Tunable upper plasma-exclusion-zone ring for a bevel etcher

    公开(公告)号:US11756771B2

    公开(公告)日:2023-09-12

    申请号:US17162097

    申请日:2021-01-29

    IPC分类号: H01J37/32 H01L21/02 H01L21/67

    摘要: A tunable upper plasma exclusion zone (PEZ) ring adjusts a distance of plasma during processing in a processing chamber and includes: a lower surface that includes: a horizontal portion; and an upwardly tapered outer portion that is conical and that extends outwardly and upwardly from the horizontal portion at an upward taper angle of about 5° to 50° with respect to the horizontal portion, where an outer diameter of the upwardly tapered outer portion is greater than 300 millimeters (mm), and where an inner diameter where the upwardly tapered outer portion begins to extend upwardly is less than 300 mm. A controller is to, during processing of a 300 mm circular substrate, adjust the distance of plasma for treatment of the 300 mm circular substrate at least one of radially inward and radially outward using the tunable upper PEZ ring.

    Volatile material dispenser
    9.
    发明授权

    公开(公告)号:US10010642B2

    公开(公告)日:2018-07-03

    申请号:US15007988

    申请日:2016-01-27

    IPC分类号: A61L9/12

    摘要: A dispenser includes a base holding a cartridge that includes a volatile material reservoir. The base includes a plurality of ribs that support a peripheral flange of the cartridge. The plurality of ribs support a portion of the peripheral flange having a permeable membrane disposed thereon. A first removable cover is attached to the base and has at least one aperture and a first regulating plate. The first cover may be removed and replaced by at least a second cover that has at least one aperture and a second, different regulating plate.