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公开(公告)号：US20180267412A1
公开(公告)日：2018-09-20
申请号：US15918478
申请日：2018-03-12
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Wilhelmus Franciscus Johannes SIMONS , Martijn HOUBEN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Rogier Hendrikus Magdalena CORTIE , Ruud Hendrikus Martinus Johannes BLOKS , Gerben PIETERSE , Siegfried Alexander TROMP , Theodorus Wilhelmus POLET , Jim Vincent OVERKAMP , Van Vuong VY
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US20180081285A1
公开(公告)日：2018-03-22
申请号：US15824686
申请日：2017-11-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Nicolaas Rudolf KEMPER , Ferdy MIGCHELBRINK , Elmar EVERS
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US20170315454A1
公开(公告)日：2017-11-02
申请号：US15629399
申请日：2017-06-21
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Wilhelmus Franciscus Johannes SIMONS , Martijn HOUBEN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Rogier Hendrikus Magdalena CORTIE , Ruud Hendrikus Martinus Johannes BLOKS , Gerben PIETERSE , Siegfried Alexander TROMP , Theodorus Wilhelmus POLET , Jim Vincent OVERKAMP , Van Vuong VY
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US20230400785A1
公开(公告)日：2023-12-14
申请号：US18251261
申请日：2021-10-14
Applicant: ASML Netherlands B.V.
Inventor： Antonius Johannus VAN DER NET , Martinus Cornelis Maria VERHAGEN , Johannes Henricus Wilhelmus JACOBS , Laurentius Johannes Adrianus VAN BOKHOVEN , Jeroen Peterus Johannes VAN LIPZIG
IPC: G03F7/00
CPC classification number: G03F7/70891
Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements. Also provided are a lithographic apparatus comprising such a conditioning system, the use of such a conditioning system, a method of conditioning a system, as well as a lithographic method comprising a sub-atmospheric pressure cooling system
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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC: G03F7/20
Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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Patent Agency Ranking
公开(公告)号：US20220206400A1
公开(公告)日：2022-06-30
申请号：US17698100
申请日：2022-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas TEN KATE , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Robbert Jan VOOGD , Giovanni Francisco NINO , Marinus Jan REMIE , Johannes Henricus Wilhelmus JACOBS , Thibault Simon Mathieu LAURENT , Johan Gertrudis Cornelis KUNNEN
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20190179232A1
公开(公告)日：2019-06-13
申请号：US16276861
申请日：2019-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Nicolaas Rudolf KEMPER , Ferdy MIGCHELBRINK , Elmar EVERS
IPC: G03F7/20
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US20170212421A1
公开(公告)日：2017-07-27
申请号：US15482526
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh PATEL , Johannes Henricus Wilhelmus JACOBS , Gerardus Adrianus Antonius Maria KUSTERS , Thibault Simon Mathieu LAURENT , Marcio Alexandre Cano MIRANDA , Ruud Hendricus Martinus Johannes BLOKS , Peng FENG , Johan Gertrudis Cornelis KUNNEN
IPC: G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US20150205214A1
公开(公告)日：2015-07-23
申请号：US14676025
申请日：2015-04-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
IPC: G03F7/20
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
Abstract translation: 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。
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10.发明公开公开(公告)号：US20240176255A1
公开(公告)日：2024-05-30
申请号：US18284608
申请日：2022-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Remco VAN DE MEERENDONK , Daniel Jozef, Maria DIRECKS , Günes NAKÍBOGLU , Nicholas Peter WATERSON , Joost André KLUGKIST , Sven PEKELDER , Antonius Johannus VAN DER NET , Johannes Henricus Wilhelmus JACOBS , Jaap OUDES , Gerardus Arnoldus Hendricus, Franciscus JANSSEN , Jeroen, Peterus Johannes VAN LIPZIG , Johannes, Franciscus Martinus VAN SANTVOORT
IPC: G03F7/00
CPC classification number: G03F7/70891
Abstract: A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.
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