公开(公告)号：US20170192359A1

公开(公告)日：2017-07-06

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Niek Elout DE KRUIJF ,  Mircea DUSA ,  Martijn HOUBEN ,  Johannes Gerardus Maria MULDER ,  Thomas POIESZ ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Paul VAN DONGEN ,  Justin Johannes Hermanus GERRITZEN ,  Antonie Hendrik VER WEIJ ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20240345490A1

公开(公告)日：2024-10-17

申请号：US18294202

申请日：2022-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul VAN DONGEN

IPC: G03F7/00 ,  B25J15/06 ,  H01L21/683

CPC classification number: G03F7/707 ,  B25J15/0658 ,  G03F7/70341 ,  G03F7/70875 ,  G03F7/70925 ,  H01L21/6838

Abstract: A gripper for an object handler includes an engaging surface for engaging a surface of an object, and a first channel connected to a first outlet, the first outlet being configured to operate, during use, as a vacuum clamp arranged to secure the engaging surface to the surface of the object. The gripper further includes a second channel arranged to be connected to a pressure source, and at least one second outlet arranged adjacent to the engaging surface and connected to the second channel.

公开(公告)号：US20170108781A1

公开(公告)日：2017-04-20

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria ALBERTI ,  Hubert Marie SEGERS ,  Ronald VAN DER HAM ,  Francis FAHRNI ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria ROPS ,  Pepijn VAN DEN EIJNDEN ,  Paul VAN DONGEN ,  Bas WILLEMS

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/52 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67225

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US20240019790A1

公开(公告)日：2024-01-18

申请号：US18252491

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul VAN DONGEN ,  Aart Adrianus VAN BEUZEKOM

IPC: G03F7/00 ,  H01L21/687 ,  H01L21/683

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70916 ,  H01L21/68707 ,  H01L21/6838

Abstract: A gripper configured to transport a substrate in a lithographic apparatus, the gripper including: a main body with one or more engagement portions for engaging with a surface of the substrate, wherein a part of the main body, that is overlapped by a region of a substrate when the one or more engagement portions are engaged with the substrate, has a plurality of openings that extend through the main body in a direction substantially perpendicular to the surface of the substrate.

公开(公告)号：US20230333488A1

公开(公告)日：2023-10-19

申请号：US18027094

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Krijn Frederik BUSTRAAN ,  Arjan GIJSBERTSEN ,  Paul VAN DONGEN ,  Ibrahim ACAN

IPC: G03F7/20

CPC classification number: G03F7/70716

Abstract: A substrate holder to hold a substrate in a substrate holding position, the substrate holder including: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping devices each have a clamping pad to be arranged on the upper surface of the substrate, the surface clamping pads being movable with respect to each other at least in a first direction substantially perpendicular to the upper surface of a substrate held by the surface clamping pads, and one or more actuators to move the surface clamping pads with respect to each other in the first direction.