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公开(公告)号：US20240287673A1
公开(公告)日：2024-08-29
申请号：US18649133
申请日：2024-04-29
Applicant: AGILENT TECHNOLOGIES, INC.
Inventor： Elizabeth Carr , Karen L. Seaward , Kevin P. Killeen
CPC classification number: C23C16/24 , B01D15/22 , C23C16/045 , C23C16/325 , C23C16/401 , C23C16/403 , C23C16/405 , C23C16/44 , C23C16/45555 , Y10T428/13
Abstract: The invention provides metal liquid chromatography components with uniformly coated internal surfaces and methods for achieving the same. The invention addresses the problem of corrosion or interference of metal components in the flow path for LC analyses in which the sample interacts with metal ions or surfaces. The invention also alleviates the difficulties in coating very long metal tubes and very small metal channels with an inert, continuous coating that adheres well to metal surfaces. The metal flow path is rendered inert by the coating, and thus compatible with bioanalytical separations, for example, by using a vapor phase deposition process to coat the inner surfaces with a coating that continuously covers all metal surfaces in the flow path.
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公开(公告)号：US20230365765A1
公开(公告)日：2023-11-16
申请号：US18222677
申请日：2023-07-17
Applicant: NAWA AMERICA, INC.
Inventor： Ryan Williams , David Degtiarov , Christopher Gouldstone , Paul Jarosz , Thomas J. Kennedy, III
IPC: C08J5/04 , B32B5/26 , C08J5/00 , B32B5/12 , C04B37/00 , C23C16/44 , B32B7/06 , C08J5/24 , C04B35/83 , B29C70/62 , B29C70/08 , C04B35/80 , B29K105/12 , B29K105/08 , B82Y30/00 , B82Y40/00
CPC classification number: C08J5/04 , B32B5/26 , C08J5/005 , B32B5/12 , C04B37/00 , C23C16/44 , B32B7/06 , C08J5/24 , C04B35/83 , B29C70/62 , B29C70/081 , C04B35/80 , B29K2105/124 , B32B2457/00 , B29K2105/0872 , B32B2307/748 , B32B2260/023 , B32B2307/762 , B82Y30/00 , C04B2235/5252 , C04B2235/5288 , B32B2260/046 , Y10S977/742 , C08J2300/00 , B82Y40/00 , B32B2262/103 , C04B2235/5256 , B32B2262/101 , C04B2235/48 , Y10S977/842 , B32B2262/106
Abstract: An article includes a hybrid nanocomposite product, which includes a nanostructure array and a resin matrix contained among and/or around the nanostructure array. The array/matrix is placed in between layers of dry or resin-infused fiber composite to permit formation of a composite structure. The nanostructure array and/or the resin matrix may be disposed in an abutting relationship with other layers of a composite. The array/matrix can provide reinforcement of the composite in the z-direction. Transfer of resin into dry fiber forms may be provided when the array/matrix acts as a resin transfer medium. Nanostructure arrays with a resin matrix can be prepared to form a resin film product. Methods are presented for infusing composites via resin-transfer molding (RTM), vacuum-assisted resin transfer molding (VARTM), resin film infusion (RFI), or injection molding wherein a resin matrix film substantially maintains alignment and position of the nanostructure array during the infusion process.
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公开(公告)号：US20230220542A1
公开(公告)日：2023-07-13
申请号：US18125052
申请日：2023-03-22
Applicant: AGILENT TECHNOLOGIES, INC.
Inventor： Elizabeth CARR , Karen L. SEAWARD , Kevin P. KILLEEN
CPC classification number: C23C16/24 , B01D15/22 , C23C16/44 , C23C16/045 , C23C16/325 , C23C16/401 , C23C16/403 , C23C16/405 , C23C16/45555 , Y10T428/13
Abstract: The invention provides metal liquid chromatography components with uniformly coated internal surfaces and methods for achieving the same. The invention addresses the problem of corrosion or interference of metal components in the flow path for LC analyses in which the sample interacts with metal ions or surfaces. The invention also alleviates the difficulties in coating very long metal tubes and very small metal channels with an inert, continuous coating that adheres well to metal surfaces. The metal flow path is rendered inert by the coating, and thus compatible with bioanalytical separations, for example, by using a vapor phase deposition process to coat the inner surfaces with a coating that continuously covers all metal surfaces in the flow path.
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公开(公告)号：US11658060B2
公开(公告)日：2023-05-23
申请号：US17604533
申请日：2020-03-25
Applicant: TOKAI CARBON KOREA CO., LTD
Inventor： Sang Chul Lee
IPC: C23C16/32 , H01L21/687 , B01J20/32 , B82B3/00 , H01J37/32 , C23C16/44 , H01L21/02 , C30B23/06 , C30B29/36 , H01L21/324
CPC classification number: H01L21/68757 , B01J20/3202 , B82B3/0033 , C23C16/325 , C23C16/44 , C30B23/06 , C30B29/36 , H01J37/32724 , H01L21/02167 , H01L21/02529 , H01L21/324
Abstract: Described herein are an SiC material and a method for manufacturing same. The SiC material includes an SiC layer having a low thermal conductivity region formed in at least a portion thereof, wherein the low thermal conductivity region has an average crystal grain size of 3.5 μm or less and (111) plane preferential growth according to X-ray diffraction analysis.
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5.发明申请
公开(公告)号：US20190235395A1
公开(公告)日：2019-08-01
申请号：US16376673
申请日：2019-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
IPC: G03F7/20 , C23C16/44 , H01L21/687
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US20190211448A1
公开(公告)日：2019-07-11
申请号：US16328269
申请日：2017-04-24
Applicant: THE JAPAN STEEL WORKS, LTD.
Inventor： Keisuke WASHIO , Tatsuya MATSUMOTO
IPC: C23C16/455 , H01L21/02
CPC classification number: C23C16/45544 , C23C16/44 , C23C16/45527 , H01L21/02178 , H01L21/0228 , H01L21/31 , H01L51/50 , H05B33/04 , H05B33/10
Abstract: An atomic layer deposition apparatus includes: a film-forming container 11 in which a film-forming process is performed; a vertically movable stage 14 provided in the film-forming container 11 and being configured to hold a substrate 100; a stage stopper 17 configured to stop rising of the stage 14 and, when in contact with the stage 14, partitioning a film-forming space S in which the film-forming process is performed and a transporting space in which transport of the substrate 100 is performed; a peripheral stage deposition prevention member 15 covering a peripheral portion of the stage 14; and a stage stopper deposition prevention member 24 provided on the stage stopper 17.
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公开(公告)号：US20180320987A1
公开(公告)日：2018-11-08
申请号：US16030160
申请日：2018-07-09
Inventor： Alexandre K. Da Silva , Evan Fleming , Li Shi , Christopher W. Bielawski , Rodney S. Ruoff , Shaoyi Wen , Hengxing Ji , Michael Pettes , Abhijit Paul , Eunsu Paek , Alexander J. Pak , Daniel P. Sellan
CPC classification number: F28D20/021 , B60L11/1829 , B60L2270/44 , C01B32/16 , C01B2202/24 , C01B2202/34 , C01B2202/36 , C09K5/063 , C23C16/44 , F28D7/082 , F28D20/023 , F28F13/003 , H01M4/625 , Y02E60/145 , Y02T10/7005 , Y02T10/7072 , Y02T90/12 , Y02T90/121 , Y02T90/122 , Y02T90/125 , Y02T90/14
Abstract: Sugar alcohol blends of galactitol and mannitol and compositions comprising such blends are disclosed as phase change materials (PCMs). A method of forming carbon nanotubes on a carbon substrate is described. Carbon substrates with carbon nanotubes, in particular, conformal layers of carbon nanotubes on carbon substrates, are also disclosed, as are methods of making and using these materials. Thermal storage units are also provided. The thermal storage units can comprise a heat exchange path through which a heat exchange medium flows, and a thermal storage medium in thermal contact with the heat exchange path.
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公开(公告)号：US20180315960A1
公开(公告)日：2018-11-01
申请号：US15686259
申请日：2017-08-25
Applicant: Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
Inventor： HAO-MING WEI , YANG WEI , KAI-LI JIANG , SHOU-SHAN FAN
CPC classification number: H01L51/56 , B05D1/60 , C23C14/24 , C23C16/44 , H01L51/0007 , H01L51/001 , H01L51/0011 , H01L51/5056 , H01L51/5072 , H01L51/5088 , H01L51/5092
Abstract: A method for forming an organic light emitting diode array is provided. A substrate is provided. A plurality of first electrodes is formed on a substrate surface. A patterned mask layer is disposed on the substrate surface to cover the substrate and expose at least a portion of each first electrode. An evaporating source is provided. The evaporating source comprises a carbon nanotube film structure and an organic semiconductor material. The evaporating source is spaced from the plurality of first electrodes. The carbon nanotube film structure is heated to gasify the organic light emitting material and form a plurality of organic light emitting layers on a exposed surface of the plurality of first electrodes. A plurality of second electrodes are formed on a surface of the plurality of organic light emitting layers. The patterned mask layer is removed to form an organic light emitting diode array.
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公开(公告)号：US20180291502A1
公开(公告)日：2018-10-11
申请号：US16008825
申请日：2018-06-14
Applicant: Hitachi Kokusai Electric Inc.
Inventor： Naoko KITAGAWA , Yuichi WADA
IPC: C23C16/448 , H01L21/31 , C23C16/52 , C23C16/44
CPC classification number: C23C16/448 , C23C14/12 , C23C14/543 , C23C16/44 , C23C16/4412 , C23C16/45561 , C23C16/52 , H01L21/31
Abstract: A storage device includes: a sidewall formed in a cylindrical shape; a cover wall disposed at an upper end of the sidewall; a bottom wall connected to a lower end of the sidewall and comprising a mounting surface mountable on a weight detector; a storage chamber surrounded by the sidewall, the cover wall, and the bottom wall; a recess communicating with the storage chamber and provided at the bottom wall; a communication pipe having one end connected to a bottom portion of the recess in a direction of gravity and the other end extending in a direction different from the direction of gravity in the bottom wall, the communication pipe having a diameter smaller than that of the recess; a gas flow path provided at a wall other than the bottom wall; and a liquid discharge path connected to a downstream side of the communication pipe.
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10.发明申请
公开(公告)号：US20180284625A1
公开(公告)日：2018-10-04
申请号：US15994492
申请日：2018-05-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
IPC: G03F7/20 , H01L21/687 , C23C16/44
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
