公开(公告)号：US20240231076A9

公开(公告)日：2024-07-11

申请号：US18547785

申请日：2022-02-22

Applicant: MICRO-EPSILON-MESSTECHNIK GmbH & Co. K.G.

Inventor： Harald HAAS ,  Reinhold HOENICKA ,  Tobias SCHOPF ,  Guenter SCHALLMOSER

IPC: G02B26/08 ,  G01B7/00 ,  G02B7/18

CPC classification number: G02B26/0816 ,  G01B7/003 ,  G02B7/181

Abstract: An actuator-sensor system for controlled diverting or deflecting of electromagnetic radiation in at least one axis (9), with an actuator (5) for mechanically moving a deflecting element (10) and with a measuring element (2) for sensing the position of the deflecting element (10), where the measuring element (2) includes a flat substrate (3) having at least one sensor element (4). Furthermore, the present disclosure relates to a fast steering mirror (FSM).

公开(公告)号：US11874432B2

公开(公告)日：2024-01-16

申请号：US17908431

申请日：2021-03-01

Applicant: AIRBUS DEFENCE AND SPACE SAS

Inventor： Didier Charvet ,  Sébastien Le Foll

IPC: G02B7/02 ,  G02B23/00 ,  G02B7/18 ,  G02B23/02 ,  G02B23/16 ,  G05D23/19

CPC classification number: G02B7/181 ,  G02B23/02 ,  G02B23/16 ,  G05D23/1932

Abstract: A space optical instrument is disclosed including a primary mirror having an optical axis and including a first face, referred to as the front face, oriented towards an observed area, and a second face opposite to the first, referred to as the rear face, the optical instrument further including a thermal stabilization device for the primary mirror, comprising a thermally conductive wall extending around the optical axis (O) on the front face side of the primary mirror towards which this face is oriented. The thermal stabilization device further includes a temperature regulating device for the circumferential wall that is capable of using the measurement of an incident heat flux on the mirror, and adapting the temperature of the circumferential wall according to the measured incident heat flux, in order to keep the front face of the mirror at a constant temperature.

公开(公告)号：US10061119B2

公开(公告)日：2018-08-28

申请号：US15718510

申请日：2017-09-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Masahiro Ogura ,  Yuichiro Imai

IPC: G03G15/00 ,  G02B26/10 ,  G03G15/04

CPC classification number: G02B26/105 ,  G02B7/181 ,  G02B26/12 ,  G03G15/04036

Abstract: A light scanning apparatus, including: a light source; a deflection unit configured to deflect a light beam emitted from the light source; a reflecting mirror configured to reflect the light beam to a photosensitive member; a housing; a first support portion provided in the housing to support one end of the reflecting mirror; a second support portion provided in the housing to support the other end of the reflecting mirror; a first leaf spring configured to press the reflecting mirror at the one end to apply an urging force for urging the reflecting mirror against the first support portion; and a second leaf spring configured to press the reflecting mirror at the other end to apply an urging force for urging the reflecting mirror against the second support portion, wherein a pressing force of the first leaf spring is larger than a pressing force of the second leaf spring.

公开(公告)号：US20180239102A1

公开(公告)日：2018-08-23

申请号：US15880117

申请日：2018-01-25

Applicant: Corning Incorporated

Inventor： Robert Dennis Grejda ,  Keith Ernest Hanford ,  Brian Monroe McMaster ,  Todd Robert McMichael ,  Matthew Roland Millecchia ,  James Edward Platten

IPC: G02B7/00 ,  G02B7/18 ,  G02B7/182 ,  B29C33/00 ,  G02B7/02 ,  G03F7/20

CPC classification number: G02B7/003 ,  B29C33/005 ,  C23C14/50 ,  C23C16/4585 ,  G02B7/008 ,  G02B7/026 ,  G02B7/028 ,  G02B7/181 ,  G02B7/1822 ,  G03F7/70833

Abstract: An optical mount includes a support substrate defining an aperture configured to receive an optical element. A support assembly is positioned proximate a perimeter of the aperture. The support assembly includes a resilient member configured reflects in response to relative motion between the optical element and the support substrate. A support plate is positioned on the resilient member and is in contact with the optical element.

公开(公告)号：US09946061B2

公开(公告)日：2018-04-17

申请号：US14680136

申请日：2015-04-07

Applicant: MBDA Deutschland GmbH

Inventor： Thomas Klaffert ,  Michael Schneider

IPC: G02B23/00 ,  G02B23/16 ,  G02B7/18 ,  G02B7/183 ,  G02B7/182 ,  G02B23/06 ,  G02B17/06

CPC classification number: G02B23/16 ,  G02B7/181 ,  G02B7/182 ,  G02B7/183 ,  G02B17/0621 ,  G02B23/06

Abstract: A support structure for an optical reflecting telescope including a beam inlet a primary support for a primary mirror, a secondary support for a secondary mirror, struts which extend between the primary support and the secondary support, and a beam outlet. The support structure has a contour of a single shell hyperboloid. The primary support, the secondary support and the struts are configured so that they support the primary mirror and the secondary mirror so that a z-shaped beam path is provided between the beam inlet, the primary mirror, the secondary mirror and the beam outlet. The struts have identical length.

公开(公告)号：US09869937B2

公开(公告)日：2018-01-16

申请号：US14590328

申请日：2015-01-06

Applicant: Carl Zeiss SMT GmbH

Inventor： Dirk Schaffer

IPC: G03F7/20 ,  B29D11/00 ,  G02B7/18 ,  G02B7/182 ,  G02B5/08 ,  B23K26/36

CPC classification number: G03F7/702 ,  B23K26/36 ,  B29D11/00596 ,  G02B5/0891 ,  G02B7/181 ,  G02B7/182 ,  G02B7/1822 ,  Y10T29/49815 ,  Y10T29/49817

Abstract: A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear wall and a side wall of the mirror body, the side wall being arranged between the front wall and the rear wall, wherein at least one supporting element is provided in the cavity between the front wall and the rear wall; and after producing the mirror body, at least partly removing the supporting element.

公开(公告)号：US09841682B2

公开(公告)日：2017-12-12

申请号：US15430086

申请日：2017-02-10

Applicant: Carl Zeiss SMT GmbH

Inventor： Sascha Bleidistel ,  Ulrich Schoenhoff ,  Juergen Fischer

IPC: G02B5/08 ,  G03B27/32 ,  G03B27/54 ,  G03F7/20 ,  G02B27/00 ,  G02B26/08 ,  G02B7/18

CPC classification number: G03F7/70191 ,  G02B5/0891 ,  G02B7/005 ,  G02B7/181 ,  G02B7/185 ,  G02B26/0825 ,  G02B27/0068 ,  G03F7/7015 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70266 ,  G03F7/70308 ,  G03F7/70825 ,  G03F7/709

Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

公开(公告)号：US20170307843A1

公开(公告)日：2017-10-26

申请号：US15492703

申请日：2017-04-20

Applicant: PLX, Inc.

Inventor： Zvi BLEIER ,  Itai VISHNIA ,  Zechariah GAJADHAR

IPC: G02B7/182 ,  G02B7/18 ,  G02B5/122

CPC classification number: G02B7/182 ,  G02B5/122 ,  G02B7/181

Abstract: An improved mount for, and method of mounting an, optical structure is provided. The mount has an optical structure comprising at least one mirror panel, the mirror panel comprising a reflective surface and a back surface substantially opposite the reflective surface, a protruding member extending from the back surface of the optical structure, the protruding member having a shape and the shape having an outside surface there-around, a base comprising a mounting element and an upper element extending from the mounting element, the upper element having a cavity for secured receipt therein of at least a portion of the protruding member, wherein the receiving cavity of the upper element has a shape identical to that of the shape of the protruding member, but where the shape of the protruding member is ten thousandths ( 1/10,000) of an inch smaller than the shape of the receiving cavity so that the outside surface of the protruding member is ten thousandths ( 1/10,000) of an inch away from the corresponding parts of the receiving cavity when the protruding member is secured within the cavity.

公开(公告)号：US09798254B2

公开(公告)日：2017-10-24

申请号：US14848593

申请日：2015-09-09

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Hauf

IPC: G03B27/42 ,  G03B27/52 ,  G03F7/20 ,  G02B7/18 ,  G02B26/08

CPC classification number: G03F7/70891 ,  G02B7/181 ,  G02B26/0825 ,  G03F7/70266 ,  G03F7/70883

Abstract: The disclosure provides an arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus, as well as related methods and systems.

公开(公告)号：US20170285329A1

公开(公告)日：2017-10-05

申请号：US15467036

申请日：2017-03-23

Applicant: SEIKO EPSON CORPORATION

Inventor： Suguru UCHIYAMA ,  Kosuke TAKAHASHI

IPC: G02B26/08 ,  H01L23/00 ,  H01L23/04 ,  H01L23/498 ,  H01L23/31 ,  H01L23/467

CPC classification number: G02B26/0833 ,  B81B7/0067 ,  G02B7/181 ,  H01L23/04 ,  H01L23/3121 ,  H01L23/3135 ,  H01L23/467 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49838 ,  H01L24/48 ,  H01L24/49 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/73265

Abstract: An electro-optic device includes a chip provided with a mirror and a drive element adapted to drive the mirror, a light-transmitting cover adapted to cover the mirror in a planar view, and a spacer having contact with one surface of the chip between the cover and the chip. The entire part of one surface of the chip having contact with the spacer is made of a first material such as silicon oxide film having first thermal conductivity, and the spacer is made of a second material such as a quartz crystal having second thermal conductivity higher than the first thermal conductivity. The cover is made of a third material such as sapphire having third thermal conductivity higher than the second thermal conductivity.