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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
发明人： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC分类号： G03F7/20
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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公开(公告)号：US20190171119A1
公开(公告)日：2019-06-06
申请号：US16321059
申请日：2017-07-17
摘要： Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
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公开(公告)号：US20210041795A1
公开(公告)日：2021-02-11
申请号：US16967794
申请日：2019-02-04
发明人： Richard Joseph BRULS , Ronald Peter ALBRIGHT , Peter Conrad KOCHERSPERGER , Victor Antonio PEREZ-FALCON
摘要： Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.
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公开(公告)号：US20200225591A1
公开(公告)日：2020-07-16
申请号：US16633419
申请日：2018-07-18
发明人： Han-Kwang NIENHUYS , Ronald Peter ALBRIGHT , Jacob BRINKERT , Yang-Shan HUANG , Hendrikus Gijsbertus SCHIMMEL , Antonie Hendrik VERWEIJ
摘要： Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
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公开(公告)号：US20220075277A1
公开(公告)日：2022-03-10
申请号：US17418478
申请日：2019-12-12
申请人： ASML Holding N.V.
发明人： Jeffrey John LOMBARDO , Ronald Peter ALBRIGHT , Daniel Leslie HALL , Victor Antonio PEREZ-FALCON , Andrew JUDGE
IPC分类号： G03F7/20
摘要： Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.
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