ,  Sven Gunnar Krister Magnusson

IPC分类号： G06F15/00

CPC分类号： G03F7/709 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70666 ,  G03F7/70725 ,  G03F9/7088

摘要： Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.

摘要翻译： 光刻设备的运动包括在一个或多个轴上的动态定位误差，其产生可以在所施加的图案中测量的相应误差。 测试方法包括多次操作该设备，同时在不同的特定频率和轴处故意施加相对大的动态定位误差。 对于给定的轴或轴，针对感兴趣的频带的注入误差的不同频率和幅度测量所应用模式中的误差的变化。 使用所述测量和所注入的频率的知识的计算允许分析与每个注入的错误频率相关的频带中的动态定位误差变化。

公开(公告)号：US08248583B2

公开(公告)日：2012-08-21

申请号：US12367193

申请日：2009-02-06

申请人： Marinus Aart Van Den Brink ,  Hans Butler ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Georgo Angelis ,  Renatus Gerardus Klaver ,  Martijn Robert Hamers ,  Boudewijn Theodorus Verhaar ,  Peter Hoekstra

发明人： Marinus Aart Van Den Brink ,  Hans Butler ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Georgo Angelis ,  Renatus Gerardus Klaver ,  Martijn Robert Hamers ,  Boudewijn Theodorus Verhaar ,  Peter Hoekstra

IPC分类号： G03B27/52

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.

摘要翻译： 在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。 舞台的位置由舞台控制器控制。 记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。 舞台系统根据代表差异的注册信号进行校准。