公开(公告)号：US20180299796A1

公开(公告)日：2018-10-18

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Maarten HOLTRUST ,  Martinus VAN DUIJNHOVEN ,  Francis FAHRNI ,  Frank Johannes Jacobus VAN BOXTEL ,  Anne Willemijn Bertine QUIST ,  Bart Dinand PAARHUIS ,  Daan Daniel Johannes VAN SOMMEREN

IPC: G03F7/20

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US20240192607A1

公开(公告)日：2024-06-13

申请号：US17641206

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Koen STEFFENS ,  Ronald VAN DER HAM ,  Gerben PIETERSE ,  Erik Henricus Egidius Catharina EUMMELEN ,  Francis FAHRNI

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70733 ,  G03F7/70991

Abstract: A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

公开(公告)号：US20170108781A1

公开(公告)日：2017-04-20

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria ALBERTI ,  Hubert Marie SEGERS ,  Ronald VAN DER HAM ,  Francis FAHRNI ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria ROPS ,  Pepijn VAN DEN EIJNDEN ,  Paul VAN DONGEN ,  Bas WILLEMS

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/52 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67225

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.